Program overview

MONDAY MORNING, 21 OCTOBER 1996

08:00 M1A.01 Diagnostic Investigation of Oxide Etching in a Commercial High-Density Plasma Etcher

John Arnold (Motorola, Advanced Products Research and Development Laboratory)

08:30 M1A.02 rf sensors for plasma process monitoring

Maheswaran Surendra, C. Richard Guarnieri (IBM Res. Ctr. Yorktown Hts. NY), Mariano Anderle (CMBM, Instituto Trentino di Cultura, Trento, Italy)

08:45 M1A.03 Absolute Densities of CF_4 Discharge Products in an MCICP by FTIR

Ion C. Abraham, Robert A. Breun, R. Claude Woods (ERC for Plasma-Aided Manufacturing, Univ. of Wisconsin-Madison)

09:00 M1A.04 Mechanism study of highly selective SiO_2 etching to Si_3N_4

Hisataka Hayashi, Makoto Sekine (Toshiba Corporation)

09:15 M1A.05 Vacuum Ultraviolet Absorption Spectroscopy for Absolute Density Measurements of Fluorine Atoms in Fluorocarbon Plasmas

K. Sasaki, Y. Kawai, K. Kadota (Department of Electronics, Nagoya University, Nagoya 464-01, Japan)

09:30 M1A.06 Behaviors of CF_x Radicals in ECR Fluorocarbon Plasmas and Control of SiO_2 Etching by Radical Injection

Toshio Goto, Masaru Hori (Dept. of Quantum Engineering, Nagoya University, Nagoya, JAPAN)

08:00 M1B.01 Recent progress in the theory of electron--atom collisions.

Klaus Bartschat (Drake University)

08:30 M1B.02 Measurement of the Total Cross Section for Excitation of the 2p State of Atomic Hydrogen by Electron Impact

Geoffrey James (Jet Propulsion Laboratory California Institute of Technology)

09:00 M1B.03 Electron Collisions with Coherently Excited Atoms. Alignment Creation and Transfer Cross Sections and their Role in Plasma Polarization Spectroscopy

Sandor Trajmar (Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA, 91109)

09:30 M1B.04 New Theory for Electron-Impact Ionization Cross Sections of Atoms and Molecules

Yong-Ki Kim (NIST, Gaithersburg, MD 20899)

10:30 M2A.01 Diode Laser Absorption Measurements of Species Concentrations

Harold Anderson (University of New Mexico)

11:00 M2A.02 Sensitive Diode Laser Based Diagnostics for Gaseous Species

William Kessler, Mark Allen, David Sonnenfroh, Steven Davis (Physical Sciences Inc., Andover, MA)

11:15 M2A.03 Relative atomic chlorine density in inductively coupled chlorine plasmas

Gregory A. Hebner (Sandia National Laboratories, Albuquerque NM, 87185)

11:30 M2A.04 Argon Metastable Densities in a High Density Plasma Processing Reactor

D. Leonhardt, C.R. Eddy, V.A. Shamamian, J.E. Butler (U.S. Naval Research Laboratory)

11:45 M2A.05 Three dimensional optical emission tomography of inductively coupled plasma in Ar

A. Okigawa, M. Tadokoro, N. Nakano, T. Makabe (Keio University, Yokohama)

12:00 M2A.06 Electric Field Measurements in an Argon Glow Discharge

M.D. Bowden, Y.W. Choi, S. Taguchi, K. Muraoka (Kyushu University, Japan)

12:15 M2A.07 Radical production mechanisms in a CF_4 RIE plasma

J.P. Booth, G. Cunge, P. Chabert, F. Neuilly, N. Sadeghi, J. Derouard (Lab. de Spectrométrie Physique, Université de Grenoble, France)

10:30 M2B.01 Nanostructured Materials Synthesis Using Hypersonic Plasma Particle Deposition

Steven L. Girshick (Department of Mechanical Engineering, University of Minnesota, Minneapolis, MN 55455, USA)

11:00 M2B.02 Measurement and Control of Thermal Plasma Jets and Sprays

Jim R. Fincke (Physics and Mathematics Group, Idaho National Engineering Laboratory, Idaho Falls, ID 83415, USA)

11:30 M2B.03 Modeling of Plasma Spray Processes

Chong H. Chang (Idaho National Engineering Laboratory, Idaho Falls, ID)

12:00 M2B.04 Small Particle Plasma Spray Technology

Thomas Bernecki (Northwestern University)

13:30 M3A.01 Electron-Impact Ionization and Dissociative Ionization of Species Relevant to Plasma Processing.

