Program overview

WEDNESDAY AFTERNOON, 6 OCTOBER 1999

IWP1.01 Effect of Electron Energy Distribution Function on Oxygen Discharges

Han-Ming Wu (Novellus System, Inc.), Gabriel Font (Novellus Systems, Inc)

IWP1.02 Electron Energy Distributions and Rate Coefficients in a N_2 Post-discharge Including Space-charge Field Effects

J. Loureiro, V. Guerra (CFP-IST, Lisbon Tech. Univ., Portugal), P.A. Sá (DEEC-FEUP, Oporto Univ., Portugal)

IWP1.03 Mobility of CF_3^+ in CF_4 and CHF_2^+ in CHF_3

E. Basurto, J. de Urquijo, C. Cisneros, I. Alvarez (Centro de Ciencias Físicas, UNAM México.)

IWP1.04 Drift Velocity of Electrons in Hot and Moist Air mixtures

Douglas Abner (Air Force Research Laboratory, Wight-Patterson AFB, OH)

IWP1.05 A self consistent kinetic scheme for ions in complex geometry

W.N.G. Hitchon, A.J. Christlieb (Center for Plasma Aided Manufacturing; Univeristy of Wisconsin Madison)

IWP1.06 Monte Carlo simulation of electron back diffusion in argon

M. Radmilovi\'c, V. Stojanovi\'c, Z.Lj. Petrovi\'c (Institute of Physics, Belgrade, Yugoslavia.)

IWP2.07 Particle Nucleation in Acetylene RF Plasmas

Svetoslav Stoykov, Christoph Eggs, Uwe Kortshagen (Mechanical Engineering, University of Minnesota, MN 55455)

IWP2.08 On the Hydrocarbon Chemistry in H_2-Ar-O_2 Microwave Plasmas

L. Mechold, J. Röpcke, D. Loffhagen (Institut für Niedertemperatur-Plasmaphysik, 17489 Greifswald, Germany), P.B. Davies (Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, U.K.)

IWP2.09 Chemical Nucleation of Silion Hydride Particles in Silane Plasmas

Upendra Bhandarkar, Steven L. Girshick, Uwe Kortshagen (Mechanical Engineering, University of Minnesota, MN 55455), Mark T. Swihart (Chemical Engineering, University at Buffalo (SUNY))

IWP2.10 Decomposition of Hydrogen Sulfide in a Dielectric-Barrier Discharge

Ulrich Kogelschatz, Eric Killer, Baldur Eliasson (ABB Corporate Research Ltd, Baden, Switzerland)

IWP2.11 Thermal Gas Phase Electron Attachment Reactions of Sulfuryl- and Thionyl-halides at 300 K

Jane M. Van Doren, Matthew S. Thompson, Elizabeth M. Monaco, Matthew F. Wszolek (College of the Holy Cross)

IWP3.12 Measurement of Electron-Impact Cross Sections using Trapped Rb atoms

M. L. Keeler, Todd A. Zimmerman, John B. Boffard, Thad Walker, L. W. Anderson, Chun C. Lin (University of Wisconsin-Madison)

IWP3.13 Electron Excitation out of the Metastable Levels of Neon

John B. Boffard, M. L. Keeler, L. W. Anderson, Chun C. Lin (University of Wisconsin-Madison)

IWP3.14 Electron-impact excitation of Kr atoms

J. Ethan Chilton, Chun C. Lin (University of Wisconsin-Madison)

IWP3.15 Electron Excitation of Argon: 4s'[1/2]_1, 4p[1/2]_1, and 4p'[1/2]_0

D. V. Filipovi\'c, V. Pej\vcev, B. Marinkovi\'c (Institute of Physics, P. O. Box 57, 11001 Belgrade, YU), L. Vu\vskovi\'c (Old Dominion U., Norfolk, VA)

IWP3.16 Electron Impact Excitation of Krypton

X. Guo, G. Mikaelian, D.F. Mathews, M.A. Khakoo (Dept of Physics, California State University, Fullerton, CA), A. Crowe (Dept of Physics, University of Newcastle, Newcastle, UK), V. Zeman (Maths Department, University of Nottingham, Nottingham, UK.), K. Bartschat (Dept Of Physics and Astronomy, Drake University, Des Moines, IA), C. J. Fontes (Applied Theoretical and Experimental Computational Physics Division, Los Alamos National Laboratory, Los Alamos, NM), I. Kanik, S. Trajmar (Jet Propulsion Laboratory, Caltech, Pasadena, CA)

