Invited Paper
AA 1 Transformer Coupled Plasma: An Inductive Source for Advanced
Semiconductor Manufacturing.
Ralph Kerns, LAM Research.
Contributed Papers
AA 2 Control of Radicals in Fluorocarbon Plasma by Heating Walls and/or
Pulsing RF Powers.
H. Sugai, K. Nakamura, Nagoya University, Nagoya,
Japan; Y. Hikosaka, M. Nakamura, Fujitsu Ltd., Kawasaki, Japan.
AA 3 Instability Mechanisms in Inductive Glow Discharges.
John Holland
and Michael Barnes, Lam Research Corporation, Fremont, CA.
AA 4 Modification of Inductive Plasma Sources by RF B-Fields.
T.D. Rognlien, R.H. Cohen, G.J. DiPeso, V. Vahedi, and D.W. Hewett,
Lawrence Livermore National Laboratory.
AA 5 Silicon Dioxide Etch Characterization in a Planar Inductively-
Coupled Plasma (TCP) as a Function of RF and Geometric Coil
Parameters.
A.J. Lamm., Lam Research Corp., Fremont, California
94538.
AA 6 Symmetric Rate Model for Fluorocarbon Plasma Etching of $SiO_{2}$.
Noah Hershkowitz and Ji Ding, University of Wisconsin-Madison.
AA 7 The Characteristics of the Transformer-Coupled Plasma (TCP)
Photoresist Stripper.
Y. Ra, J. Yang, W.-B. Chow, and C.-H. Chen,
Lam Research Corporation, Fremont, California.
Invited Papers
AB 1 Recent Advances in Atomic and Molecular Collisions: Experimental
Electron-Metal Atom Scattering.
Bernhard Stumpf, Dept. of Physics,
University of Idaho.
AB 2 Recent Progress in Electron-Metal Atom Scattering Theory.
K. Bartschat, Drake University.
Contributed Papers
AB 3 Orbital Effects in Elastic Electron Scattering by a Polarized
Excited Target.
Z. Shi, C.H. Ying, New York U.; and L. Vuskovic,
Old Dominion U.
AB 4 Full Atom Beam Cooling and Electron Collision.
C.H. Ying, Z. Shi,
New York U.; and L. Vuskovic, Old Dominion U.
AB 5 Electron Collisions with Cold Trapped Atoms: A New Method for
Measuring Cross Sections.
R. Scott Schappe, Paul Feng, Thad G.
Walker, L.W. Anderson, and Chun C. Lin, U. of Wisconsin.
AB 6 Temporary Negative Ion States of Na, K, Rb and Cs.
P.D. Burrow and
A.R. Johnston, U. of Nebraska, Lincoln.
Invited Paper
Contributed Papers
BA 3 Efficient Negative Ion Formation in UV-Laser Irradiated Silane:
Implications for Plasma Deposition of Amorphous Silicon.
BA 4 Photodetachment in a Dusty RF Discharge.
BA 5 Negative Ion Kinetic Energy Distributions in Etching Plasmas.
BA 6 Photodetachment of $SF_{6}^{-}$ and $C_{6}F_{6}^{-}$ Negative Ions
in the Gaseous Phase.
Invited Paper
Contributed Papers
BB 3 Degenerate Four-Wave Mixing Diagnostics of Atmospheric Pressure
Plasmas.
BB 4 A Microwave Spectroscopy System for Plasma Diagnostics in an
Electron Cyclotron Resonance (ECR) Deposition Reactor.
BB 5 Optical Emission and Electrical Discharge Properties of High
Pressure Pulsed RF Gas Discharges.
BB 6 Optical Emission Tomography of RF Plasma Processing Tools with Small
Windows.
BB 7 Collisional Ionizations in Neon DC Discharge.
Invited Paper
Contributed Papers
CA 3 Secondary Electron and Anion Emission from Surfaces at Low Impact
Energies.
CA 4 Dependence of Surface Dissociation of $CH_{x}^{+}$ Ion on Bombarding
Energy.
CA 5 Energy Transfer Dynamics of Low Energy Ions Incident on Gold.
CA 6 An In situ Investigation of Plasma-Surface Interactions During
PECVD.
Invited Paper
Contributed Papers
CB 3 $H_{\alpha}$ (Balmer) Spectral Profiles Obtained from $H-{2}$ RF
Plasma Discharges Studied by Intracavity Laser Spectroscopy.
CB 4 2-D Argon Metastable Density Measurements in RF Plasmas by Laser-
Induced Fluorescence Imaging.
CB 5 Thomson scattering experiments on a 100 MHz argon Inductively
Coupled Plasma.
CB 6 Population and Temperature Measurements in a Nonequilibrium
Microwave Plasma.
CB 7 Multi-Variable Feedback Regulation of Plasma Processing Reactors.
DA 2 Rotational/Vibrational Excitation within $\Chi^{1}\Sigma^{+}_{g}$
State of $N_{2}$ in a Pulsed Electrical Discharge.
DA 3 Atomic Density measurement of Cu in a Cylindrical magnetron
Discharge.
DA 4 Theoretical Study of the $B^{2}A^{'}_{1}-X^{2}A^{"}_{2}$ Band
Transition of $CH_{3}$.
DA 5 Carbon Content Analysis of Mineral Coal Using Hollow Cathode Plume
Spectroscopy.
DA 6 Electron Energy Distribution Function in an RF Inductive Discharge
over a Wide Range of Argon Pressure.
DA 7 Magnetic Field Distribution Measurements in a Low Pressure Inductive
Discharge.
DA 8 Measurement of Electron Densities in non-resonant Microwave-powered
Gas Discharges.
DA 9 Electrical Impedance of Plasma Sheaths and Plasma Glow Regions of
Asymmetric RF Discharges in Argon.
DA 10 X-Ray Imaging During Plasma-Source Ion Implantation.
DA 11 Comparison of Microwave Interferometer and Langmuir probe results in
the GEC reference reactor.
DA 12 Mass Spectrometric Diagnostic of a D.C. Electrical Discharge During
a Plasma Nitriding Process.
DA 13 The UK GEC Reference Reactor: comparison with previous benchmarks
and time-resolved data.
DA 14 Time resolved impedance measurements of pulsed rf discharges.
DA 15 Fractional dissociation of hydrogen in an rf discharge determined by
probe and emission measurements.
DA 16 Thomson Scattering Diagnostics of an Excimer Laser Plasma Using a
Picosecond Laser.
DA 17 Gas Temperature Dependent Efficiency of Atomic Argon and Xenon
Lasers.
DA 18 Ion Energy Distributions for $Ar^+$ Ions in Argon-Nitrogen Mixtures.
DA 19 Kinetic Energy Distributions of Ions Sampled from RF Glow Discharges
in Hydrogen.
DA 20 Temporally and Spatially Resolved Measurements of Optical Emission
from RF Glow Discharges in Hydrogen.
DA 21 Measurement of Hydrogen Dissociation in a Helical Resonator
Discharge.
DA 22 Uniformity Measurements - Comparing Two Diagnostics.
DB 2 Small-Angle Differential and Integral Cross Sections for K 4s-4p.
DB 3 Measurements of Absolute Total Electron Scattering Cross Sections
using Laser-cooled Atoms.
DB 4 Electron Excitation Cross Sections for 2p levels of Argon.
DB 5 Electron Density Measurement in GEC rf Plasma by Laser Induced
Fluorescence.
DC 2 New Results for the Dissociative Recombination of $H_{3}^{+}$.
DC 3 Comparison of Vibrational Populations Generated in E-I Recombination
of $HCO^+$ and $N_{2}H^{+}$ with Bates' Theory.
DC 4 Vibrational States Populated in E-I Recombination of O- and S-
containing Ions.
DC 5 Electron-Ion Recombination Measurements in Flowing Afterglow
Plasmas.
DC 6 Flash X-ray Excitation of HIgh Pressure Rare Gases.
DC 7 Photofragmentation of the $H_{3}(2s ^{2}A^{'}_{1}, 2p ^{2}A^{"}_{2},
3s ^{2}A^{'}_{1}, 3d ^{2}E^{"})$ Molecule.
DD 2 Time Dependence of the Subexcitation Electron Distribution
Generated by High-Energy Electrons.
DD 3 Modeling of Ion Transport on a Parallel Computer.
DD 4 Monte Carlo Simulations of Electron Transport Across a Magnetic
Filter.
DD 5 Spatially Resolved Energy Distribution and Transport Coefficients of
Electrons between Absorbing Electrodes.
DD 6 Electron Drift Velocities in Mixtures of Helium with Argon, Krypton
and Xenon.
DD 7 Electron Drift Velocity Measurements in $SiF_{4}$-Argon Gas
Mixtures.
DD 8 Electron Drift Velocities and Apparent Ionization Coefficients in
Binary Mixtures of Argon, Carbon Monoxide, Carbon Dioxide and
Nitrous Oxide.
