Program overview

MONDAY MORNING, 6 OCTOBER 1997

10:15 BM1.01 Recent Results on the Radiation Mechanism of Cluster Lamps

Manfred Neiger (University of Karlsruhe, LTI (Germany))

10:45 BM1.02 Discharge Paths to Mercury-Free Lighting

Douglas A. Doughty (GE Corporate Research and Development)

11:15 BM1.03 Excimer Emission from Direct Current Microhollow Cathode Discharges

R. H. Stark, A. El-Habachi, W. Shi, K. H. Schoenbach (Physical Electronics Research Institute, Old Dominion University, Norfolk, VA 23529)

11:30 BM1.04 Analysis of the near-cathode region in high-pressure discharge lamps

M. S. Benilov, R. M. S. Almeida (Departamento de Física, Universidade da Madeira, Largo do Município, 9000 Funchal, Portugal)

11:45 BM1.05 Radiometric Efficiency of Barium Discharge Plasmas

Heidi M. Anderson, J. MacDonagh-Dumler, J. J. Curry, J. E. Lawler (University of Wisconsin-Madison)

12:00 BM1.06 Efficient Bright UV and VUV Light Sources

D. E. Murnick, H. Dahi (Rutgers University, Newark NJ 07102), A. Ulrich, J. Wieser (Fakultät für Physik, Technische Universität Munchen Germany)

12:15 BM1.07 Coulomb-Collision implemented PIC Simulation of High-Density Plasmas for X-Ray Laser Systems

S. Yonemura (), K. Nanbu (Institute of Fluid Science, Tohoku University)

10:15 BM2.01 Time delays in rapidly pulsed capacitive discharges

R.W. Boswell (RSPhysSE, Australian National University, Canberra, ACT 0200, Australia)

10:30 BM2.02 Step and Pulsed Responses of RF Discharges

JING Yang, P.L.G. Ventzek, Y. Sakai (Hokkaido University), K. Kitamori, H. Tagashira (Hokkaido Institute of Technology), M. Meyyappan (NASA Ames Research Center)

10:45 BM2.03 Electrical and Optical Diagnostics of Pulsed rf Magnetron Discharges in BCl_3/Cl_2 Mixtures for Aluminum Etching

Mutumi Tuda, Kouichi Ono (Mitsubishi Electric Corp., Adv. Technol. R&D Center, Amagasaki 661, Japan)

11:00 BM2.04 Simulation of Inductively-Coupled Pulsed Plasmas.

D.P. Lymberopoulos (Applied Materials), V.I. Kolobov, D.J. Economou (University of Houston)

11:15 BM2.05 Pulsed plasma discharges in a magnetically confined inductively coupled plasma source

M. Harper, M. Sarfaty, P. Sandstrom, N. Hershkowitz (ERC for Plasm-Aided Manufacturing, University of Wisconsin-Madison)

11:30 BM2.06 Determination of Electron Temperature in a Pulsed Inductively Coupled RF Plasma

A. Brockhaus, St. Behle, A. Georg, V. Wingsch, J. Engemann (fmt, University of Wuppertal)

11:45 BM2.07 Simulation of Unsteady-State Expansion of a Chlorine Plasma into Vacuum

Satoshi Tanaka, Satoshi Uchida, P.L.G. Ventzek, Y. Sakai (Hokkaido University), K. Kitamori, H. Tagashira (Hokkaido Institute of Technology)

12:00 BM2.08 Ion-Ion Plasmas.

D.J. Economou, V.I. Kolobov (University of Houston)

12:15 BM2.09 Opacity Effects on Line Broadening in Electron Density Analysis of Transient Plasmas

H.K. Chung, D.H. Cohen, J.J. MacFarlane, G.A. Moses (University of Wisconsin-Madison)