Session CE - Condensed Matter Physics.
MIXED session, Saturday morning, November 02
Room 222, Morton Hall
Some space and commercial applications demand durable, transparent, conductive thin films with high, tailorable sheet resistivity. We have prepared 30-nm-thick amorphous films by reactive sputtering from a dual ITO (indium tin oxide)/MgF_2 target in the presence of high-purity air. Sheet resistivities of 10^3--10^11 ohms/square with visible transmittance as high as 92% were obtained in films with 0--17 volume-percent MgF_2. Post-deposition heating to 250 C in high-purity air increases resistivity by as much as 4 orders of magnitude, reducing carrier concentration to as low as 2\times10^14 cm^-3 (presumably by filling oxygen vacancies). Temperature dependence of the Hall coefficient and resistivity will be discussed.