DD 9 Mercury Diffusion in an AC Hg-Argon Low Pressure Discharge.
DD 10 Corelation of Anisotropies in Scattering and in Velocity
Distribution on Electron Transport Properties.
DD 11 Momentum and Energy Balance in the FTI Analyses of the Electron
Transport.
DD 12 Electron Energy Distribution in Nitrogen at 1-2 kTd.
DD 13 Coupled transport of Hydrogen ions at high E/N.
DD 14 Thermal Plasma Heat Transfer Characteristics for a Cylinder in Cross
Flow.
DD 15 The Ion Boundary layer in Strongly Ionized Thermal Plasmas.
DD 16 Loss processes of $N_{2}$ metastable molecules by $CH_{4}$.
DD 17 Spatially Dependent EEDF by Solving Boltzmann's Equation Using Flux
Corrected Transport for Low Pressure Plasma Reactors.
DD 18 Characteristic Energy and Ratio of Longitudinal Diffusion
Coefficient to Mobility for Electrons in Hydrogen at Moderate E/N.
Contributed Papers
EA 2 Power deposition mechanisms in a helicon plasma source.
EA 3 Silicon transport properties in an Helicon Activated Reactive
Evaporation.
EA 4 Characterization of Chlorine/Argon ECR Plasmas for the Etching of
GaAs.
EA 5 Influence of the Static Magnetic Field Intensity on the Spatial
Distribution of Excited Atoms in an Surface-Wave-sustained (SW)
Magnetoplasma.
EA 6 A Study of Ion Velocity Distributions in an ECR Discharge.
EA 7 A Process Model for ECR Plasma Processing.
EA 8 Propagation of Helicon Waves away from an Antenna.
Contributed Papers
EB 2 Separation of Collision Term of the Boltzmann Equation.
EB 3 Diffusion Tensor in an Radiofrequency Electron Swarm.
EB 4 Electron Swarms in the Upstream Region of an Electron Source.
EB 5 Electron Transport Coefficiants in Methane-Rare Gas Mixtures.
EB 6 Temporal Sheath Dynamics.
EB 7 Langmuir Probe and Simulation Results on the GEC Reference Cell.
Invited Paper
Contributed Papers
HA 2 Ion Energy Distribution Functions in an Inductively Coupled RF-
Discharge.
HA 3 Electron Distribution in an Inductively Coupled RF Discharge.
HA 4 Electric Probe Characterization of a Multidipole-Confined RF
Inductively-Coupled Plasma Etching Source.
HA 5 Effects of Chamber Aspect Ratio on Uniformity in a Low Pressure
Planar Inductive Argon Discharge.
HA 6 Simulations of real-time feedback control of 2-dimensional features
in inductively coupled plasmas.
HA 7 Scaling of Inductively Coupled Plasmas.
HA 8 A 2-D Model of Polysilicon Etching in an Inductively Coupled Plasma
Source.
Invited Papers
HB 2 Absolute generalized oscillator strength measurement of valence and
inner-shell excitations of Freons.
Contributed Papers
HB 4 Electron-Impact Ionization of $CH_{x} (x=1-4)$.
HB 5 Dissociative Electron Attachment to Chloroalkenes.
JA 2 Si and SiH3 radicals in On-Off Modulated ECR SiH4 Plasma.
JA 3 Waveguide Based Field Applicator for Large Diameter Plasma
Generation.
JA 4 Electromagnetic Performance of a Surfatron-based Coaxial Microwave
Plasma Torch.
JA 5 Behavior of Lithium in a Microwave Resonant Cavity Discharge.
JA 6 The Ring-Resonator - A New Concept for the Microwave-Excitation of
Gas-Discharges.
JB 2 Observation of non-thermal electron tails in novel geometry helicon
plasma.
JB 3 Quasineutral Particle Simulations of ECR Plasma Processing Devices.
JB 4 Simulation of the cathode fall region of a cylindrical magnetron
discharge.
JB 5 Modelling helicon plasma wave fields using ANTENA.
JB 6 Thomson Scattering Measurements of Spatial Profiles of $T_{e}$
and $N_{e}$ in an ECR Discharger.
JB 7 Breakdown, steady-state and decay regimes in pulsed oxygen helicon
diffusion plasmas.
JB 8 Comparison between plasma potential and ion transport in an
extended Helicon source/diffusion chamber system.
JB 9 Negative Ion Measurements In ECR Plasmas By Using Omegatron Mass
Analyzer.
JC 2 Energy Distributions of Charged Species in the Volume and Incident
on the Walls of Electropositive and Electronegative DC Positive
Column Discharges.
JC 3 Measurement of the XeI 147 nm Resonance f-value.
JC 4 Radiation Trapping Simulations for the XeI 147 nm Resonance Line.
JC 5 Simulation of the Angular Distribution of Resonance Radiation from a
Positive Column Discharge.
JD 2 Plasma Chemistry Effects on $SiO_{2}$ to Si Selectivity in a High
Density Fluorocarbon Plasma.
JD 3 Mass Spectrometric Studies Of High Density Inductively Coupled
Plasmas for Selective Oxide Etch.
JD 4 Measurement of Deposition Uniformity in PECVD of Silicon Nitride and
Silicon Oxide.
JD 5 Plasma Process Uniformity in a High Density System: Experiment and
Modeling.
JD 6 Submicron Anisotropic Etching of Tungsten at Moderate Low-
temperature using a Large Diameter Microwave Magnetoplasma.
JD 7 Relationship between the plasma and the electronic, mechanical and
structural properties of C2H2 polymerized by RF discharge.
JD 8 Plasma Polymerization of Ethane, Propane and Acetylene: a
Comparative Study of the Discharge and Film Properties.
JD 9 The properties of a microwave-generated plasma for the deposition of
polycrystalline diamond films.
JD 10 Spectroscopy of a Diamond CVD Reactor using Synchrotron Radiation.
JD 11 Study of Diamond Growth From a Variety of Input Gases.
JD 12 Oxygen and Iron Implantation of Glass for Non-metallic Magnetic Hard
Disks.
JD 13 Microstructure and Corrosion Resistance of Nitrogen Plasma Treated
Aluminum.
JD 14 DC Magnetron Reactive Sputtering Model with Two Species of Ions.
JD 15 Formation of Fluorocarbon Thin Films using Plasma CVD Assisted by
Selective Radical Source.
JD 16 Electron Kinetics and Plasma Chemistry in Plasma Polymerization
Coatings for Laser Fusion Targets.
JD 17 2D Modeling of Microwave Plasma Enhanced Diamond CVD.
JE 2 Gas Phase Reactions of Fluorocarbon Radicals in $CHF_{3}/H_{2}$ and
$CHF_{3}/O_{2}$ ECR Downstream Plasmas.
JE 3 Self-consistent electron and heavy-particle kinetics in
$N_{2}-O_{2}$ plasmas.
JE 4 Population Inversion between $(A^{3}\Sigma^{+}_{u},\upsilon")$ and
$(B^{3}\Pi_{g},\upsilon')$ States in a Positive Column of Nitrogen
Pulsed Discharge.
JE 5 Spatially-Resolved Mass Spectroscopy of Hydrogen and Other Light
Hydrocarbon Species in the Boundary Layer During the Deposition of
Diamond Thin Films.
JF 2 Vibrational Relaxation of Ozone in Electron-Irradiated
$O_{3}/Ar/N_{2}/O_{2}$ Mixtures.
JF 3 Accuracy Issues in Surface Deactivation Measruements on Flowing
Vibrationally Excited $N_{2}(X,v)$ Gas Using Coherent Anti-Stokes
Raman Spectroscopy (CARS).
JF 4 Elastic and Inelastic Processes in Collisions of $H^{+}$ Ions with
$CH_{4}$ Molecules below 1 keV.
JF 5 Excitation in the Products of Helium Metastable Reactions.
JF 6 Electron Detachment and Charge Transfer for Collisions of Negative
Ions with Ozone.
JF 7 Distribution of Unimolecular Lifetimes in Ion-molecule Association
Reactions.
JF 8 Positive Ion-Molecule Reactions in Methane.
JF 9 Model Potentials for Rare Gas Metastable Interactions.
JF 10 Highly Rotationally Excited NO(v,J) in the Thermosphere due to Solar
and Auroral Energy Deposition.
JF 11 Collisionally Induced Subthermal Nitric Oxide Spin-Orbit
Distributions in the Thermosphere.
JF 12 Inelastic Processes in Collisions of $H\pm$ Ions with C,N, and O
Atoms at Collision Energies in the low keV Range.
JF 13 Effects of Velocity Dependent Cross Sections on the Thermal Mobility
of Ions in Gases.
Invited Papers
KA 2 The Large Screen Opportunity of Plasma Displays.
