Program overview

FRIDAY MORNING, 8 OCTOBER 1999

10:30 RF1.01 Plasma-Surface Interactions in Dielectric Pattering Using High-Density Sources

Gottlieb S. Oehrlein (Physics Department, State University of New York, Albany, 1400 Washington Avenue, Albany, N.Y. 12222)

11:00 RF1.02 Sticking Coefficients of Neutrals in Inductively Coupled Plasma and RIE Reactors

Da Zhang, Mark J. Kushner (University of Illinois, Urbana, IL, 61801, USA)

11:15 RF1.03 Chlorine Plasma-Silicon Surface Interactions on the Angstrom to Micron Scale

Vincent M. Donnelly, Katherine H. A. Bogart (Bell Laboratories, Lucent Technologies)

11:30 RF1.04 Plasma-Grid Interaction

Chang-Koo Kim, Demetre Economou (Department of Chemical Engineering, University of Houston), Justine Johannes, Timothy Bartel (Sandia National Laboratories)

11:45 RF1.05 Plasma Immersion Ion Implantation for the Treatment of Metal Surfaces

Wolfhard Möller (Institute of Ion Beam Physics and Materials Research, Forschungszentrum Rossendorf, D-01314 Dresden, Germany)

12:15 RF1.06 Recombination Coefficient Measurements of O and N radicals

Harmeet Singh, John Coburn, David Graves (U. C. Berkeley)

10:30 RF2.01 Microdischarges in Silicon: Fabrication and Performance of Single Sub-100µm Diameter Devices and Planar Arrays

Gary Eden (University of Illinois, Dept. of Electrical and Computer Engr., Urbana, IL 61801, USA)

11:00 RF2.02 The One Atmosphere Glow Discharge in Air: Phenomenology and Applications

Rami Ben Gadri, Daniel M. Sherman, Zhiyu Chen, Fuat Karakaya, J. Reece Roth (University of Tennessee at Knoxville)

11:15 RF2.03 Novel Biomedical Applications for Plasma-Deposited Thin Organic Films

Buddy D. Ratner (University of Washington Engineered Biomaterials (UWEB), Seattle, Washington 98195, USA)

11:45 RF2.04 Gas Plasma Afterglow Sterilization : A New Approach

S. Moreau (Ecole Polytechnique, Montreal, Canada), M. Moisan (Universite de Montreal, Montreal, Quebec), M. Tabrizian (Ecole Polytechnique, Montreal, Canada), J. Barbeau (Universite de Montreal, Montreal, Canada), A. Ricard (CPAT, Universite Paul-Sabatier, France), L'H. Yahia (Ecole Polytechnique, Montreal, Canada)

12:00 RF2.05 The formation of ion-ion plasmas in an argon/chlorine mixture

Jennifer L. Kleber, Mark S. Rabalais, Lawrence J. Overzet (University of Texas at Dallas)

12:15 RF2.06 Negative Ion Formation in Pulsed Plasmas

Lal Pinnaduwage, Weixing Ding (ORNL), Dennis McCorkle (UT/ORNL)