K. Becker, R. Tarnovsky (City College of CUNY, USA), R. Basner, M. Schmidt (INP Greifswald, Germany), H. Deutsch (Universitaet Greifswald, Germany)

14:00 M3A.02 Measurements of Cross Sections for Electron-Impact Dissociation of Molecules into Neutral Radicals

Hideo Sugai (Department of Electrical Engineering, Nagoya University, Nagoya 464-01, Japan)

14:30 M3A.03 Electron Impact Dissociation of Molecules and Molecular Ions

Ann E. Orel (University of California, Davis, Department of Applied Science)

M3A.04 Low-Energy Electron Interactions with CHF_3

L.G. Christophorou, J.K. Olthoff, M.V.V.S. Rao, Yicheng Wang (NIST, Gaithersburg, MD 20899)

M3A.05 Electron-Polyatomic Molecule Scattering: Experimental and Theoretical Studies for C2F6

H. Tanaka, L. Boesten (Sophia University, Tokyo, Japan), M. Kimura (Yamaguchi University), H. Sato (Ochanomizu University), M. Dillon (Argonne National Lab, Argonne, IL)

13:30 M3B.01 Boltzmann equation approach to cold collisions

Murray Holland (JILA and Department of Physics, University of Colorado, Boulder, CO 80309-0440)

14:00 M3B.02 Thermal Energy Ion-Neutral Reactions Relevant to the Interstellar Medium and Planetary Ionospheres

Nigel G. Adams (University of Georgia)

14:30 M3B.03 Proton and electron transfer for low energy collisions of H_3^+ and D_3^+ with molecular hydrogen and deuterium.

Brian L. Peko, Roy L. Champion

14:45 M3B.04 Silicon atoms in ECR oxide deposition plasmas

Edward Augustyniak, Kok Heng Chew, J. Leon Shohet, R. Claude Woods (ERC for Plasma-Aided Manufacturing, University of Wisconsin, Madison, WI 53706)

15:00 M3B.05 Contribution of ion species to thin film deposition of silicon dioxide in oxygen/silane helicon diffusion plasmas

C. Charles, R.W. Boswell (Space Plasma Group, RSPhysSe, The Australian National University, ACT, 0200)

MPA.01 The Spatial Distribution of the Electric Field in an Inductive Discharge

Robert Piejak, Valery Godyak, Benjamin Alexandrovich (OSRAM SYLVANIA INC)

MPA.02 Investigations of an Inductively Coupled GEC Reference Cell by Means of Langmuir Probes

Axel Schwabedissen, Eric C. Benck, James R. Roberts (NIST, Gaithersburg, MD)

MPA.03 Electron Properties of an Argon Inductively Coupled Plasma Measured using Laser Thomson Scattering

T. Hori, M.D. Bowden, K. Uchino, K. Muraoka (Kyushu University, Japan)

MPA.04 Argon Ion Velocity Distribution in an ICP Reactor.

N. Sadeghi (Lab Spectrometrie Phys. Grenoble Univ, Grenoble, France), M. van de Grift, D. Vender, G.M.W. Kroesen, F.J. de Hoog (Eindhoven Univ. Technology, Phys. Dept., Eindhoven, The Netherlands)

MPA.05 Mass Spectrometric Measurement of Molecular Dissociation in SF_6-Ar and O_2-Ar rf Discharges

Yicheng Wang, James K. Olthoff, Richard J. Van Brunt (NIST, Gaithersburg, MD 20899)

MPA.06 Etching Rate Characterization in a Magnetically Confined Inductive Plasma Tool

Moshe Sarfaty, Mike Harper, Noah Hershkowitz, R.C. Woods (Engineering Research Center for Plasma-Aided Manufacturing, University of Wisconsin-Madison)

MPA.07 Ion Flux and Ion Energy Distributions in an Inductively Coupled GEC Rf Refererence Cell in Chlorine