Contributed Papers
KA 4 Comparison of Fluid and Particle 1-D Simulations of AC Plasma
Display Panels.
KA 5 The Kinship of a GEC RF Reference Cell and an ac-Plasma Display
Cell.
KA 6 Kinetic Corrections for HD Simulations of AC-PDPs.
Contributed Papers
KB 2 Ramsauer Effect in Atoms with Incomplete p-subshell.
KB 3 Electron Excitation out of the Metastable Levels into the $3^{3}S$,
$3^{3}D$, and $3^{1}D$ Levels of the Helium Atom.
KB 4 Absolute Measurements of Optical Oscillator Strengths of Nobel Gas
Resonance Lines.
KB 5 Momentum Transfer and Vibrational Excitation Processes in Electron
Scattering with $C_{2}F_{6}$ and $C_{3}F_{8}$ Molecules.
KB 6 Elastic Scattering and Vibrational Excitation Cross Sections for
Electron Collisions with $C_{2}F_{6}$.
KB 7 Calibration of Cross Sections Derived From Swarm Data.
KB 8 Techniques for Identifying Excited States Populated in E-I
Recombination.
LA 2 Generation of Ammonia and Nitrogen Radicals by DC and RF Discharge
Plasmas for NOx Reduction in a Semiconductor Process Flue Gas.
LA 3 Treatment of Gaseous Wastes in a Very High Voltage Dielectric
Barrier Discharge.
LA 4 Experimental and Mathematical Modeling of Gas-Discharge Methods of
Troposphere Cleansing from Chlorofluorocarbons (CFC's).
LB 2 Electrode Effect on $S_{2}F_{10}$ Production in Negative Corona
Discharges.
LB 3 Positive and Negative Coronas in $SF_{6}$.
LB 4 Production of $S_{2}F_{10}$, $S_{2}OF_{10}$, and $S_{2}O_{2}F_{10}$
from Spark and Glow-Type Corona Discharges in $SF_{6}/O_{2}$ Gas
Mixtures.
LB 5 Breakdown Time Statistics for an Electrical Discharge in Argon.
LB 6 Electrode Erosion in High Currents Arcs in Argon and Nitrogen.
LB 7 Attractor Model for Breakdown Instabilities in Microwave-powered Gas
Discharges.
LB 8 Solar Array Arc Dynamics in the Presence of Magnetic Field.
LB 9 Nonstationary Behavior of Pulsating Point-Dielectric Discharges Due
to Discharge-Induced Increase in Dielectric Surface Conductivity.
LB 10 Spectroscopy of a Turbulent Rotating Plasma in $SF_{6}$. C.
LB 11 Theory of Cathode Spots in Arcs in Thermal Plasmas.
LC 2 2-D Fluid Simulations of an AC Plasma Display Panel.
LC 3 1-D Multispecies Fluid Modeling of a He-Xe Plasma Display Panel
Cell.
LC 4 The Dynamics of a Discharge in an ac-pdp Cell Near the Breakdown
Threshold.
LC 5 Electron Driven Rates in HeXe Mixtures for Color PDPs.
LC 6 1D Modeling of AC Plasma Displays.
LD 2 Electron-Impact Ionization of the $SO_{2}$ Molecule.
LD 3 $O(^{1}S)$ Production Following Electron Impact Dissociation of
$NO_{X}$.
LD 4 Fragmentation of Argon Clusters into Neutral Metastable Fragments by
Electron Impact.
LD 5 VUV Spectra From RF Discharges in $SF_{6}$ and $CF_{4}$.
LD 6 Electron-Impact Excitation of the the Second Positive Band System
$(C^{3}\Pi_{u}-B^{3}\Pi_{g})$ of the Nitrogen Molecule.
LD 7 Measurement of Electron Excitation Cross Section of the First
Positive Band System $(B^{3}\Pi_{g}-A^{3}\Sigma^{+}_{u})$ of the
Nitrogen Molecule by Fourier Transform Spectroscopy.
LD 8 Thermal Electron Attachment to Halocarbons.
LD 9 Observation of Autoionization in $O_{2}$ by an Electron-Electron
Coincidence Technique.
LD 10 The Covariance Mass Spectrum of Hexamethyldisiloxane (HMDSO) at an
Electron Impact Energy of 40 eV.
LD 11 Simple, Effective Model for Electron-Impact Ionization of Atoms and
Molecules.
Invited Papers
MA 2 Total Cross Sections for Electrons Scattered from Atomic and
Molecular Hydrogen.
Contributed Papers
MA 4 Intracavity Laser Spectroscopy of RF Plasmas of Methane and Benzene
Used in Depositing Diamondlike Carbon Films.
MA 5 Discharge Parameter Dependence of Growth Precursors in Thermal
Plasma Assisted Diamond Film Deposition.
MA 6 Relationship between atomic hydrogen concentration and the quality
of diamond like carbon (DLC) thin films.
MA 7 Quantitative Measurement of $CH_{3}$ Radicals in a Hot-Filament
Reactor for CVD of Diamond Films by Cavity Ring-Down Spectroscopy
(CRDS).
Contributed Papers
MB 2 Two Dimensional Electromagnetic and Kinetic Analysis and Comparison
with Experiments for Inductively Coupled RF Discharge.
MB 3 The Effect of Coil Configuration on Confinement of Plasmas in Remote
Plasma Enhanced CVD Reactors.
MB 4 Modeling of a self-sustained discharge-excited ArF excimer laser
-Effect of laser light on the discharge development.
MB 5 Dominant Dissociation and Ionization Channels in Nitrogen-Hydrogen
Discharges.
MB 6 A model of the low current argon-xenon positive column.
MB 7 Investigations of Single Filament Properties of Excimer Barrier
Discharges in Krypton and Xenon.
Invited Paper
NA 2 Modeling of ion flux uniformity in radio frequency discharges:
effect of electrode topography.
NA 3 Measurements of the Electric Field in the Sheath Region of a Helium
RF Discharge.
NA 4 Non-Collisional Sheath Heating.
NA 5 Kinetic Energy Distributions of Ions Sampled from RF Glow Discharges
in Helium, Nitrogen, and Oxygen.
NA 6 Kinetics of Formation and Loss of $S_{2}$ in a Pure $SF_{6}$ RF
Discharge.
NA 7 The Effects of a Small Transverse Magnetic Field Upon a Capacitively
Coupled rf Discharge.
NA 8 Rf Discharge Simulations: GEC Reference Cell.
NA 9 The observation of a double layer in a rf generated hydrogen plasma.
NB 2 Wide Area (16") Radio-Frequency Induction Coupled Plasma Generation
and its Applications.
NB 3 Stability of the Inductively Coupled Discharge System.
NB 4 Measurement of Ar Metastable Concentration in a Planar RF Inductive
Argon Discharge.
NB 5 Discharge Physics Study of an ICP Source.
NB 6 Modeling Inductively Coupled Electronegative Plasmas.
NB 7 A Hybrid Model of an Inductively Coupled Plasma.
NB 8 Comparison of Ion Energy Distribution Functions in a Capacitively
and Inductively Coupled RF-Discharge.
NB 9 Comparison of Langmuir probe characterization and model predictions
in a high density ICP Source.
NB 10 Self-Consistent Kinetic Modeling of a Low-Pressure Iductively
Coupled RF Discharge.
NB 11 Characteristics of a low pressure inductively coupled RF discharge.
NC 2 Oscillations and Constrictions for Cathode-Dominated, Low-Pressure
Argon Discharges.
NC 3 Excitation of Ar lines near the cathode surface.
NC 4 Radial Spatial Distributions of Emission for Cathode-Dominated,
Low-Current Discharges.
NC 5 Optical Investigation of Arc Spot Ignition in Noble Gas Atmosphere
on Cold Cathodes.
NC 6 Ferroelectric Cathodes for Pulsed Gas Discharge Triggering.
NC 7 Studies of Plasma Source Ion Implantation (PSII) Sheath Expansion
for Circular Planar Targets.
NC 8 Self-Bias and Battery Effect at Moderate Pressure Coaxial RF
Discharge.
ND 2 Mie Scattering Measurement of Particulate Size.
ND 3 Particulate Charging in RF Discharge Sheaths.
ND 4 Particles in Silane Discharges.
ND 5 A Correlation of Particle Growth and Spatio-temporal RF Plasma
Structure.
ND 6 Formation of a Coulomb Solid in a Dusty Plasma using a GEC
Reference Cell.SESSION BA: NEGATIVE IONS IN PLASMA
Tuesday morning, 18 October 1994
NIST Building 101
Red Auditorium, 10:15-12:00
L.G. Christophorou, presiding
BA 1 Measurement of Negative Ions In Plasmas.
F.J. de Hoog, Eindhoven U
of Technology, The Netherlands.
BA 2 Modeling of $O_{2}$ RF Glow Discharges by RCT Model.