IWP3.17 Balmer-\alpha Excitation and Polarization in e-H Collisions

W Kedzierski, J W McConkey (University of Windsor. Ontario. Canada N9B 3P4)

IWP3.18 Calculated Cross Sections for the Electron-Impact Ionization of Metastable Atoms

H. Deutsch (Univ. Greifswald, Germany), K. Becker (Stevens Institute of Technology, Hoboken, USA), S. Matt, T.D. Maerk (Univ. Innsbruck, Austria)

IWP3.19 Dielectronic recombination rate coefficients to excited states of He from He^+

J. G. Wang, T. Kato, I. Murakami (National Institute for Fusion Science, Japan)

IWP3.20 Normalization of Electron Impact Ionization Differential Cross Sections.

Zineb Felfli (CTSPS/Clark Atlanta University), Nina Avdonina (U. of Pittsburgh), Alfred Msezane (CTSPS/Clark Atlanta University)

IWP3.21 Low-lying resonances in Rb^-, Cs^-, and Fr^-

U. Thumm, C. Bahrim (J.R.Macdonald Laboratory, Kansas State University), I.I. Fabrikant (Department of Physics and Astronomy, University of Nebraska, Lincoln)

IWP3.22 An enhanced database of atomic data for numerical simulations of plasma discharges.

Yu. Sosov, J.M. Truxon, D. Hojnacki, C.E. Theodosiou (University of Toledo), Jr. Williamson (Embry-Riddle Aeronautical University)

IWP3.23 Electron excitation coefficients in xenon

A. Strini\'c, G. Malovi\'c, J. Bo\vzin, Z.Lj. Petrovi\'c (Institute of Physics, Belgrade, Yugoslavia.)

IWP4.24 1D Simulations of Series Resonant Discharges with Asymmetric Electrodes

H.B. Smith, C.K. Birdsall (UC Berkeley)

IWP4.25 Massively Parallel, Atmospheric-Pressure Microdischarges

T. Islam, N.J. Ianno, P.F. Williams (Department of Electrical Engineering, University of Nebraska-Lincoln)

IWP4.26 Optical Emission Spectroscopy of the Laser Ablation Plume Controled by RF Plasma

Yoshiyuki Suda, Takuma Nishimura, Manabu Mizuno, Maria Antoaneta Bratescu, Yosuke Sakai (Hokkaido University, Japan)

IWP4.27 Laser-Induced Vibrational Excitation of Molecules as a Tool of Ionization Enhancement in Air Plasmas

Sergey O. Macheret, Richard B. Miles (Dept. of Mechanical and Aerospace Engineering, Princeton University)

IWP4.28 Simple Model of a Capacitive Discharge with a Bi-Maxwellian Electron Distribution

F.A. Haas, N.St.J. Braithwaite (Oxford Research Unit, The Open University)

IWP4.29 Self-Consistent Simulation of Transient Argon Glow Discharges

Zoltán Donkó (Research Institute for Solid State Physics and Optics, Budapest, Hungary)

IWP4.30 VUV Spectroscopy of High-Pressure Discharge Plasmas

P. Kurunczi, K. Becker (iStevens Institute of Technology, Hoboken, USA)

IWP4.31 Finite element modeling of multipolar buckets with permanent magnets

Mirko Vukovic (Tokyo Electron Arizona, Inc.)

IWP4.32 Breakdown Simulation of Microwave Pulsed Discharges in Hydrogen

A. Lacoste (LEMD, Univ.Joseph Fourier (France)), L.L. Alves (CFP, IST (Portugal)), G. Gousset (LPGP,Univ.Paris-Sud (France)), C.M. Ferreira (CFP, IST (Portugal))

IWP4.33 Time-resolved measurements of ion energy distributions and optical emissions in pulsed rf discharges

Yicheng Wang, Eric Benck, Martin Misakian, Manabu Edamura, James Olthoff (NIST)

IWP4.34 Shock Propagation through a Thomson Discharge

A. White, W.C. Lee, I.V. Adamovich, V. V. Subramaniam, W. Lempert, J.W. Rich (The Ohio State University, Columbus, OH 43210)

IWP5.35 Properties of Laser Produced TMAE Plasma Admixed with Air Constituents, Nitrogen and Noble Gases

Guowen Ding, John Scharer, Kurt Kelly (Electrical and Computer Engineering Department, University of Wisconsin, Madison 53706)

IWP5.36 Mass Spectrometric Investigations of a Plasma Jet Chemical Vapor Deposition Reactor

Alan Kull, Mark Cappelli (Stanford University)

IWP5.37 Localized Electronic Excitation Temperature Measurements in an Air Microwave Plasma Torch at Atmospheric Pressure

K.M. Green, G.J. Flores III, P.P. Woskov, K. Hadidi, P. Thomas (MIT Plasma Science and Fusion Center)

IWP6.38 A TE_01^\circ Mode Permanent Magnets ECR Discharge

K.C. Leou, T.Y. Lo, T.L. Lin, C.H. Tsai (National Tsing Hua University)

IWP6.39 Electron Boltzmann Kinetic Equation Averaged over Fast Electron Bouncing and Pitch-Angle Scattering for Fast Modeling of Electron Cyclotron Resonance Discharge

Igor Kaganovich (Department of Chemical Engineering, University of Houston, 4800 Calhoun Rd., Houston, TX 77204-4792), Martin Misina (Institute of Physics Academy of Sciences of the Czech Republic Na Slovance 2 182 21 Prague 8 Czech Republic), Stanislav Berezhnoi (Physical Technical Department, St. Petersburg State Technical University, 195251, Russia), Renaat Gijbels (Department of Chemistry, University of Antwerp, Universiteitsplein 1,B-2610 Wilrijk, Belgium)

IWP6.40 Effects of antenna geometry on helicon plasma sources

Earl Scime, Matthew Balkey, Robert Boivin, Paul Keiter, John Kline (Department of Physics, West Virginia University)

IWP6.41 Microwave Reflectometry Measurements of Mode Transitions in Helicon Plasmas

Robert Spangler, Robert Boivin, Matthew Balkey, Earl Scime (Department of Physics, West Virginia University)

IWP6.42 Electron Temperature Measurement by a Helium Line Intensity Ratio Method in Helicon Plasmas

R. F. Boivin, M. M. Balkey, M. A. Blackburn, P. A. Keiter, J. L. Kline, E. E. Scime, R. Spangler (West Virginia University, Morgantown, WV 26506)

IWP6.43 Auburn Large-area Plasma Helicon Array

Christopher Watts, Jeremy Hanna (Auburn University)

IWP6.44 Characteristics of DC Magnetron Sputtering Discharge Assisted by Microwave Plasma

Akira Yonesu, Hiroki Takemoto, Naoki Nishimura, Shoichi Sato, Yasumasa Yamashiro (Faculty of Engineering, Ryukyu University, Japan)

IWP7.45 Interaction of Multiple Frequency Sources in Plasma Sheaths

S. Rauf, P. L. G. Ventzek (Motorola Inc.)

IWP7.46 Sheath Model for High-Density Plasmas at Arbitrary RF Bias Frequency

Mark Sobolewski (NIST, Gaithersburg, MD 20899-8362)

IWP7.47 Diffusive Plasma with Negative Plasma Potentials

Lutfi Oksuz (University of Wisconsin -Madison), Noah Hershkowitz (University of Wisconsin Madison)

IWP7.48 Secondary electron energy spectra and current density levels emitted from rf biased plasma electrodes in He, Ar, H2, and N2 feedstock gases

D. M. Shaw, M. Watanabe, H. Uchiyama, G. J. Collins (Dept. of Electrical Engineering, Colorado State University, Fort Collins, CO 80523)

IWP7.49 Transport of particle sputtered from Si and SiO_2 in oxide etching in CCP

K. Maeshige, N. Nakano, T. Makabe (Keio University at Yokohama,Japan)

IWP7.50 Competitive Low Pressure Oxygen Plasma Interactions with Different= Carbon-Carbon Double Bonds

