Program overview

THURSDAY AFTERNOON, 9 OCTOBER 1997

13:30 RR1.01 Simulations of Control Schemes for Inductively Coupled Plasma Sources

P.L.G. VENTZEK, A. ODA (HOKKAIDO UNIVERSITY), J.W. SHON, P. VITELLO (LAWRENCE LIVERMORE NATIONAL LABORATORY)

13:45 RR1.02 A General Circuit Model for rf Plasma Processing Equipment

Shahid Rauf, Mark J. Kushner (University of Illinois-Urbana/Champaign)

14:00 RR1.03 Time Resolved Studies of Radio Frequency Driven Plasmas

Bill Graham (Physics Department, The Queen's University of Belfast, Northern Ireland)

14:30 RR1.04 Problems of Radio-Frequency Capacitive Discharge Plasma Parameters Control

Nikolai YATSENKO (Head Scientist, Professor, Institute for Problems in Mechanics, Russian Academy of Sciences)

14:45 RR1.05 Sheath dynamics of a helium discharge in the GEC reference cell investigated by Rydberg-Stark spectroscopy

U. Czarnetzki, D. Luggenhölscher, H.-F. Döbele (Institut für Laser- and Plasmaphysik, Universität GH Essen, D-45117 Essen, Germany)

15:00 RR1.06 Positive Potential Formation in a Collisionless Negative Ion Plasma

Zahedul Hassan, Nobuya Hayashi, Yasunori Ohtsu, Hiroharu Fujita (Department of Electrical Engineering, Saga University, Japan)

15:15 RR1.07 First Experimental Test of the Godyak and Sternberg Sheath Model For= Collisional Plasma

Noah Hershkowitz (UW-Madison), Husain Kamal (Kuwait University)

15:30 RR1.08 A Novel Electro-optical Probe to Diagnose Plasma Uniformity

M. Sarfaty, M. Harper, N. Hershkowitz (ERC for Plasm-Aided Manufacturing, University of Wisconsin-Madison)

15:45 RR1.09 Studies of Ion and Electron Beams in a Spherical IEC Device

G. H. Miley, John M. DeMora (UIUC)

13:30 RR2.01 Use of Sensors and RF System Models to Control Inductively Coupled Plasma Sources

Lee A. Berry (Oak Ridge National Laboratory)

14:00 RR2.02 Transport of argon ions in the presheath of an ICP

M. van de Grift, T. HBid, E.W.M. Knols, G.M.W. Kroesen, F.J. de Hoog (\urllinkEindhoven University of Technologyhttp://www.tue.nl, Dept. of Appl. Phys.,The Netherlands), N. Sadeghi (Lab. Spectrometrie Phys. Grenoble, France)

14:15 RR2.03 Magnetic Probe Measurements in an Inductively Coupled Argon Discharge

Robert Piejak, Valery Godyak, Benjamin Alexandrovich (OSRAM SYLVANIA Products Inc.)

14:30 RR2.04 An Inductively Coupled Large Area Plasma Source for Flat Panel and Large Size Wafer Processing

Yaoxi Wu, M.A. Lieberman, A.J. Lichtenberg (UC Berkeley)

14:45 RR2.05 Prediction of Etch Rate Distribution from the Flow Analysis of Radicals, Excited Molecules, Gas Molecules, and Reaction Products

K. Nanbu (Tohoku University)

15:15 RR2.06 Modeling Study of Asymmetric Plasma Properties Produced by Pumping and Gas Injection in Inductively Coupled Plasmas

Eric Keiter, Mark J. Kushner (University of Illinois-Urbana/Champaign)

15:30 RR2.07 Modeling and Diagnostics for an ICP in a Collision Dominated Region

Toshiaki Makabe (Keio University, Yokohama Japan)