Program overview

WEDNESDAY AFTERNOON, 8 OCTOBER 1997

OWP1.01 Multiple ionization of lead by electron impact.

J. Geddes (Department of Pure and Applied Physics, The Queen's University of Belfast, Belfast, United Kingdom.), P. McCartney, M.B.S. Shah, H.B. Gilbody (Department of Pure and Applied Physics, The Queen's University of Belfast, Belfast, United Kingdom)

OWP1.02 Electron-Impact Double Ionization of Magnesium

M.J. Ford, J.H. Moore, M.A. Coplan (University of Maryland), B. El Marji, J.P. Doering (Johns Hopkins University)

OWP1.03 Kinetic-Energy Distributions of Positive and Negative Ions in DC Townsend Discharges of Carbon Dioxide

M. V. V. S. Rao, R.~J. Van Brunt, J. K. Olthoff (NIST)

OWP1.04 Kinetic-Energy Distributions of Positive and Negative Ions in DC Townsend Discharges of CHF_3 at High E/N

M.~V.~V.~S. Rao, R.~J. Van Brunt, J. K. Olthoff (NIST)

OWP1.05 Time-resolved measurement of the effective ionization coefficient and ion drift in CH_4-Ar mixtures

Jaime de Urquijo, Carlos Arriaga, Eduardo Basurto, Carmen Cisneros, Ignacio Alvarez (Instituto de Física, UNAM, México)

OWP1.06 A Penning discharge as a dc source for multiply ionized atoms.

Kling Rainer, Kock Manfred (Institute of Atomic and Molecular Physics, University of Hannover, Callinstrasse 38, D--30167 Hannover, Germany)

OWP1.07 Electron-Impact Total Ionization Cross Sections of Fluorine Compounds

Y.-K. Kim (NIST), M. A. Ali (Howard Univ.), M. E. Rudd (Univ. Nebraska-Lincoln)

OWP1.08 Chemionization Cross Sections for Various Rare Gas Metastable Pairs

David F. Hudson (GERA)

OWP1.09 Photoionization of the Neon isoelectronic sequence using RRPA

Nasreen Haque (Department of Physics, Morehouse College, Atlanta, Ga 30314), Alfred Msezane (CTSPS, Clark Atlanta University, Atlanta, Ga 30314), Steven T. Manson (Dept. Of Physics and Astronomy, Georgia State University, Atlanta, Ga 30303), Pranawa Deshmukh (Dept. of Physics, Indian Institute of Technology, Madras, India)

OWP2.01 Silicon and Silicon Oxide Etching with a Novel Microwave ECR Plasma Source

Rex Anderson, Aaron Wilson, W. D. Getty, M.L. Brake (Center for Display Technology and Manufacturing, University of Michigan)

OWP2.02 Kinetic Model of a O_2-N_2 Low Pressure Microwave Discharge

V. Guerra, J. Loureiro (CEL-IST, Lisbon Tech. Univ., PORTUGAL)

OWP2.03 Negative Ion Measurements in Electron Cyclotron Resonance Etching Plasmas [1]

Bon-Woong Koo, Noah Hershkowitz (University of Wisconsin-Madison)

OWP2.04 A New Surface-Wave Plasma Source with Electron-Cyclotron-Resonance Ig nition

Mutumi Tuda, Kouichi Ono (Mitsubishi Electric Corp., Adv. Technol. R&D Center, Amagasaki 661, Japan)

OWP2.05 Plasma Production Using Waves in a Lower Hybrid Frequency Range

Y Yasaka, K Ohnishi, K Tachibana (Kyoto University), T Itoh (Plasma System Corp.)

OWP2.06 A Two-Coupled-Sheath Simulation of RF Chuck Bias.

S. K. Kanakasabapathy, L. J. Overzet (The University of Texas at Dallas.)

OWP2.07 Measurements of an Inductively Coupled Plasma Source for Microelectronics Processing.