P. Patiño, A. Sifontes, G. Gambús (Escuela de Química, Facultad de Ciencias, Universidad Ce= ntral de Venezuela)

IWP7.51 Plasma Chemistry of C_3F_6 and C_5F_8 Gases as PFC A lternatives in an ICP Source for SiO_2 Etching

K. Tachibana, H. Motomura (Kyoto University), S. Imai (Matsushita Electronics Corp.)

IWP7.52 Atomic Oxygen Density Measurements in a Low Pressure Textile Processing Plasma

S Gomez, P.G. Steen, W.G. Graham (The Queen's University of Belfast)

IWP7.53 Surface recombination of atomic nitrogen in a parallel plate rf discharge

S.F. Adams (Air Force Research Laboratory, Wright-Patterson AFB, OH), T.A. Miller (The Ohio State University, Columbus, OH)

IWP7.54 Sputtered Atoms Transport in a Cyllindrical Hollow Cathode

I. M. Rusinov, A. B. Blagoev (Sofia University, Faculty of Physics, 5 James Bourchier Blvd., 1164 Sofia, Bulgaria)

IWP7.55 Study on the Secondary Electron Yield \gamma of Insulator for PDP Cathode

Y. Motoyama, M. Ushirozawa, H. Matsuzaki, Y. Takano, M. Seki (NHK Sci. Tech. Res. Labs., Tokyo 157-8510, Japan)

IWP7.56 A model of hydrocarbon reactions and surface interactions in low temperature hydrogen plasmas

Darren A. Alman, David N. Ruzic (University of Illinois)

IWP7.57 Deviation from the uniform field in low current diffuse discgarges

S. \vZivanov, J. \vZivanovi\'c, S. Vrhovac, Z.Lj. Petrovi\'c (Institute of Physics, Belgrade, Yugoslavia.)

IWP8.58 Pressure Dependence of Xe_2 Excimer Emission in AC Dielectric Barrier Discharges

Haruaki Akashi, Nobuaki Takahashi, Tai Sasaki (National Defense Academy, Japan), Akinori Oda, Yosuke Sakai (Hokkaido University, Japan)

IWP8.59 A Monte-Carlo Model of Partially Trapped UV Radiation in a Plasma Display Panel Cell

Trudy van der Straaten, Mark J. Kushner (University of Illinois, Dept. of Electrical and Computer Engr., Urbana, IL, 61801, USA)

IWP8.60 1S2 and 1S5 Level Densities in a Neon Discharge via Laser Spectroscopy

Phil Moskowitz, Graeme Lister (OSRAM SYLVANIA)

IWP8.61 Plasimo --- A General Purpose Plasma Modelling Toolkit

Jan Van Dijk, Bart Hartgers, Harm Van der Heijden, Ger Janssen, Colin Johnston, Joost Van der Mullen (Department of Applied Physics, Eindhoven University of Technology, The Netherlands)

IWP8.62 Collisional Radiative Models for non-Maxwellian plasmas

Bart Hartgers, Jan van Dijk, Joost van der Mullen (Department of Applied Physics, Eindhoven University of Technology, The Netherlands)

IWP9.63 Time-resolved VUV emission from a model PDP with in situ deposited MgO

J. R. Gottschalk, A. D. Compaan (Dept. Physics & Astronomy University of Toledo), M. Shao, J. D. Schermerhorn (ElectroPlasma, Inc.)

IWP9.64 VUV spectroscopy and VUV and IR space and time resolved emission of AC-PDP micro discharges

R.J.M.M. Snijkers, M. Klein (Philips Reseach Laboratories, Weisshausstrasse 2, 52066 Aachen, Germany)

IWP9.65 Parametric Study of Rare Gas Mixtures Containing Ar and Kr on the Performance of Plasma Display Panel Cells

Daniel Cronin, Trudy van der Straaten, Mark J. Kushner (University of Illinois, Dept. of Electrical and Computer Engr., Urbana, IL, 61801, USA)

IWP9.66 Simulations of Cell Geometry Effects of ac Plasma Display Panel with Fluid and Hybrid codes

Shon Chae Hwa, Shin Young Kyo, Kim Woong, Kang Jin Ho, Lee Jae Koo (POSTECH)