Svetlana Radovanov, Ray Forrister, Harold Anderson (The University of New Mexico)

MPA.08 Effect of Rf Ground Location in an Inductively Coupled Plasma Reactor on the Plasma Density and Ion Energy

Svetlana Radovanov, Harold Anderson (The University of New Mexico), Gary Bell, Hong-Mei Zhang, Dan Hoffman (Oak Ridge National Laboratory), Victoria Resta, Dave Rasmussen (Sematech)

MPA.09 A Simple Analytic ICP Model and Comparison to Experiment

Daniel R. Juliano, Douglas B. Hayden, David N. Ruzic (University of Illinois--Urbana)

MPA.10 Carbon Radical Measurement In Inductively Coupled CO Plasma

Masanobu Ikeda, Masafumi Ito, Masaru Hori, Toshio Goto (Nagoya University, JAPAN), Haruhiko Ito (Nagoya Municipal Industrial Research Institute, JAPAN)

MPA.11 Langmuir Probe Diagnostics using a Reference Probe in Inductively Coupled Plasmas

Michael Hopkins, Vender Vender

MPA.12 Measurement of Plasma Uniformity in an Inductively-Coupled Plasma Reactor

A.H. Sato, V.N. Todorov, X.Y. Qian (Applied Materials, Inc.)

MPA.13 Simulation of Inductively Coupled Plasma Reactors with a Fully-Implicit Fluid Transport Model

Robert B. Campbell (Sandia National Laboratories, Albuquerque, NM 87185)

MPA.14 Numerical Simulations of Low Pressure Inductively Coupled Plasmas in Geometrically Complex Reactors

Ben Yu, Hanming Wu, Anantha Krishnan (CFD Research Corporation)

MPA.15 Helicon plasma sources: Differences between M=+1 and M=-1 power coupling

Albert R. Ellingboe (Lawrence Livermore National Laboratory, Univ. of California)

MPA.16 Helicon Wave and Ion Density Measurements in an RF Plasma Deposition Reactor

Joseph Khachan, Chris Carter, Brian James, Ian Falconer (Plasma Physics Department, Sydney University)

MPA.17 A Comparison of Magnetic Probe Measurements in an Inductive Discharge

Robert Piejak, Valery Godyak, Benjamin Alexandrovich (OSRAM SYLVANIA INC)

MPA.18 Electromagnetic Field Structure in a Weakly-Collisional Inductively Coupled Plasma

Valery Godyak, Robert Piejak (OSRAM SYLVANIA INC)

MPB.01 Modeling of Cl_2/O_2 Etching Chemistry in High Density Plasma Reactors^*

Jai K. Shin (Samsung Advanced Institute of Technology), Whikun Yi (Samsung Electronics Company), Mark J. Kushner (University of Illinois, Urbana-Champaign)

MPB.02 Parametric Study of Localized Plasma Mechanisms in ICP reactors using HBr/Cl2 Gas Mixtures

J.W. Shon (Sandia National Laboratories), P. Vitello (Lawrence Livermore National Laboratory)

MPB.03 Reactor simulations of the GEC reference cell reactor with an ICP source for Ar/Cl2 and BCl3/Cl2 gas mixtures.

Ramana Veerasingam, Seung J Choi, Merle Riley (Sandia National Laboratories,New Mexico), Robert Hoekstra, Mark Kushner (U. Illinois, Urbana-Champaign,IL)

MPB.04 Simulation of Ar/CF_4 and Ar/O_2 Plasmas in the GEC Reference Cell

Shahid Rauf, Mark J. Kushner (University of Illinois, Urbana, IL 61801)

MPB.05 Model for Passivation of Trench Sidewalls

Barbara Abraham-Shrauner (Washington University)

MPB.06 Effect of Helicon Distribution Functions on Etch Profiles

Wenjing Chen, Barbara Abraham-Shrauner (Washington University)

MPB.07 Gas-Surface Dynamics and Profile Evolution during Etching of Silicon

Konstantinos P. Giapis, Gyeong Hwang, Cheryl Anderson, Michael Gordon, Teresa Moore (Caltech, Pasadena, CA), Timothy Minton (Montana State Univ., Bozeman, MO)