Marwan H. Khater, L. J. Overzet, B. E. Cherrington (The University of Texas at Dallas)

OWP2.08 Experimental Test of Models of High-Density, Radio-Frequency Plasma Sheaths

M. A. Sobolewski, Y. Wang, J. K. Olthoff (NIST)

OWP2.09 Two Dimensional Modeling of Ar RF ICP by RCT Model,

K. Iyanagi, N. Nakano, T. Makabe (Keio University,Yokohama Japan)

OWP2.10 Hysteresis on the E to H mode transition in radio frequency discharges

M. M. Turner, J. Goss (Plasma Research Laboratory, Dublin City University, Ireland), I. M. El-Fayoumi, I. R. Jones (School of Physical Sciences, Flinders University, Adelaide, Australia)

OWP2.11 Laser Scattering Diagnostics of a Magnetic Neutral Loop Discharge Plasma

K. Uchino, T. Sakoda, K. Muraoka (Kyushu University, Japan), M. Itoh, T. Uchida (ULVAC Japan Ltd)

OWP2.12 Space- and Time- Resolved Measurements of F^- Density in High-Density Fluorocarbon Plasmas by Laser Photodetachment

D. Hayashi, N. Takada, K. Sasaki, K. Kadota (Department of Electronics, Nagoya University, Nagoya 464-01, Japan)

OWP2.13 Density and Kinetics of Fluorine Atoms in Helicon-Wave C_4F_8 Plasmas

K. Sasaki, C. Suzuki, K. Kadota (Department of Electronics, Nagoya University, Nagoya 464-01, Japan)

OWP2.14 Wave Propagation and Absorption in a Helicon Plasma Source

Y. Mouzouris, J. E. Scharer, M. H. Bettenhausen (University of Wisconsin-Madison)

OWP2.15 Surface and helicon wave propagation in an inductively coupled plasma at low magnetic field.

T. Lho, N. Hershkowitz, W. Steer (Nuclear Engineering and Engineering Physics, University of Wisconsin, 1500 Engineering Dr., Madison, WI 53705, U.S.A.), J. Miller (Twinstar Semiconductor Inc., 500 west Renner Rd., Richardson, TX 75080, U.S.A.), G.H. Kim (Department of Physics, University of Hanyang, Guynggi-Do, Ansn-Si, Korea)

OWP2.16 Spectroscopic Observations of Helicon Discharge Evolution

James Gilland, Noah Hershkowitz (University of Wisconsin-Madison)

OWP2.17 Large-area, low-field, multi-tube helicon plasma sources

J.D. Evans, F.F. Chen (UCLA), G.R. Tynan (Trikon Technologies, Inc.)

OWP2.18 Electron Beam Biasing of Substrates during Plasma Etching [1]

A. K. Quick, N. Hershkowitz (Engineering Research Center for Plasma-Aided Manufacturing, University of Wisconsin-Madison)

OWP2.19 Characterisation of an SF6 Helicon Discharge

R.W. Boswell (RSPhysSE, Australian National University, Canberra, ACT 0200, Australia), P. Chabert (Laboratoire PRIAM-ONERA, F-91761, CEDEX, France), J. Savy, T.E. Sheridan (RSPhysSE, Australian National University, Canberra, ACT 0200, Australia)

OWP2.20 Pure Silicon Plasma in a Helicon Plasma Deposition System

R.W. Boswell (RSPhysSE, Australian National University, Canberra, ACT 0200, Australia), A. Durandet, C.A. Davis (RSPhysSE, Australian National University, Canberra, ACT 0200 Australia)

OWP2.21 Determination of Metal Vapor Ion Concentration in an Ar/Cu Plasma For Ionized Physical Vapor Deposition

J.E. Foster, W. Wang, A.E. Wendt, J. Booske (The University of Wisconsin Plasma ERC)

OWP2.22 Time-Resolved Langmuir Probe Measurements in an Ionized PVD System

D.R. Juliano, D.B. Hayden, D.N. Ruzic (University of Illinois--Urbana)