IWP9.67 The Breakdown and Vacuum Emission Characteristics of a High Surface Area to Volume Ratio Discharge

Olivier B. Postel (), Mark A. Cappelli (Stanford University, Mechanical Engineering Department, Thermosciences Division)

IWP10.68 On the Electron Kinetics in the H_2/Ar/N_2 DC Discharge

Mario Hannemann, Peter Hardt, Detlef Loffhagen, Martin Schmidt, Rolf Winkler (Institut für Niedertemperatur-Plasmaphysik, 17489 Greifswald, Germany)

IWP10.69 Diagnostics of ultra high frequency SiH_4/H_2 plasmas for synthesizing polycrystalline silicon thin film at low substrate temperatures

Masafumi Ito, Shigeaki Sumiya, Yuko Mizutani, Masaru Hori, Toshio Goto (Nagoya University), Seiji Samukawa (NEC Corp.), Tsutomu Tsukada (ANELVA Corp.)

IWP10.70 Polycrystalline diamond films deposited at high microwave power densities

Celine Campillo, Samir Ilias, Michel Moisan (Universite de Montreal, Montreal, Quebec)

IWP10.71 Plasma emission spectroscopic study of CVD diamond growth

Weihai Fu, Arnel Lavarias, Sacharia Albin (Microelectronics amp; Photonics Research Laboratory, Department of Electrical amp; Computer Engnieering, Old Dominion University, Norfolk, Virginia 23529)

IWP10.72 Modeling of a Two Stage RF Plasma Reactor for SiC Deposition

J. L. Giuliani, J. W. Thornhill (Plasma Physics Division, Naval Research Laboratory)

IWP10.73 CW and pulsed inductively coupled chlorine plasma diagnostics for polysilicon etch

Marwan Khater, Lawrence Overzet (University of Texas at Dallas)

IWP10.74 Emissions and Mass Analysis of Fluorocarbon Processing Discharges During Oxide Etch

Eshwar Dandapani, RaviPrakash Jayaraman, Robert McGrath (Electronic Materials Processing Research Laboratory, Penn State University)

IWP10.75 Effect of pressure gradients on plasma characteristics

Keith Thompson, Lawrence Overzet (University of Texas at Dallas)

IWP10.76 Interaction of low energy electrons and ion beam during ion beam implantation

Svetlana B. Radovanov, Jim Buff, Gordon Angel (Varian Semiconductor Equipment Associates, 35 Dory Road, Gloucester, MA 01930.)

IWP10.78 Direct Measurement of Surface Charge Distribution During Ion Implantation

S. Radovanov, G. Angel, J. Buff, J. Cummings, D. Brown (Varian Semiconductor Equipment Associates, 35 Dory Road, Gloucester, MA 01930.)

IWP11.79 Dissociation of Benzene in a Pulsed Glow Discharge

Weixing Ding (ORNL), Dennis McCorkle (UT/ORNL), Cheng-Yu Ma (ORNL), Lal Pinnaduwage (ORNL/UT)

IWP11.80 Ion-Molecule Reactions in a Nitrogen-Benzene Plasma: Implications for the Destruction of Aromatic Compounds

Skip Williams (Air Force Research Laboratory/Space Vehicles Directorate (AFRL/VS)), Susan Arnold, A. A. Viggiano, Robert Morris (AFRL/VS), Rajesh Dorai, Mark Kushner (University of Illinois, Urbana)

IWP11.81 Influence of Discharge Properties on CF_x Polymer Thin Films Deposited in Fluorocarbon Vapor Discharges

Y. Sakai (Hokkaido Univ., Japan), C. P. Lungu, A. M. Lungu (Hokkaido Univ. (on leave from Nat. Inst. of Laser, Plasma and Rad. Phys., Romania)), H. Sugawara (Hokkaido Univ.), M. Miyamoto (Fuji Electric Corp.\ Ramp;D Ltd.)

