Program overview

TUESDAY MORNING, 28 SEPTEMBER 2004

10:30 MT1.001 Magnetized Collisionless Plasma-Wall Problem

Natalia Sternberg (Clark University)

10:45 MT1.002 Change of phases in the problem of ionization layer at the edge of a fully ionized plasma

N. A. Almeida, M. S. Benilov (Departamento de Fisica, Universidade da Madeira, 9000 Funchal, Portugal), R. N. Franklin (The Open University, Oxford OX1 5HR, UK), G. V. Naidis (Institute for High Temperatures RAS, Moscow 127412, RF)

11:00 MT1.003 Structures of sheath electric fields in electronegative Ar/SF_6 plasmas measured by laser-induced fluorescence-dip spectroscopy

K. Sasaki, K. Takizawa, A. Kono (Nagoya University, Japan)

11:15 MT1.004 A modeling of functional separation in a 2f-CCP etcher -Effect of a bias frequency on the ion velocity distribution incident on a wafer-

Takashi Yagisawa, Toshiaki Makabe (Keio University)

11:30 MT1.005 A Wholly Kinetic, Quasineutral Plasma Model

Richard Fernsler (Plasma Physics Division, Naval Research Laboratory)

11:45 MT1.006 Multi-frequency Sheath Dynamics

Steven Shannon, Alex Paterson, Theodoros Panagopoulos, Daniel Hoffman, John Holland (Applied Materials), Dennis Grimard (The University of Michigan)

12:00 MT1.007 Electron heating by vibrationally excited molecules in the afterglow of a pulsed, inductively coupled Hydrogen plasma

Mariana Osiac, Brian G. Heil, Timo Gans, Uwe Czarnetzki (Institut für Plasma- und Atomphysik, Ruhr-Universität Bochum, Germany), Thomas Schwarz-Selinger (Max-Planck-Institute for Plasma Physics, Garching, Germany), Deborah O'Connell, Miles Turner (Plasma Research Laboratory, Dublin City University, Dublin, Ireland)

12:15 MT1.008 Experimental and theoretical investigations of electron sheaths

L. Oksuz, N. Hershkowitz (University of Wisconsin-Madison, USA)

10:30 MT2.001 Potentials and fields in a 300-mm dual-frequency reactor

Paul A. Miller, Edward V. Barnat, