Program overview

THURSDAY MORNING, 24 OCTOBER 1996

08:00 H1A.01 Flowing Microwave H atom source

A. Rousseau, P. Chabert, G. Gousset, P. Leprince (LPGP, UPS-Orsay, France)

08:15 H1A.02 Effects of Minority Species on Plasma Composition in Microwave -Driven Ion Sources

David Spence, Keith R. Lykke (Argonne National Lab, Argonne, IL)

08:30 H1A.03 A Self-Consistent Zero-Dimensional Numerical Description of a Nonequilibrium Hydrogen Plasma

U.M. Kelkar, M.H. Gordon, L.A. Roe (High Density Electronics Center, University of Arkansas, Fayetteville, AR 72701)

08:45 H1A.04 Growth of Particles in Plasmas of Tetraethoxytitanium-Oxygen- Helium-Mixtures

Mario Bica de Moraes, Nilson Da Cruz, Steven Durrant (University of Campinas, SP, Brazil)

09:00 H1A.05 Particle dynamics in a strongly-coupled dusty plasma

R.A. Quinn, J. Goree, J.B. Pieper (The University of Iowa)

09:15 H1A.06 A Study of Neutral Behaviour in an ECR Discharge

M.D. Bowden, W. Cronrath, K. Uchino, K. Muraoka (Kyushu University, Japan), N. Sadeghi (Laboratouire de Spectrometrie Physique, France)

09:30 H1A.07 Transport phenomenon in a Helicon Activated Reactive Evaporation system

C.A. Davis, A. Durandet, R.W. Boswell (Space Plasma Group, R.S.Phys.S.E., The Australian National University, Camberra, ACT, 0200, Australia)

09:45 H1A.08 The Effect of Bumps and Probes on the Ion Distribution Functions in High Density Discharges Containing Ar and Ar/Cl Mixtures

J.R. Woodworth, B.P. Aragon (Sandia National Laboratories), T.W. Hamilton (Applied Physics International)

08:00 H1B.01 Global Warming Potenials of SF_6 and CF_4 and Implications Concerning Future Use of These Gases in Processing and Power Systems.

R.J. Van Brunt (NIST, Gaithersburg, MD 20899)

08:30 H1B.02 Pilot Plant Tests of Gas Cleaning by Electron Beam and Corona Discharge Techniques

Jen-Shih Chang (McMaster University, Dept.of Eng.Phys., Hamilton, Ontario, Canada)

09:00 H1B.03 Effect of Closely Interacting Microstreamers on Energy Efficiency

Xudong ``Peter'' Xu, Mark J. Kushner (University of Illinois, Urbana, IL 61801)

09:15 H1B.04 Removal of Tricholoethylene from Air Streams by a Superimposed Barrier Discharge Plasma Reactor

kuniko Urashima (McMaster University, Dept.of Eng.Phys., Hamilton, Ontario, Canada), Tairo Ito (Musashi Insititute of Technology, Dept.of E&E Eng., Tokyo, Japan), Jen-Shih Chang (McMaster University, Dept.of Eng.Phys., Hamilton, Ontario, Canada)

09:30 H1B.05 Application of Plasma Arcs to the to the Remediation of Shipboard Waste(Supported by ONR and NSWC.)

John L. Giuliani (Naval Research Laboratory)

10:30 H2A.01 A Study of Plasma-Surface Interactions during ECR Plasma Etching of S i in Cl_2

Kouichi Ono (Mitsubishi Electric Corp., Advanced Technology R&D Center, Amag asaki 661, Japan)

11:00 H2A.02 Beam Studies of Etching Si and WSi_x with Chlorine and Oxygen

Gowri Kota, John Coburn, David Graves (University of California, Berkeley, CA)

11:15 H2A.03 On the Origin of the Notching Effect in Uniform High Density Plasmas

Gyeong S. Hwang, Konstantinos P. Giapis (Caltech, Pasadena, CA)

11:30 H2A.04 Microwave spectroscopic measurements of intermediate products in ECR silicon oxide deposition plasmas

R. Claude Woods, Edward Augustyniak, Kok Heng Chew, J. Leon Shohet (ERC for Plasma-Aided Manufacturing, University of Wisconsin, Madison, WI 53706)

11:45 H2A.05 GaAs Surface Chemistry and Surface Damage in a Cl_2/Ar High Density Plasma Etching Process

C.R. Eddy Jr., O.J. Glembocki, D. Leonhardt, V.A. Shamamian, R.T. Holm, J.E. Butler (U.S. Naval Research Laboratory), S.W. Pang (University of Michigan)

12:00 H2A.06 Plasma Processing for Flat Panel Displays: Mechanisms for Polysilicon Passivation in Hydrogen Plasmas

Amy E. Wendt (Dept. of Electrical and Computer Engineering and ERC for Plasma-Aided Manufacturing, University of Wisconsin, Madison, WI 53705)

10:30 H2B.01 Electron Energy Degradation in Rare Gases.

M. Dillon (Argonne National Lab, Argonne, IL), M. Kimura (Yamaguchi University)

10:45 H2B.02 Argon Metastables at High Degrees of Ionization

R.F. Fernsler, M. Lampe, W.M. Manheimer, D. Leonhardt, C.R. Eddy, V.A. Shamamian, & J.E. Butler (Naval Research Laboratory)

11:00 H2B.03 Dust Transport in a Strongly Coupled Plasma

Helen H. Hwang, Mark J. Kushner (University of Illinois, Urbana, IL 61801)

11:15 H2B.04 A two dimensional modeling of capacitively coupled plasma reactor

N. Nakano, T. Makabe (Keio University, Yokohama)

11:30 H2B.05 Three-dimensional DSMC Simulations of the GEC Reference Cell Reactor

Marc Rieffel, Stephen Taylor (Scalable Concurrent Programming Laboratory, Caltech, Pasadena, CA), Sadasivan Shankar (Intel Corporation)

11:45 H2B.06 PIC Simulations of Pulsed-power O_2 Discharges

Venkatesh P. Gopinath (U. C. Berkeley, Berkeley, CA), Vahid Vahedi (Lam Research Corporation, Fremont, CA)

12:00 H2B.07 High-Resolution, Adaptive Simulation of Inductively Coupled Plasma Reactors

Milo R. Dorr, Phillip Colella (Lawrence Berkeley National Laboratory, Center for Computational Sciences and Engineering, One Cyclotron Road, MS:50D-141, Berkeley CA 94720), Daniel D. Wake (Lawrence Livermore National Laboratory, University of California at Davis, P.O. Box 808, L-416, Livermore, CA 94551)

12:15 H2B.08 Modeling of atmospheric pressure discharges

M. Meyyappan, T.R. Govindan (Scientific Research Associates, Glastonbury, CT), Peter Ventzek (Hokkaido University)

13:30 H3A.01 Formation of Methanol and Dimethyl Ether in Dielectric Barrier Disch arges

Ulrich Kogelschatz (ABB Corporate Research, 5405 Baden, Switzerland)

13:45 H3A.02 Hollow Electrode Discharge Triodes

K.H. Schoenbach, F.E. Peterkin, T. Tessnow (Physical Electronics Research Institute, Old Dominion University, Norfolk, VA), W.C Nunnally

14:00 H3A.03 Hydrogen fractional dissociation in H_2/He mixture discharges

B.N. Ganguly, P. Bletzinger, R. Nagpal (Wright Laboratory, WPAFB, OH)

14:15 H3A.04 Measurements of N_2(A) Metastable State Density in a Nitrogen Glow Discharge

J.Sebastian Oddone, Juan A. Curial, Tony J. Coschignano, Kenneth A. Hardy, J.W. Sheldon (Physics Department, Florida International University)

14:30 H3A.05 Optical Pumping of a He RF Discharge

M.A. Humphrey (Western Michigan University), B.G. Birdsey (University of Nebraska-Lincoln), K.W. Trantham (The Australian National University, Canberra, Australia), H. Batelaan, T.J. Gay (University of Nebraska-Lincoln)

13:30 H3B.01 3D Modeling of a dc glow discharge in argon, and comparison with experiment

Annemie Bogaerts, Renaat Gijbels (University of Antwerp, Dept. of Chemistry, Belgium)

13:45 H3B.02 3-D PIC-MCC Simulation of DC Glow Discharge

Vladimir Serikov, Kenichi Nanbu (Institute of Fluid Science, Tohoku University, Sendai 980-77, Japan)

14:00 H3B.03 Determination of the Self--Consistent Space Charge Potential Using the Nonlocal Approach

Eric J. Bennett, William F. Bailey (Air Force Institute of Technology, Wright--Patterson AFB, OH)

14:15 H3B.04 Numerical Simulations of Glow Discharge between Two dissimilar electrodes in a Body Fitted Coordinate System

Wei "Ivy" Qin, Ira M. Cohen, P.S. Ayyaswamy (University of Pennsylvania)

14:30 H3B.05 Fluid Analysis of the DC Positive Column with Nonzero Ion Temperature.

John Ingold (One Bratenahl Place #610, Bratenahl, OH 44108)

14:45 H3B.06 Benchmark Monte Carlo simulations of positive column discharges

J.E. Lawler, U. Kortshagen (Physics Department, University of Wisconsin, Madison, WI 53706), G.J. Parker (Lawrence Livermore National Lab)

15:00 H3B.07 On the treatment of wall losses of energetic electrons in nonlocal Boltzmann calculations

U. Kortshagen (Univ. of Minnesota--Minneapolis, Mech. Eng.), J.E. Lawler (Univ. of Wisconsin--Madison), G.J. Parker (Lawrence Livermore National Laboratory)

15:15 H3B.08 New Convected Scheme simulations of positive column discharges

G.J. Parker (Lawrence Livermore National Laboratory), U. Kortshagen, J.E. Lawler (Univ. of Wisconsin--Madison)