IWP11.82 Time Resolved Investigations of NO removal in a Homogeneous Pulsed Discharge

F. Fresnet, G. Baravian, L. Magne, S. Pasquiers, C. Postel, V. Puech, A. Rousseau, M. Rozoy (LPGP, Université Paris-Sud / CNRS, France)

IWP12.83 Comparison of three rf plasma impedance monitors on a high phase angle planar inductively coupled plasma source

H. Uchiyama, M. Watanabe, D. M. Shaw, J. E. Bahia, G. J. Collins (Dept. of Electrical Engineering, Colorado State University, Fort Collins, CO 80523)

IWP12.84 Langmuir Probe Distortions and Probe Compensation in an Inductively Coupled Plasma

J. S. Ji, M. A. Cappelli, J. S. Kim, M. V. V. S. Rao, S. P. Sharma (NASA-Ames Research Center)

IWP12.85 Langmuir Probe and Ion Acoustic Wave Velocity Measurement of the Concentration of Two Species in a Multi-Dipole Plasma

Ahmed Hala, Noah Hershkowitz (University of Wisconsin-Madison)

IWP12.86 Gas Phase Diagnostics in LAPPS

D. Leonhardt, S.G. Walton, D.P. Murphy, W.E. Amatucci, R.A. Meger, R.F. Fernsler (Plasma Physics Division, Naval Research Laboratory)

IWP12.87 Plasma-Surface Interactions in LAPPS

S.G. Walton, D. Leonhardt, D.P. Murphy, R.A. Meger, R.F. Fernsler (Plasma Physics Division, Naval Research Laboratory)

IWP12.88 Cathode Development for LAPPS

D. P. Murphy, W. E. Amatucci, D. Leonhardt, S. G. Walton, R. A. Meger, R. F. Fernsler (Plasma Physics Division, Naval Research Laboratory)

IWP13.89 Laser Control of Microwave-Driven Filamentary Discharges

Richard Miles, Peter Barker, Jizou Zou, Sergey Macheret (Dept. of Mechanical and Aerospace Engineering, Princeton University, Princeton, NJ)

IWP13.90 Mass Spectrometry of Active Species Convected from an Atmospheric Air Plasma in a Remote Exposure Reactor

D. M. Sheman, F. Karakaya, Z. Chen, J.R. Roth, University of Tennessee Team

IWP13.91 Formation of Ion-Ion Plasmas

Sivananda K. Kanakasabapathy, L. J. Overzet (University of Texas at Dallas)

IWP13.92 Mass spectrometry of atomic and molecular anions from a hot-cathode plasma

Stephen E. Mitchell, John W. Farley (Dept. of Physics, Univ. Nevada, Las Vegas)

IWP13.93 Anomalous Transport in Closed and Open-Drift Hall Discharges

Mark Cappelli, Nathan Meezan, Dan Schmidt (Mechanical Engineering Department, Stanford University)

IWP13.94 Comparative Study of Ion Sources for Proton Transfer Reactions

G. M. Brooke, S. Popovi\'c, L. Vu\vskovi\'c (Old Dominion U., Norfolk, VA)

IWP13.95 Investigation of the Effect of Different Parameters Governing the Generation of Ozone by Silent Discharge

A.A. Garamoon, F.F. Elakshar (Center of Plasma Technology, Faculty of Science, AL-Azhar U., Nasr City, Cairo, Egypt), A.M. Nossair, E.F. Kotp (Physics Dep., Faculty of Science, AL-Azhar U., Assuit Branch, Assuit, Egypt)

IWP13.96 Energetic Negative Ion Production on a W Surface due to Low Energy Incident H^-, H^+, H_2^+ and H_3^+

B. L. Peko, T. M. Stephen (University of Denver)

IWP13.97 Measurements on the Parameters of Neutron by the DPF Device

Guo Hongsheng (Southwest Institute of Fluid Physics, P. O. Box 523-51 Chengdu, Sichuan China)

IWP13.98 Vacuum Multipactor Electron Generation

D. M. Shaw, Z. Yu, G. J. Collins (Dept. of Electrical Engineering, Colorado State University, Fort Collins, Colorado, 80523)

IWP13.99 Application of rf plasma for treatment of wool

M. Radeti\'c, D. Jovi\'c, P. Jovan\vci\'c (Faculty of Technology and Metallurgy, University of Belgrade), Z.Lj. Petrovi\'c (Institute of Physics, Belgrade, Yugoslavia)