MPB.08 Reactor scaling for large area plasma processing

M. Meyyappan (Scientific Research Associates, Glastonbury, CT)

MPB.09 Volume of Fluids Methods Applied to Etching and Deposition

John J. Helmsen (Lawrence Berkeley National Laboratory, Center for Computational Sciences and Engineering, One Cyclotron Road, MS:50D-111, Berkeley CA 94720)

MPB.10 Comparison between RFEA and sector analysis of plasma ion energies

R.W. Boswell (Space Plasma Group, RSPhysSE, The Australian National University, ACT, 0200, Australia), A.J. Perry, G.D. Conway, S. Pautonier, C. Charles, C.A. Davis, A. Durandet (Space Plama Group, RSPhysSE. The Australian National University, ACT, 0200,.Australia)

MPB.11 Molecular Rydberg States in HydrogenNegative Ion Discharges

J. R. Hiskes (LLNL, Livermore, CA)

MPB.12 Excitation by Electrons and Fast Neutrals in N_2 Discharges at High E/n

V.D. Stojanovi\'c, B.M. Jelenkovi\'c, Z.Lj. Petrovi\'c (Institute of Physics, University of Belgrade, Belgrade, Yugoslavia)

MPB.13 Charging of the blocking capacitor in a pulsed asymmetric reactor

R.W. Boswell (Space Plasma, RSPhySSE, The Australian National University, Canberra, 0200, Australia.)

MPC.01 Electron-Impact Total Ionization Cross Sections of Atmospheric Gases and Halogen Compounds

Y.-K. Kim, W. Hwang (NIST), M.A. Ali (Howard Univ.), M.E. Rudd (Univ. Nebraska, Lincoln)

MPC.02 Electron-Impact Ionization and Fragmentation of Tetraethoxysilane (TEOS).

K. Becker (City College of CUNY, USA), R. Basner, R. Foest, M. Schmidt (INP Greifswald, Germany)

MPC.03 Excitation of unstable atomic species by controlled electron impact.

W. Kedzierski, J.W. McConkey (University of Windsor, Ontario, Canada N9B 3P4)

MPC.04 Calculated And Measured Ratecoefficients For Electron Impact = Excitation of Neutral And Singly Ionized Nitrogen

Robert M. Frost, Peter Awakowicz (Lehrstuhl für Technische Elektrophysik, Technical = University Munich, Munich, Germany)

MPC.05 Vacuum Ultraviolet Emissions Produced by Controlled Electron Impact on Si-Organic Molecules.

P. Kurunczi, K. Becker (City College of CUNY), K. Martus (William Paterson College, Wayne, NJ)

MPC.06 Characteristic Energy of Electrons in CO at High E/N

Jadwiga Mechli\'nska--Drewko, W\ladys\law Roznerski (Faculty of Applied Physics and Mathematics, Technical University of Gda\'nsk, 80-952 Gda\'nsk, Poland), Zoran Petrovi\'c (Institute of Physics, 11001 Belgrade, Yugoslavia)

MPC.07 Formula for the calculation of integral cross sections in a Fourier expansion method^+

Zhifan Chen, and Alfred Z. Msezane (Clark Atlanta University)

MPC.08 Absolute Total Cross Section Measurements for Electron Scattering on GeH_4 and SiH_4 Molecules

Pawe\l Mo\.zejko, Grzegorz Kasperski, Czes\law Szmytkowski (Faculty of Applied Physics and Mathematics, Technical University of Gda\'nsk, 80-952 Gda\'nsk)

MPC.09 OH Yields of the Dissociative Recombination of Polyatomic Ions

Theodosia Gougousi, Michael F. Golde, Rainer Johnsen (University of Pittsburgh)

MPC.10 Spectroscopic Identification of Products of Electron-Ion Recombination and Internal Excitation

Jeffery Butler, Ted Williams, Lucia Babcock, Nigel Adams (U. of Georgia, Athens, GA)

MPC.11 Recombination of Electrons with NH_4^+(NH_3)_n-Series Ions.