OWP2.23 Measurement of Absolute Densities of SiFx in Electron Cyclotron Resonance SiF_4 Plasma

Masayuki Nakamura, Hiroyoshi Arai, Koji Miyata, Masafumi Ito, Masaru Hori, Toshio Goto (Information Electronics, Nagoya University, JAPAN)

OWP2.24 Measurement of Si atom density in ultra high frequency discharge silane plasma

Yasuo Yamamoto, Ryohei Yoshida, Masafumi Ito, Masaru Hori, Toshio Goto (Dept. of Quantum Eng., Nagoya Univ., JAPAN), Seiji Samukawa (NEC Co., JAPAN), Tsutomu Tsukada (ANELVA Co., JAPAN)

OWP2.25 Ionized PVD with an Inductively Coupled Plasma Source

D. B. Hayden, D. R. Juliano, D. N. Ruzic (University of Illinois at Urbana-Champaign)

OWP2.26 Diamond Film Formation Using a Low Pressure Radio Frequency Inductively Coupled Plasma

H. Noda, H. Nagai, M. Hiramatsu, M. Nawata (Meijo University, Nagoya, Japan), M. Hori, T. Goto (Nagoya University, Nagoya, Japan)

OWP2.27 Self-Consistent Particle Simulation of Axisymmetrical Magnetron Dicharge

S. Kondo, K. Nanbu (Tohoku University)

OWP3.01 Plasma Etching of Semiconductor Trenches by Three Processes

Chungdar Daniel Wang (), Barbara Abraham-Shrauner (Department of Electrical Engineering Washington University, St. Louis, MO, 63130)

OWP3.02 Modification of Plasma Etching of Trenches by Sputtering

B. Abraham-Shrauner, N. Jagannathan (Washington University)

OWP3.03 Model Etch Profiles for Ion Energy Distribution Functions in ICP and Helicon Plasma

Wenjing Chen, Barbara Abraham-Shrauner, C. Daniel Wang (Department of Electrical Engineering, Washington University, St. Louis, MO 63130)

OWP3.04 Experimental study of the charging of structures on wafers

Gurprit Chandhoke, Brian Heil, Uwe Kortshagen (University of Minnesota, Dept. of Mech. Engineering)

OWP3.05 Sub-0.5mm Polysilicon Gate Etching with Cl2/O2 Plasma in An Inductively Coupled Plasma Etcher

Songlin Xu, Xueyu Qian, Gerald Yin (Applied Materials Inc)

OWP3.06 Characteristics of Dry Etched GaN Using Ar/SF_6 and He/SF_6 in an Assymetric RF Parallel Plate Discharge

J Scofield, P. Bletzinger, B.N. Ganguly (Air Force Research Laboratory)

OWP3.07 Charging of Substrates Irradiated by Particle Beams

P. N. Guzdar, A. S. Sharma, S. K. Guharay (Institute for Plasma Research,University of Maryland, = College Park, MD 20742)

OWP4.01 UV and VUV spectra of Metal-Etch Plasma Processing Discharges

Joseph Woodworth (), Ramana Veerasingam (Sandia National Laboratories)

OWP4.02 Simultaneous electric field measurements in a dc discharge by fluorescence and optogalvanic Stark spectroscopies

D.A. Dolson (Wright State University,Dayton,OH), B.N. Ganguly (Wright Laboratory,WPAFB,OH)

OWP4.03 \rmC_2 Swan Band Emission Intensity as a Function of [\rmC_2]

A.N. Goyette, J.E. Lawler, L.W. Anderson (Department of Physics, University of Wisconsin, Madison, WI 53706), D.M. Gruen, T.G. McCauley, D. Zhou, A.R. Krauss (Chemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439)

OWP4.04 H^- Diagnostics by CW-Laser Absorption Spectroscopy

E. Quandt, H.-F. Döbele (Institut für Laser- and Plasmaphysik, Universität GH Essen, D-45117 Essen, Germany), W.G. Graham (The Queen's University Belfast/ Northern Ireland)