M. Shibata, N.
Nakano and T. Makabe, Keio Univ.
L.A.
Pinnaduwage, M.Z. Martin, and L.G. Christophorou, Oak Ridge National
Laboratory and Univ. Tenn., Knoxville.
G.M.W. Kroesen, W.W.
Stoffels, E. Stoffels, F.J. de Hoog, TUE, Eindhoven,
The Netherlands.
B. Smith and L. Overzet, U. of Texas at Dallas.
P.G. Datskos, L.G. Christophorou, and J.G.
Carter, Oak Ridge National Laboratory and University of Tennessee.SESSION BB: DIAGNOSTICS
Tuesday morning, 18 October 1994
NIST Building 101
Green Auditorium, 10:15-12:00
H. Sugai, presiding
BB 1 Probe Measurements of RF Source and RF Bias Fields in Plasma
Reactors.
J.E. Stevens, PPPL, Princeton, NJ; M.J. Sowa and J.L.
Cecchi, Univ. of New Mexico, Albuquerque, NM.
BB 2 Theory of Electron Retardation for Langmuir Probes in Anisotropic
Plasmas.
R. Claude Woods, U. of Wisconsin;
and Isaac D. Sudit, UCLA.
T.G. Owano, E.H. Wahl, C.H. Kruger, R.N. Zare, Stanford
University.
Jian Chen,
Kok Heng Chew, and R. Claude Woods, Engineering Research Center for
Plasma-Aided Manufacturing, U. of Wisconsin at Madison.
S.R. Hunter, Consultec
Scientific, Inc.; and W.A. Gibson, Pellissippi International Inc.
James Paul Holloway and Samuella Pollack, University of
Michigan.
X.L. Han, N.J. Perry,
Dept. of Phys. and Astron.; V. Wisehart and M.C. Su, Dept. of
Chemistry, Butler University.SESSION CA: PLASMA-SURFACE INTERACTIONS
Tuesday afternoon, 18 October 1994
NIST Building 101
Red Auditorium, 13:30-15:30
W.L. Hsu, presiding
CA 1 Dynamics of Hyperthermal Atom-Surface Interactions during
Steady-State Etching.
K.P. Giapis and T. Minton, CALTECH and JPL.
CA 2 Energy distributions of ions and atoms sputtered by inert and
reactive incident species.
S.P. Mouncey, R. Md Nor and W.G. Graham,
The Queen's University of Belfast, N. Ireland.
J.C. Tucek, D.H. Baker, S.G. Walton and R.L. Champion,
College of William and Mary.
Y. Mitsuoka, H. Toyoda, H. Sugai, Nagoya University, Nagoya,
Japan; S. Mukainakano, T. Hattori, Research Labs, Nippondenso Co.,
Ltd., Aichi, Japan.
M.E.
Barone, and D.B. Graves, U.C. Berkeley.
E.S. Aydil and S.C. Deshmukh, UC-Santa Barbara.SESSION CB: DIAGNOSTICS AND CONTROL
Tuesday afternoon, 18 October 1994
NIST Building 101
Green Auditorium, 13:30-15:30
M.D. Bowden, presiding
CB 1 Absorption Spectroscopy of Diamond CVD Reactors.
L.W. Anderson,
K.L. Menningen, M.A. Childs, and J.E. Lawler, Univ. of Wisconsin-
Madison.
CB 2 Nonlinear Spectroscopy for Diagnostics of Plasma Chemistry.
D.S. Green and J.W. Hudgens, National Institute of Standards and
Technology.
M.J.
Lipp and J.J. O'Brien, U. of Missouri-St. Louis.
B.K. McMillin and M.R. Zachariah,
National Institute of Standards and Technology, Gaithersburg, MD.
J.M. de Regt, R.A.H. Engeln, J.A.M. Van der Mullen
and D.C. Schram.
M.H. Gordon and U. Kelkar, High Density
Electronics Center, University of Arkansas at Fayetteville.
M.A. Firestone, JAYCOR.SESSION D: POSTER SESSION
Tuesday afternoon, 18 October 1994
NIST Building 101
Lecture Rooms A and B, and Employee Lounge, 15:45-17:30
J.R. Roberts, presidingDA: ELECTRICAL-OPTICAL DIAGNOSTICS
DA 1 Time Transients of the Vibrational Excitation in the Pulsed Nitrogen
Discharge.
Alexander Ershov, Edward Augustyniak and Jacek Borysow,
Physics Department, Michigan Tech. University.
Jacek Borysow and
Serguei Filimonov, Physics Department, Michigan Tech. University.
H-J. Kim, B.W. James and I.S. Falconer, School of
Physics, U. of Sydney, Australia.
Atul D. Pradhan.
R.D. Sexton, S.M. Mahajan, C.A. Ventrice and S.S.
Munukutla, Tenn. Tech. Univ.
V.A. Godyak, R.B. Piejak and
B.M. Alexandrovich, OSRAM Sylvania Inc. Danvers, MA.
R.B. Piejak, V.A. Godyak and B.M. Alexandrovich, OSRAM
Sylvania Inc. Danvers, MA.
H.F. Merkel, H.-P. Popp, Graduiertenkolleg
Numerische Feldberechnung, Universitat Karlsruhe.
M.A. Sobolewski, NIST.
J.L. Shohet,
M. Piper, J.H. Booske, K.H. Chew, J. Jacobs, L. Zhang, Engineering
Research Center for Plasma Aided Manufacturing, U. of Wisconsin-
Madison.
J. Xie, L.J. Overzet, R. Doyle, and M.B.
Hopkins, University of Texas at Dallas, Richardson, TX 75083.
C.V. Speller, P. Egert, A.R. De Souza
and J.L. Muzart, Physics/LABMAT-U. F. Sta. Catarina, Brazil.
C.M.O. Mahony, K.F. Al-Assadi, W.G. Graham,
Queen's University Belfast, N. Ireland and N. StJ. Braithwaite, Open
University Oxford Research Unit, Oxford, England.
L.J.
Overzet, University of Texas at Dallas, Richardson, TX 75083.
K. Al-Assadi 1, K. Donnelly 2, V.
Kornas 3, T. O'Brien 3, H.F. Dobele 3, D. Dowling 2, and W.G.
Graham 1. 1=The Queen's University of Belfast, N. Ireland;
2=Forbairt, Dublin, Ireland; 3= Universitat GH Essen, Germany.
K. Uchino, Y. Kawanabe, H. Yamakoshi, K. Muraoka,
M. Maeda, A. Takahashi, and M. Kakto, Kyushu U., Mitsubishi Heavy
Industries, Ltd. and Fukuoka U.
Gregory A. Hebner, Sandia National Laboratories,
Albuquerque, NM.
R. Surowiec, Univ. of Liverpool; J.A. Rees, Univ. of Liverpool and
Hiden Analytical; J. K. Olthoff, S. B. Radovanov, R.J. Van Brunt,
NIST.
S. B. Radovanov, J. K. Olthoff, R.J. Van Brunt, and M.
A. Sobolewski, NIST.
S. B. Radovanov, K. Dzierzega,
J.R. Roberts and J.K. Olthoff, NIST.
P. Bletzinger and B.N. Ganguly, Aero Propulsion and Power
Directorate, WPAFB, Ohio.
A. Ricci, M.J.
Buie, J.T. Pender, W. B. McColl (Dublin College, Ireland) and M.L.
Brake, Department of Nuclear Engineering, University of Michigan.DB: ELECTRON COLLISIONS
DB 1 Absolute Experimental Electron Impact Cross Sections for the Silver
$5^{2}S_{\frac{1}{2}} \rightarrow 5^{2}P_{\frac{1}{2}}$ and
$5^{2}S_{\frac{1}{2}} \rightarrow 5^{2}P_{\frac{3}{2}}$ Resonance
Lines.
Connor Flynn and Bernhard Stumpf, Dept. of Physics,
University of Idaho.
P. Ozimba, Z. Chen and A.Z. Msezane, Clark Atlanta University.
Paul Feng, R. Scott Schappe, Thad G.
Walker, L.W. Anderson, and Chun C. Lin, U. of Wisconsin.
Z.M.
Jelenak, J.V. Bozin, Z. Lj. Petrovic, and B.M. Jelenkovic,
Institute of Physics, Belgrade, Yugoslavia.
K. Dzierzega, K. Musiol and J.R. Roberts, NIST.DC: ELECTRON-ION RECOMBINATION AND PHOTON PROCESSES
DC 1 Observation of Dissociative Recombination (DR) of $AR_{2}^{+}$
Directly to the AR Ground State.
G.B. Ramos, M. Schlamkowitz, J.W.
Sheldon, K.A. Hardy, Florida International University and J.R.
Peterson, SRI International.
J.B.A. Mitchell, Univ. of Western Ontario, Canada.
N.G. Adams and L.M.
Babcock, U. of Georgia.