Miroslaw P. Skrzypkowski, Rainer Johnsen (University of Pittsburgh, Pittsburgh, Pa)

MPC.12 Small-Angle Electron Impact Excitation of Optically Allowed Transitions: Reliability of Theory^\ast

Z. Felfli, A.Z. Msezane (CTSPS, Clark Atlanta U.)

MPC.13 Ion Chemistry in Trifluoromethane CHF_3

Charles Q. Jiao, Rajesh Nagpal, Peter D. Haaland (Wright Laboratory, Wright-Patterson AFB, OH)

MPD.01 Electron Beam Modification of EEDFs in RF Plasmas

Alec Goodyear, N.St.J. Braithwaite (Open University, Oxford Research Unit, Oxford, UK)

MPD.02 Plasma Generation in High-Current Ion Sources

A.B. Filuk, M.E. Cuneo, T.A. Mehlhorn, T.D. Pointon, R.A. Vesey (Sandia National Laboratories), D. Welch (Mission Research Corporation)

MPD.03 Investigations of the 147 nm radiative efficiency of Xe Surface Wave Discharges

N.D. Gibson, U. Kortshagen, J.E. Lawler (Physics Department, University of Wisconsin, Madison, WI 53706)

MPD.04 Excimer Emission using 20keV Electron Beam Excitation

J. Wieser, A. Ulrich (TU München), D.E. Murnick (Rutgers University)

MPD.05 Experimental and Theoretical Studies in the Pulsed Xenon Medium Pressure Discharge

Eckhard Kindel, Detlef Loffhagen, Conrad Schimke (Institut für Niedertemperatur-Plasmaphysik, 17489 Greifswald, Germany)

MPD.06 Quantitative Analysis of a Stabilized Discharge-Pumped XeCl Laser

Serguei Gortchakov, Detlef Loffhagen, Rolf Winkler (Institut für Niedertemperatur-Plasmaphysik, 17489 Greifswald, Germany, Institute of High Current Electronics, Russian Academy of Sciences, 634055 Tomsk, Russia)

MPD.07 Abnormal beharviors of O_2^- mobility in O_2/O_3 mixtures.

H. Itoh, K. Norimoto, T. Hayashi (Chiba Institute of Technology)

MPD.08 New Laser Induced Fluorescence Studies of Low Temperature Noble Gas Discharges

A.M. Paterson, I.S. Borthwick, R.S. Stewart (University of Strathclyde,Glasgow,Scotland)

MPD.09 Diffusive Cooling of Ions in a Hollow Cathode Discharge

K.L. Mullman, M. Sakai, J.E. Lawler (Physics Department, University of Wisconsin, Madison, WI 53706)

MPD.10

MPD.11 Pulsed Discharge Excited Argon Clusters Formed in a Supersonic Slit Expansion

E. Thoreson, M. Terrell, M. Deebel, R.E. Miers, M.F. Masters (Indiana Purdue University Fort Wayne)

MPD.12 Radical Density Measurements in an Oxyacetylene Torch Diamond Growth Flame

M.D. Welter, K.L. Menningen (University of Wisconsin - Whitewater)

MPD.13 Contaminant Ion Effects on PSII Fabricated Diodes

R.R. Speth, J.L. Shohet, J.H. Booske, H. Liu (Engineering Research Center for Plasma-Aided Manufacturing, University of Wisconsin-Madison)

MPD.14 The Kinetics of processes in decaying plasma of a Jet Diaphragm-Type Discharge

E.V. Kalashnikov (Vavilov State Optical Institute, St. Petersburg, 199034 Russia)

MPD.15 The Effect of Precursor Composition on 2-D CF_2 Concentration in C_xH_yF_z/Ar Plasmas in the GEC rf Reference Cell Measured by Planar Laser-Induced Fluorescence

Kristen L. Steffens, Michael R. Zachariah (National Institute of Standards and Technology, Gaithersburg, MD)

MPD.16 Time-resolved negative ion flux from a pulsed inductive discharge

Brian Smith, Lawrence Overzet (University of Texas at Dallas, Richardson, TX)

MPD.17 Compact slot antenna type plasma source: Improvement of performance by magnet confinement

D. Korzec, Ch. Seibert, J. Engemann (University of Wuppertal, Microstructure Research Center - fmt)

MPD.18 Positive voltage-current characteristics caused by electron-impact mixing of excited atomic levels

Timothy J. Sommerer (Corporate Research and Development, General Electric Company, P. O. Box 8, Schenectady, New York 12301 USA)