OWP4.05 Laser Detection of Methylene Radicals in CH4-H2 dc Discharges

G. Sultan, G. Baravian (LPGP, CNRS, U. of Paris-Sud, F-91405 Orsay), C. Hayaud (Innovatique, F-69386 Chassieu), J. Amorim (ITA, Sao Jose dos Campos, Brazil)

OWP4.06 Laser-Induced Fluorescence Measurement of SiH_2 in Silane Plasmas Using a CW Ring Dye Laser

A. Kono, S. Hirose, T. Goto (Nagoya University, Nagoya, Japan), K. Kinoshita (ASET, Yokohama, Japan)

OWP4.07 Measurement of quenching rates of the argon 750.4 nm actiometer line by various gases

A. Francis, U. Czarnetzki, H.-F. Döbele (Institut für Laser- and Plasmaphysik, Universität GH Essen, D-45117 Essen, Germany), N. Sadeghi (Université Joseph Fourier, Bp 87, 38402 Saint Martin d'Hères, France)

OWP4.08 A novel four-wave mixing scheme for atomic hydrogen detection: First results

M. Thomson, U. Czarnetzki, H.-F. Döbele (Institut für Laser- and Plasmaphysik, Universität GH Essen, D-45117 Essen, Germany)

OWP4.09 UV absorption spectroscopy diagnostics of etching plasmas

Jean-Paul Booth, Gilles Cunge, Nader Sadeghi (Laboratoire de Spectrometrie Physique, Grenoble, France), Pascal Chabert (Thomson CSF-LCR, Orsay, France), Francois Neuilly (SGS Thomson, Crolles, France)

OWP4.10 Density Measurements of Metastable He in a Parallel Plate Discharge Using a Diode Laser

Michael W. Millard, Perry P. Yaney (Univeristy of Dayton, Dayton, Ohio), Biswa N. Ganguly (Wright Laboratories, Wright-Patterson AFB, Dayton, OH.)

OWP4.11 A Study of Electron Energy Distribution Functions in Inductively Coupled Plasmas by Laser Thomson Scattering

M. D. Bowden, T. Hori, M. Kogano, K. Uchino, K. Muraoka (Kyushu University, Japan)

OWP4.12 A Technique for Observing Infrared Emissions from Thermal Electron-Ion Plasmas

B.K. Decker, T.L. Williams, J.M. Butler, N.G. Adams (Univ. of Georgia, Athens, GA)

OWP4.13 Laser and Spectroscopic Studies of ^4S Atomic Nitrogen Production in N_2-H_2 Gas Mixtures in a Microwave Discharge.=

Steven F. Adams, Biswa Ganguly (Wright Laboratory, WPAFB, OH), Terry A. Miller (The Ohio State University)

OWP4.14 Comparison of Electron-Density Measurements using the Plasma Oscillation Method and a Langmuir Probe in an Inductively Coupled GEC Reference Cell

A. Schwabedissen, E.C. Benck, J.R. Roberts (NIST)

OWP4.15 Langmuir probe characterization of capacitively driven discharges in different gases.

J. McFarland, C.M.O. Mahony, P.G. Steen, W.G. Graham (Dept. of Physics, The Queens University of Belfast, Northern Ireland.)

OWP4.16 Development of new analysis algorithm based on wavelet transform for Langmuir probe traces from an ECR plasma

G.-H. Kim (Physics), D.-G. Kim (Mathematics), W.-H. Jung (Mathematics, Hanyang University)

OWP4.17 Fast Langmuir Probe Measurements in a Laser Produced Plasma

G. Ding, J. E. Scharer, K. L. Kelly (University of Wisconsin-Madison)

OWP4.18 On the Probe Measurements of Ion Distribution Function in Electronegative Gas Plasmas