B.L. Foley, M. Drucker and N.G. Adams, U. of
Georgia.
T. Gougousi, M.F. Golde, and R. Johnsen,
U. of Pittsburgh.
E. Robert, A.
Khacef, C. Cachoncinlle and J.M. Pouvesle, Gremi, CNRS/University
of Orleans, France. LPMI, USTHB, Algiers, Algeria.
U. Muller, A. Dykman, and
P.C. Cosby, SRI International, Menlo Park, CA.DD: CHARGED PARTICLE TRANSPORT AND ENERGY DISTRIBUTIONS
DD 1 Nonstationary Treatment of Distribution Anisotropy in the Temporal
Relaxation of Energetic Electrons.
R. Winkler and D. Loffhagen, INP
Griefswald, Germany; G.L. Braglia, University of Parma, Italy.
M.A. Dillon and M. Kimura,
Argonne National Laboratory.
E.R. Keiter and
W.N.G. Hitchon, U. Wisconsin-Madison; S. Shankar, and E. Reid,
Intel Corporation.
A.A. Golden and M.M. Turner, School of Physical Sciences,
Dublin City University, Ireland.
H. Itoh, T. Tanoue, A.
Takeda 1, and N. Ikuta 2; Chiba Inst. Tech., 1=Shikoku Univ,
2= Tokushima Univ., Japan.
T.L. Smith, D.C. Liptak and J.D. Clark, Physics
Department, Wright State University; and R.Nagpal, A. Garscadden,
Plasma Research Group, WPAFB.
T.L. Smith, D.C. Liptak J.D. Clark, Physics Department,
Wright State University and A. Garscadden, Plasma Research Group,
WPAFB.
D.L. Schweikaart, R. Nagpal, and A. Garscadden,
Wright Laboratory, WPAFB.
M.W.
Grossman, OSRAM Sylvania Inc.
A. Takeda and N.
Ikuta, Shikoku Univ. and Tokushima Univ., Tokushima, Japan.
H. Gotada, H. Tanaka and N. Ikuta, Tokushima University,
Tokushima 770, Jpn.
S. Vrhovac,
Z.Lj. Petrovic and B.M. Jelenkovic, Institute of Physics, Belgrade,
Yugoslavia.
J. Bretagne, G.
Gousset and T. Simko, Lab. Phys. Gaz Plasmas, Universite Paris-Sud,
F91405 Orsay Cedex, France.
D.R. Novog, S.C.Li, J.S. Chang, McMaster Univ.
M.S.
Benilov, Universidade da Madeira, Portugal.
S.
Suzuki, H. Itoh, H. Sekizawa and N. Ikuta*, Chiba Inst. Tech,
*The Tokushima U., Japan.
J.W. Shon,
Sandia National Laboratories; and B. Penetrante, V. Vahedi and T.D.
Rognlien, Lawrence Livermore National Laboratories, Livermore,
California; M.J. Kushner, U. of Illinois, Urbana.
W. Roznerski and M. Mechlinska-Drewko, Faculty of Applied Physics
and Mathematics, Tech. University of Gdansk, 80-952 Gdansk, Poland.SESSION EA: MAGNETICALLY ENHANCED PLASMAS I
Wednesday morning, 19 October 1994
NIST Building 101
Red Auditorium, 8:00-10:00
M. Lampe, presiding
EA 1 The Role of the Plasma in the Chemistry of Low Pressure Plasma
Etchers.
R.E.P. Harvey, W.N.G. Hitchon and G.J. Parker, Engineering
Research Center for Plasma-Aided Manufacturing, U. of Wisconsin-
Madison.
Albert R.
Ellingboe, Rod Boswell, PRL, R.S. Physics S.E., ANU Australia.
Antoine Durandet, Ben Higgins and Rod Boswell, PRL,
R.S. Phys.S.E., ANU Australia.
C.R. Eddy, Jr., S.R. Douglass and B. Weber, Naval Research
Laboratory.
A. Dallaire, P. Jones, J. Margot, M. Moisan, and M.
Fortin, Department de Physique, Universite de Montreal.
M.D.
Bowden, N. Mayumi, K. Uchino, K. Muraoka, M. Maeda, M. Yoshida, Y.
Manabe, and R.K. Porteous, Kyushu U., Mitsubishi Heavy Industries,
Matsushita Electric and Australian National U.
M. Meyyappan, Scientific
Research Associates.
I.D. Sudit, M.
Light, and F.F. Chen, UCLA.SESSION EB: TRANSPORT AND ENERGY DISTRIBUTIONS
Wednesday morning, 19 October 1994
NIST Building 101
Green Auditorium, 8:00-10:00
J. Wu, presiding
EB 1 Numerical and Experimental Verfication of the Nonlocal Approach to
the Solution of the Spatially Inhomogenous Boltzmann Equation.
C.
Busch, U. Kortshagen, University Bochum, 44780 Bochum, Germany; L.L.
Alves, C.M. Ferreira, CEL-IST, Lisbon Tech, University, Portugal.
N. Ikuta,
Tokushima Univ., Tokushima 770 Jon.
K. Maeda and
T. Makabe, Keio University, Yokohama.
H.
Sugawara, Y. Sakai and H. Tagashira, Dept. of Electrical Eng.,
Hokkaido Univ. Sapporo, Japan.
R.E.
Voshall, Gannon University and J.L. Pack, Murraysville, PA.
Michael S. Barnes, Lam Research
Corporation, Fremont, CA.
M.J. Buie, J. Soniker, C. Bush Brooks, W. McColl (Dublin College,
Ireland), and M.L. Brake, Department of Nuclear Engineering,
University of Michigan.SESSION F: WILL ALLIS PRIZE LECTURE
Wednesday morning, 19 October 1994
NIST Building 101
Red Auditorium, 10:30-11:30
R. Flannery, presiding
for Low Energy Ion-Molecule Interactons.
Eldon E. Ferguson,
NOAA/CMDL, Boulder, CO.SESSION G: BUSINESS MEETING
Wednesday morning, 19 October 1994
NIST Building 101
Red Auditorium, 11:30-12:00
J. Dakin, presidingSESSION HA: INDUCTIVELY COUPLED PLASMAS I
Wednesday afternoon, 19 October 1994
NIST Building 101
Red Auditorium, 13:30-15:30
T.J. Sommerer, presiding
HA 1 Characteristics of Inductively Excited Plasmas in the GEC RF
Reference Cell.
P.A. Miller, Sandia National Laboratories; B.P.
Aragon, Applied Physics, Inc.; K.E. Greenberg and P.D. Pochan,
University of New Mexico.
U. Kortshagen, M. Zethoff, University Bochum, 44780
Bochum, Germany.
V.I.
Kolobov and W.N.G. Hitchon, ERC for PAM, U. of Wisconsin, Madison.
C. Lai and R. Claude
Woods, The Engineering Research Center for Plasma-Aided
Manufacturing, U. of Wisconsin, Madison.
J. Stittsworth and A.E. Wendt,
Engineering Research Center for Plasma-Aided Manufacturing, U. of
Wisconsin-Madison.
P.L.G. Ventzek, Y. Sakai, H.
Tagashira, Dept. of Electrical Eng. Hokkaido University, Sapporo,
Japan, and K. Kitamori, Dept. of Industrial Eng. Hokkaido Institute
of Technology, Sapporo, Japan.
Joseph M. Barich and Mark J.
Kushner, University of Illinois, Dept. of Elect. and Comp. Engr.,
Urbana, IL 61801 USA.
D.P. Lymberopoulos and D.J. Economou, U. of Houston.SESSION HB: ELECTRON-MOLECULE SCATTERING
Wednesday afternoon, 19 October 1994
NIST Building 101
Green Auditorium, 13:30-15:30
I.I. Fabrikant, presiding
HB 1 Low-energy (E<20 eV) electron-molecule scattering: comparison of ab
initio calculations with recent measurements.
Ashok Jain, Physics
Department, Pennsylvania State University, Wilkes-Barre Campus,
Lehman PA 18627.
K.T. Leung, Department of
Chemistry, University of Waterloo, Waterloo, Ontario N2L 3G1,
Canada.
HB 3 Formation of $H_{3}^{+}$ by Electron Impact on $CH_{4}$ and
$NH_{3}$.
S.K. Srivastava, K. Fujii and J.W. McGowan, J.P.L. and
Caltech.
V. Tarnovsky,
A. Levin, and K. Becker, City College of CUNY, USA.
T. Underwood-
Lemons, J.H. Moore, and J.A. Tossell, U. of Maryland at College
Park.SESSION J: POSTER SESSION
Wednesday afternoon, 19 October 1994
NIST Building 101
Lecture Rooms A and B, and Employee Lounge, 15:45-17:30
J.K. Olthoff, presidingJA: MICROWAVE DISCHARGES
JA 1 Kinetics of Formation and Loss of $S_{2}$ in a Pure $SF_{6}$
Microwave Magnetoplasma.
