WEDNESDAY MORNING, 6 OCTOBER 1999

Session FW1. Deposition/Materials Processing.

08:00 FW1.01 Plasma Issues in Ionized Physical Vapor Deposition Equipment Design: Michael Grapperhaus (Tokyo Electron Arizona, Inc.)
08:30 FW1.02 Rarefaction in Ionized Physical Vapor Deposition Discharges: Y. Andrew, I.C. Abraham, J.H. Booske, S. Lu, T.G. Snodgrass, A.E. Wendt (University of Wisconsin-Madison, Center for Plasma Aided Manufacturing)
08:45 FW1.03 Development and characterization of an atomic nitrogen source for the epitaxial growth of GaN: Philippe Mérel, Mohamed Chaker (INRS-Énergie et Matériaux), Michel Moisan (Université de Montréal)
09:00 FW1.04 Fundamental Studies of In Situ Plasma Chamber Cleaning Chemistries: C2F6/O2, C3F8/O2, and NF3/He.: William R. Entley, William J. Hennessy, John G. Langan (Air Products and Chemicals, Inc.)
09:15 FW1.05 Beam Generated Plasmas for Large Area Materials Processing: R. A. Meger (Plasma Physics Division, Naval Research Lab), R. F. Fernsler, M. Lampe, D. Leonhardt, W. M. Manheimer, D. P. Murphy (NRL), R. E. Pechacek (SFA, Inc.), S. G. Walton (NRC Postdoc)
09:30 FW1.06 Theory of Plasma Production in LAPPS: R. F. Fernsler (Plasma Physics Division, Naval Research Laboratory), W. M. Manheimer, M. Lampe, R. A. Meger (NRL)

08:00 FW2.01 Simulation of Time Modulated Dual Frequency Capacitively-Coupled Plasmas: Nobuhiko Nakano (Keio University)
08:15 FW2.02 Effects of Bias Frequency on 2D Image of Net Production Rate in Two Frequency CCP: T. Kitajima (National Defense Academy,Japan), T. Fujita, T. Mano, T. Makabe (Keio University,Japan)
08:30 FW2.03 Modeling of non-local and local behavior of EEDF in argon and silane discharges: Min Yan, Annemie Bogaerts (Department of Chemistry, University of Antwerp, Belgium), Wim Goedheer (FOM Institute for Plasma Physics "Rijhuizen", The Netherlands), Renaat Gijbels (Department of Chemistry, University of Antwerp, Belgium)
08:45 FW2.04 Modeling of argon rf glow discharges used for analytical applications: Annemie Bogaerts, Renaat Gijbels (Dept. of Chemistry, University of Antwerp, Belgium)
09:00 FW2.05 Three-dimensional particle simulation of low-pressure inductively coupled discharge generated by immersed RF antenna: Vladimir Serikov, Shinji Kawamoto (Nippon Sheet Glass Co., Ltd., Japan)
09:15 FW2.06 A New Quasi-Particle Method for Simulating Steady-State Chemically Reacting Plasmas: Timothy Bartel, Michael Gallis, Seung Choi, Justine Johannes (Sandia National Labs)
09:30 FW2.07 Explosive Generation of Cold Electrons in Low-Pressure Discharges: Stanislav Berezhnoi, Igor Kaganovich, Lev Tsendin (St. Petersburg State Technical University, ul. Politekhnicheskaya 29, St. Petersburg, 195251 Russia)