N.A. Khromov, S.A. Gutsev, A.A. Kudryavtsev (Institute of Physics, St. Petersburg State University, Russia)

OWP4.19 Modification of Ion Species by Gas Addition in an Inductive Metal Etch Reactor

Peter K. Loewenhardt, Diana X. Ma, Hiroji Hanawa, Yan Ye, Timothy R. Webb, Alan Zhao, Jay Shiau, Steve Mak, James Papanu, Gerald Z. Yin (Applied Materials, Santa Clara, CA 95054)

OWP4.20 Feedforward-Enhanced PID Control for Fast Response and Disturbance Rejection in Plasma Etching

C. Baum, M. Sarfaty, M. Harper, J. L. Shohet, N. Hershkowitz

OWP4.21 Ion Distributions in Metal-Etch Plasma Processing Discharges

Christopher Nichols (), Joseph Woodworth (Sandia National Laboratories), Thomas Hamilton (Applied Physics International)

OWP4.22 Oxide Etch Endpoint Detection by Downstream FTIR On An AMAT 5300

Ion C. Abraham (UW-Madison Plasma ERC), Enlian Lu, Qingyun Yang (SEMATECH), Harold M. Anderson (University of New Mexico), R. Claude Woods (UW-Madison Plasma ERC)

OWP4.23 Two dimensional imaging of electron temperature in GEC reference cell.

J. Goree, D. Samsonov (The University of Iowa)

OWP4.24 Diagnosis of System Condition using System Parameter Data

Carl Almgren, George Collins (Colorado State University)

OWP4.25 Induction Probe Studies of an Electrostatic Shield Around an Inductively Coupled Plasma

V.A. Shamamian, J.L. Giuliani (Naval Research Laboratory), A.E. Robson (Berkeley Scholars, Inc.), R.E. Campbell (Geo-Centers, Inc)

OWP4.26 The Influence of Different Coil Geometries on the Spatial Distribution of the Plasma Density in an Inductively Coupled GEC Reference Cell

A. Schwabedissen, E.C. Benck, J.R. Roberts (NIST)

OWP4.27 Characterisation of Plasmoids in an RF Inductively Coupled Plasma.

D Vender, B Crowley (Dublin City University)

OWP4.28 Detection of atomic oxygen in a GEC-Reference Cell by TALIF

A. Goehlich, T. Kawetzki, H.-F. Döbele (Institut für Laser- and Plasmaphysik, Universität GH Essen, D-45117 Essen, Germany)

OWP4.29 Improved diagnostics for neutral species generated in processing plasmas

Alan Rees, Paul Read, David Seymour (Hiden Analytical Limited)

OWP4.30 Oxygen radical increase with the addition of helium in a discharge excited by a ring-shaped cathode

Shane Lloyd, D. Vona, D. M. Shaw, Z. Yu, G. J. Collins (Dept. of Electrical Eng., Colo. St. Univ., Ft. Collins, CO 80523)

OWP4.31 Radical Column Density Measurements During the Flame Deposition of Diamond

S. J. Firchow, K. L. Menningen (University of Wisconsin - Whitewater)

OWP4.32 Electron Beam Ablation of Metal and Fused Silica

R.M. Gilgenbach, S.D. Kovaleski (Intense Energy Beam Interaction Laboratory, Nuclear Engineering and Radiological Sciences Department, University of Michigan, Ann Arbor, MI 48109-2104)

OWP4.33 Limits in Detection of UV Induced Damage Using SPV Surface Charge Measurements

Kenton Stiles, Patrick Gonzalez, George Collins (Colorado State University, Ft. Collins, CO 80521)

OWP4.34 PARAMETRIC X-RAY RADIATION

Alexander Shchagin (Kharkov Institute of Physics and Technology, Kharkov 310108, Ukraine)

OWP4.35 Experimental Measurement of the Band Structure of Solids by Electron Momentum Spectroscopy

Vladimir Sashin, Shane Canney, Ziwei Fang, Michael Ford (Flinders University of South Australia)