C. Barbeau, F. Chatain*, L. St-Onge, J.
Margot, M. Chaker**, J.P. Booth*, and N. Sadeghi*, U. de Montreal.
*=LSP, U. Joseph-Fourier, Grenoble (France); **= INRS-Energie et
Materiaux, Varennes (Quebec).
M. Hori,
Y. Yamamoto, M. Hiramatsu and T. Goto. Nagoya Univ. and Meijyo Univ.
M. Moisan, Z. Zakrzewski, R. Grenier and G. Sauve.
Dept. Physique, Universite de Montreal.
M. Moisan, R. Grenier, Z. Zakrzewski, Dept. Physique,
Universite de Montreal.
Cynthia Bush Brooks, Rami A. Kishek, R.M. Gilgenbach and M.L. Brake,
Department of Nuclear Engineering, University of Michigan, Ann
Arbor, MI 48109.
A. Hunscher, J. Mentel, Ruhr-Universitat Bochum,
AEEO, Germany.JB: MAGNETICALLY ENHANCED PLASMAS II
JB 1 Measurement of Electromagnetic Wave Structure in Novel Geometry
Helicon Source.
Rusty Jewett 1, A.J. Perry 2, R.W. Boswell 2, H.M.
Anderson 1. 1=Chemical and Nuclear Engineering, 209 Farris,
University of New Mexico, Albuquerque, New Mexico 87131, USA;
2=Plasma Research Laboratory, Research School of Physical Sciences,
The Australian National University, Canberra, ACT 2601, Australia.
R.F. Jewett 1, H. Persing 2, R.W. Boswell 2, H.M. Anderson
1. 1=Chemical and Nuclear Engineering, 209 Farris, University of New
Mexico, Albuquerque, New Mexico 87131, USA; 2=Plasma Research
Laboratory, Research School of Physical Sciences, The Australian
National University, Canberra, ACT 2601, Australia.
G. Joyce, M. Lampe, W. Manheimer, and S. Slinker, Naval Research
Laboratory.
T.A. van der Straaten, N.F. Cramer, I.S. Falconer and
B.W. James, School of Physics, U. of Syndey, Australia.
Albert R.
Ellingboe, Rod Boswell, PRL, R.S. Phys. S.E., ANU Australia.
H. Muta, H. Tanaka, M. Yoshida,
M.D. Bowden, K. Uchino, K. Muraoka, M. Maeda, Y. Manabe, and R.K.
Porteous, Kyushu U., Mitsubishi Heavy Industries, Matsushita
Electric and Australian National U.
C. Charles 1 and R.W. Boswell, PRL, R.S. Phys.
S.E., ANU Australia. 1=Laboratoire des Plasmas et Couches Minces,
IMN-CNRS, France.
R. Boswell 1, N.
Sadeghi, F. Chatain and J. Derouard, Labo. de Spectrometrie
Physique, Universite J. Fourier Grenoble I, France. 1=PRL,
Australian National University, ACT (Australia).
Gon-Ho Kim, Noah Hershkowitz, En-Yao Wang, John Meyer,
and Sarah Gross, Engineering Research Center for Plasma-Aided
Manufacturing, University of Wisconsin-Madison, Madison, WI 53706.JC: POSITIVE COLUMNS
JC 1 Response of the Electron Velocity Distribution Function on the
Impact of Spatially Dependent Electric Fields.
R. Winkler and F.
Sigeneger, INP Greifswald, Germany.
Fred Y. Huang and Mark J. Kushner, University of
Illinois, Dept. of Elect. and Comp. Engr., Urbana, IL 61801 USA.
S.D. Bergeson, H.
Anderson, D.A. Doughty, and J.E. Lawler, Univ. of Wisconsin-Madison
and General Electric CDR-Schenectady.
J.E. Lawler, H. Anderson, S.D. Bergeson, and D.A. Doughty, Univ. of
Wisconsin-Madison and General Electric CDR-Schenectady.
D.A. Doughty, GE Corporate Research and
Development.JD: PLASMA PROCESSING - ETCHING AND DEPOSITION
JD 1 Models for Plasma Etching by Bombarding Ions.
B. Abraham-Shrauner
and C.D. Wang, Washington University.
K.H.R. Kirmse, A.E. Wendt, R.A. Breun,
J.Z. Wu, I.C. Abraham, S.B. Disch, J.A. Meyer, R.C. Woods, N.
Hershkowitz, Engineering Research Center for Plasma-Aided
Manufacturing, University of Wisconsin-Madison.
J. Winniczek, J. Flanner and J.
Cook. Lam Research Corp.
C.B. Fleddermann and K.N. Wroblewski, Center for High
Technology Materials, U. of New Mexico, and D. Ruby, Sandia National
Laboratories.
M. Surendra, C.R. Guarnieri, G.S. Selwyn, and M. Dalvie,
IBM T.J. Watson Res. Ctr., Yorktown Heights, NY.
F.
Bounasri, E. Gat 1, M. Moisan, J. Margot, M. Chaker 1 and M. El
Khakani 1, U. Montreal. 1=INRS-Energie et Materiaux, Varennes,
Quebec.
R.P.
Mota, E.F. Lucena, R.C. Domingos, S.M.H.O. Cruz, and M.A.B. de
Moraes 1, UNESP-FE/DFQ-Guaratingueta, Brazil. 1=IFGW/UNICAMP-
Campinas, Brazil.
R.P. Mota,
M.A.B. de Moraes 1, and S.F. Durrant 1, UNESP-FEG,DFQ,
Guaratingueta, SP, Brasil. 1=IFGW/UNICAMP-Campinas, Brazil.
I.S. Falconer, V.L. Humphreys, M.I.
Ibrahim, B.W. James, J. Khachan, B.L. Matthew, J.R. Pigott, and M.J.
Wouters, School of Physics, U. of Syndey, Australia.
M.A. Childs, K.L. Menningen, L.W. Anderson, and J.E. Lawler,
University of Wisconsin.
K.L.
Menningen, M.A. Childs, C.J. Erickson, L.W. Anderson, and J.E.
Lawler, University of Wisconsin.
L. Zhang, J.H. Booske, R.F. Cooper, J.L. Shohet, J.R. Jacobs,
Plasma ERC, U. of Wisconsin-Madison, and G. Was, U. of Michigan.
L. Zhang, J.H. Booske, J.L. Shohet, J.R. Jacobs, Plasma
ERC, U. of Wisconsin, and A.J. Bernardini, Litton Industries.
A.
Ershov, Michigan Technological University, Houghton; L. Pekker,
Photran Corp.
M. Inayoshi, K. Yamada, M. Hiramatsu, M.
Nawata, Meijo Univ.; M. Ikeda, M. Hori and T. Goto, Nagoya Univ.
B.M. Penetrante, R.M. Brusasco,
and G. Wilemski, Lawrence Livermore National Laboratory.
B. Lane,
Plasma Dynamics, Belmont, MA 02178 and ASTeX, Inc. Woburn, MA 01801;
E. Hyman, K. Tsang, and A. Drobot, Science Applications
International Corporation, McLean, VA 22102; and Richard Post,
ASTeX, Inc.JE: PLASMA CHEMISTRY
JE 1 Physics and Chemistry Modeling in RF $CH_{4}$ Plasmas.
A. Rhallabi*,
E. Gogolides, D. Mary, G. Turban*, NCSR "Demokritos" Greece, *IMN
France.
K. Takahashi, K. Miyata, M.
Hori, S. Kishimoto and T. Goto, Nagoya Univ.
V. Guerra and J. Loureiro, CELIST, Lisbon
Tech. Univ., Portugal.
E. Augustyniak and J. Borysow, Physics Department,
Michigan Tech. University.
K.R. Stalder, SRI International, Menlo Park, CA
94025.JF: HEAVY PARTICLE INTERACTIONS
JF 1 Absolute Cross Sections For Reactions of $O^{+}(^{4}S,^{2}D,^{2}P)$
With $N_{2}$ and $H_{2}$.
X.Li, G.D. Flesch and C.Y. Ng, Iowa St.
U. and Ames Lab, USDOE.
B.L. Upschulte and B.D. Green,
Physical Sciences Inc., Andover, MA; W.A.M. Blumberg and S.J.
Lipson, Phillips Lab., Hanscom AFB, MA.
J.W. Parish and P.P. Yaney, U. of Dayton.
M. Kimura, Argonne National
Laboratory; Y. Li, G. Hirsch, and R.J. Buenker, Univ. Wuppertal,
Germany.
L.M.
Babcock and N.G. Adams, U. of Georgia.
J.A. Fedchak, B.L. Peko, L.K. Keyt, and R.L.
Champion, College of William and Mary.
A.D. Sen and V.G. Anicich, JPL, Caltech; and M.J. McEwan,
U. of Canterbury.
J. de Urquijo, I.
Alvarez and C. Cisneros, Instituto de Fisica, UNAM, Mexico.
D.F. Hudson,
NSWC/White Oak.
P.S. Armstrong 1, S.J. Lipson, W.A.M.
Blumberg, J.A. Dodd 1, J.R. Lowell, and R.M. Nadile, Phillips Lab,
Hanscom AFB, MA. 1=Stewart Radiance Lab., Bedford, MA.
S.J. Lipson, P.S. Armstrong 1,
W.A.M. Blumberg, J.A. Dodd 1, J.R. Lowell, and R.M. Nadile, Phillips
Lab, Hanscom AFB, MA. 1=Stewart Radiance Lab., Bedford, MA.
M. Kimura,
Argonne National Laboratory; J.P. Gu, G. Hirsch, and R.J. Buenker,
Univ. Wuppertal, Germany.
T. Miyazaki, S. Okuda and N. Ikuta, Tokushima
Univ., Tokushima 770, Jpn.SESSION KA: FLAT PANEL DISPLAYS
Thursday morning, 20 October 1994
NIST Building 101
Red Auditorium, 8:00-10:00
W. Hofer, presiding
KA 1 Low-temperature plasma CVD of As-Grown Polysilicon Films for TFT
Applications.
K. Tachibana and T. Shirafuji, Kyoto Institute of
Technology.
Larry Weber,
Plasmaco, Inc.
KA 3 Plasma Display Panel Pixel Dynamics.
R.T. McGrath, et al., SNL; W.
Williamson, Jr., et al., U. of Toledo; P. Friedman, et al.,
Photonics Imaging.
V. Vahedi, T.D. Rognlien, B.M. Penetrante, and J.P.
Verboncoeur, Lawrence Livermore National Laboratory.
W. Williamson, Jr., P.J. Drallos, and V.P. Nagorny, Dept.
of Physics and Astronomy, The Univesity of Toledo, Toledo, OH 43606.
P.J. Drallos,
V.P. Nagorny, and W. Williamson, Jr., Dept. of Physics and
Astronomy, The Univesity of Toledo, Toledo, OH 43606.SESSION KB: ELECTRON COLLISIONS
Thursday morning, 20 October 1994
NIST Building 101
Green Auditorium, 8:00-10:00
S.K. Srivastava, presiding
KB 1 Electron Impact Excitation of the Chlorine Atom.
D.C. Cartwright
and J.B. Mann, Los Alamos National Lab.
I.I. Fabrikant,
U. of Nebraska-Lincoln.
John B. Boffard,
Mark E. Lagus, L.W. Anderson, and Chun C. Lin, U. of Wisconsin.
N.D. Gibson and J.S. Risley, North Carolina State
University-Raleigh, NC.
M. Kimura,
R.A. Bonham and M.A. Dillon, Argonne National Laboratory; H. Tanaka
and L. Bostein, Sophia Univ.
T. Takagi, L. Boesten and H.
Tanaka, Sophia U., Tokyo; and M.A. Dillon, Argonne National
Laboratory.
A. Garscadden
and R. Nagpal, Plasma Research Group, WPAFB.
N.G. Adams and B.L. Foley, U. of Georgia.SESSION L: POSTER SESSION
Thursday morning, 20 0ctober 1994
NIST Building 101
Lecture Rooms A and B and Employee Lounge, 10:15-12:15
E. Benck, presidingLA: PLASMA TECHNIQUES FOR WASTE TREATMENT I
LA 1 The Effects of Argon-Ammonia Mixture Gas on the Reduction of NOx in
a Combustion Fuel Gas by Superimposing Surface/Silent Discharge
Plasma Reactors.
K.Urashima, T.Ito, Musashi Institute of Technology,
J.S.Chang, McMaster University.
M.
Arquilla, J S. Chang, McMaster University; F.E. Bartoszek, Ontario
Hydro Technologies; and I. Gallimberti, Universita' di Padova.
M. Nikravech, V. Massereau, O. Motret, J.M.
Pouvesle, and J. Chapelle, GREMI, CNRS/ University of Orleans,
France.
G.A.
Askaryan, G.M. Batanov, S.I. Gritsinin, I.A. Kossyi, E.G.
Korchagina, A.A. Matveyev, V.P. Silakov, N.M. Tarasova, General
Physics Institute, Russian Academy of Sciences, Moscow.LB: CORONAS, ARCS, AND BREAKDOWN
LB 1 Influence of Space Charge on the Dielectric Behaviour of $SF_{6}$
under Oscillatory Impulse Voltages.
S.K. Venkatesh and M.S. Naidu,
Dept. of H.V. Engg., Indian Institute of Science.
C. Pradayrol, A.M. Casanovas, A. Belarbi and J.
Casanovas, URA 277, Universite Paul Sabatier, Toulouse, France.
G. R. Govinda Raju and
J. Liu, U. of Windsor, Canada.
I. Sauers, ORNL; R.J. Van Brunt, J.K. Olthoff, S.L.
Firebaugh, NIST, R.Y. Larocque, C. Laverdure, IREQ.
M. Agache, V. Kudrle, M. Fitaire, Univ.Paris Sud, France.
G.F. Gomes, M.E. Kayama, M.A. Algatti, E.A. Aramaki and R.P. Mota,
Universidade Estadual Paulista, UNESP, Campus de Guaratingueta,
SP, Brasil.
H.F. Merkel, H.-P. Popp, Graduiertenkolleg Numerische
Feldberechnung, Universitat Karlsruhe.
S. Popovic, Weber Research Institute, Polytechnic University,
Brooklyn, N.Y.
R. J. Van Brunt and P. Von Glahn, NIST; T. Las, Electrotechnical
Inst., Warsaw.
Fleurier, S. Ciobanu, D. Hong, GREMI, Univ. d'Orleans.
M.S. Benilov
and A. Marotta, Universidade da Madeira, Portugal and Universidade
Estadual de Campinas, Brazil.LC: PLASMA DISPLAYS
LC 1 Spatio-Temporal Behavior of Excited Xe Atoms in a Discharge Cell of
Plasma Display Panel Measured by Laser Spectro-Microscopy.
K.
Tachibana, N. Kosugi*, and T.Sakai**, Kyoto Inst. Tech., *Matsushita
Electronics Corp., **NHK Sci. Tech. Lab.
R.B. Campbell,
SNL; R. Veerasingam, Penn St. U.; and R.T. McGrath, SNL.
R. Veerasingam 1, R.B. Campbell and R.T. McGrath, Sandia
National Labs. 1=The Pennsylvania State University, University Park,
PA.
V.P. Nagorny, P.J. Drallos and W. Williamson, Jr., Dept.
of Phys. and Astronomy, The U. of Toledo.
P.J.Drallos,
V.P. Nagorny, and W. Williamson, Jr., Dept. of Physics and
Astronomy, Univ. of Toledo, Toledo, OH 43606.
J.P. Verboncoeur, J.N. Bardsley,
E.A. Chandler, Y.T. Lee, B.M. Penetrante and P.A. Vitello,
V Division, LLNL, Livermore, CA 94550.LD: ELECTRON COLLISIONS
LD 1 On the Electron Impact Ionization of Tetramethylsilane (TMS).
P. Kurunczi, K. Becker, City College of CUNY, USA; R. Foest, R.
Basner, M. Schmidt, INP Greifswald, Germany; H. Deutsch, E.M.A.
University Greifswald, Germany.
V. Tarnovsky,
A. Levin, and K. Becker, City College of CUNY, USA; R. Basner and
M. Schmidt, INP Greifswald, Germany; and H. Deutsch, University of
Greifswald. Germany.
L.R. Leclair, J.M. Derbyshire, and J.W. McConkey,
University of Windsor, Ontario, Canada.
L.A. Pastorius, P.J.M. van der Burgt and J.W.
McConkey, University of Windsor, Canada N9B 3P4.
Jan Li and
J.W. McConkey, Physics Department, University of Windsor,
Canada N9B 3P4.
John T.
Fons, R. Scott Schappe, and Chun C. Lin, U. of Wisconsin.
John B.
Boffard, R. Scott Schappe, Mark E. Lagus, and Chun C. Lin, U. of
Wisconsin.
J.M. Van Doren, A.
Bernard, J. McClellan, W. Foley, J. Cooney, Holy Cross Coll.; A. D.
Kowalak, U. Mass.-Lowell; S.T. Arnold, T.M. Miller, A.A. Viggiano,
R.A. Morris, and J.F. Paulson, USAF Phillips Laboratory, Geophysics
Directorate.
J.P. Doering and J. Yang, Johns Hopkins U.
M.R. Bruce and R.A. Bonham,
Department of Chemistry, Indiana University, Bloomington, IN 47405.
Y.-K. Kim, NIST and M.E. Rudd, U. of Nebraska-Lincoln.SESSION MA: DIAMOND FILMS
Thursday afternoon, 20 October 1994
NIST Building 101
Red Auditorium, 13:30-15:30
B. Lane, presiding
MA 1 Gas-phase Reaction Kinetics in the Chemical Vapor Deposition of
Diamond.
Wen L. Hsu and Ciaran Fox, Sandia National Laboratories,
Livermore, CA 94551.
D.H. Madison and V.E. Bubelev, U. of Missouri-
Rolla.
MA 3 A helicon wave plasma source for the deposition of diamond-structure
materials.
I.S. Falconer, B.W. James, J. Khachan, H-J. Kim, W.D.
McFall, D.R. McKenzie, J.R. Pigott and H.B. Smith, School of
Physics, U. of Sydney, Australia; R.W. Boswell, A. Durandet, A.J.
Perry, and H. Persing, RSPhysSE, ANU, Australia.
J.J. O'Brien and M.J.
Lipp, U. of Missouri-St. Louis.
H.J. Yoon, P.G. Greuel,
D.W. Ernie, and J.T. Roberts, U. of Minnesota.
R.C. Cheshire 1, V. Kornas
2, H.F. Dobele 2, K. Donnelly 3, D. Dowling 3, W.G. Graham 1, T.
Morrow 1, T. O'Brien 3. 1=The Queen's University of Belfast, N.
Ireland; 2=Universitat GH Essen, Germany; 3=Forbairt, Dublin, Rep.
Ireland.
P. Zalicki, Y. Ma, R.N. Zare, Chem. Dept; J. R. Dadamio,
E.H. Wahl, T.G. Owano, C.H. Kruger, Mech Eng. Dept., Stanford Univ.SESSION MB: GLOWS
Thursday afternoon, 20 October 1994
NIST Building 101
Green Auditorium, 13:30-15:30
D. A. Doughty, presiding
MB 1 Hydrogen Atom Density Measurement in $H_{2}/N_{2}$ Gas Mixtures in a
GEC Reference Cell.
B.N. Ganguly and P. Bletzinger, Aero Propulsion
and Power Directorate. WPAFB, Ohio.
Chwan-Hwa
"John" Wu and Fa "Foster" Dai, Department of Electrical Engineering,
Auburn University, Auburn, AL 36849-5201.
Irene Peres and Mark J. Kushner,
University of Illinois. Dept. of Elect. and Comp. Engr., Urbana IL
61801 USA
H. Akashi, Y.
Sakai and H. Tagashira Hokkaido Univ., Dep. of Elect. Eng., Sapporo
Japan.
R. Nagpal and A. Garscadden, Plasma Research Group,
WPAFB.
Timothy J.
Sommerer Corporate Research and Development, General Electric
Company, P. O. Box 8, Schenectady, New York 12301.
R. Kling, M. Neiger and R. Schruft,
LTI University of Karlsruhe, FRG.
MB 8 Nature of the Normal Current Density Effect in DC and RF Glow
Discharges.
Yu. P. Raizer, The Institute for Problems in Mechanics,
Russian Academy of Science.SESSION N: POSTER SESSION
Thursday afternoon, 20 October 1994
NIST Building 101
Lecture Rooms A and B, 15:45-17:30
M.A. Sobolewski, presidingNA: CAPACITIVELY COUPLED GLOWS
NA 1 A Two-dimensional Self-consistent Electron Monte Carlo, Ion Fluid,
(SEMCIF) Simulation of the Radio Frequency Discharge Benchmark
Model.
Jyun-Hwei Tsai, National Center for High-performance
Computing (NCHC), Hsinchu. Taiwan 30077, ROC; and Chwan-Hwa "John"
Wu, Electrical Engineering, Auburn University. Auburn. AL 36849.
M. Dalvie, M. Surendra, G. S.
Selwyn, C. R. Guarnieri, IBM T.J.Watson Research Center, POB 218,
Yorktown Heights, NY 10598.
M.D. Bowden, Y.W. Choi, T. Yamashita, K. Muraoka and
M. Maeda, Kyushu U.
M.E. Riley, Sandia National Labs.
J.K. Olthoff, S.B. Radovanov, R.J.
Van Brunt, and K. Dzierzega, NIST.
L. St-Onge*, N. Sadeghi, J.P. Booth and J. Margot*,
L.S.P., U. Joseph-Fourier, Grenoble. *=U. de Montreal, Montreal
(Quebec).
D.A.W. Hutchinson, M.M. Turner, R.A. Doyle,
and M.B. Hopkins, School of Physical Sciences, Dublin City
University, Dublin 9, Ireland.
T.R. Govindan and M.
Meyyappan, Scientific Research Associates.
K.F. Al-Assadi and W.G. Graham, The Queen's University of Belfast,
N. Ireland.NB: INDUCTIVELY COUPLED PLASMAS II
NB 1 Ion Energy Measurements in an Inductive, rf Plasma, with rf Bias.
John Trow, Allied Materials.
Z. Yu, D.M. Shaw and G.J. Collins, Colorado
State University.
M.Shinomiya,
Matsushita Electric Works,Ltd.
A.A. Pierre and A.E. Wendt, Engineering Research
Center for Plasma-Aided Manufacturing. U. of Wisconsin-Madison.
M. Meyyappan, T.R. Govindan
and J.P. Kreskovsky, Scientific Research Associates.
P.A. Vitello,
G. Parker, J.D. Bukowski*, M.D. Kilgore*, R.A. Stewart*, and D.B.
Graves*, LLNL. *=U. C. Berkeley.
E.R. Keiter, V.
Kolobov, W.N.G. Hitchon, K.M. Kramer, U of Wisconsin-Madison; S.
Shankar, Intel Corporation.
U. Kortshagen, M. Zethoff,
University Bochum, 44780 Bochum, Germany.
P. Wainman, R.A. Stewart, M.A.
Lieberman, D.B. Graves, and P. Vitello*, U. of California, Berkeley.
*=Lawrence Livermore National Laboratory.
D.F. Beale, W.N.G. Hitchon, V.I. Kolobov and
A.E. Wendt, ERC for Plasma-Aided Manufacturing, U. of Wisconsin,
Madison.
B. Coonan, W. McColl and M. Hopkins, Dublin City University, Dublin,
Ireland.NC: CATHODES AND SHEATHS
NC 1 Optical Spectroscopy, Etching and Deposition in Parallel Plate
Hollow Cathode Discharges of Ar and Ar/N2.
B.M. Jelenkovic*, A.
Chelouah, and E. Marode, LPD, SUPELEC, 91190 Gif-Sur-Ivette,
France. *=Institute of Physics, Belgrade, Yugoslavia.
Z. Lj. Petrovic* and A. V. Phelps, JILA, U. of
Colorado and NIST. *=Institute of Physics, Belgrade, Yugoslavia.
K. Rozsa 1, A.
Gallagher and Z. Donko 2. Joint Institute for Laboratory
Astrophysics, University of Colorado and National Institute of
Standards and Technology, Boulder, Colorado 80309-0440. 1=Research
Institute for Solid State Physics. 2=Research Institute for Solid
State Physics H-1525 Budapest, POB. 49 Hungary.
B.M. Jelenkovic* and A.V. Phelps, JILA U.
of Colorado and NIST. *=Institute of Physics, Belgrade, Yugoslavia.
J. Schein, M. Schumann, J. Mentel, Ruhr-
Universitat Bochum, AEEO, Germany.
C.B.
Fleddermann, T. Cavazos, W. Wilbanks, and D. Shiffler, Dept. of
Elec. and Comp. Eng., Univ. of New Mexico.
A. Onuoha, D. Dallmann, J.H. Booske,
R. Breun, L. Zhang, P. Sandstrom, W.N.G. Hitchon, and E. Keiter,
Engineering Research Center for Plasma-Aided Manufacturing. Univ.
of Wisconsin-Madison.
Yu.P. Raizer and M.N. Shneider, The Institute for
Problems in Mechanics, Russian Academy of Science.ND: DUSTY GLOWS
ND 1 Contribution of Short-Lifetime Radicals $(Si, SiH_{2})$ to
Particulate Growth in Silane Plasmas.
H. Kawasaki, T. Fukuzawa, M.
Shiratani and Y. Watanabe, Faculty of Engineering Kyushu University.
G. Praburam, J.
Goree, Dept. of Physics, Univ. of Iowa.
D. Winske and
Michael E. Jones, Los Alamos Natl. Lab.
B Jelenkovic*, A. Laracuente and
A. Gallagher- JILA U. of Colorado and NIST. *=Institute of Physics,
Belgrade, Yugoslavia
T. Kitajima, Y. Okabe and T. Makabe, Keio University,
Yokohama.
C. Cui, J. Goree, R. Quinn, Dept. of Physics and
Astronomy, Univ. of Iowa.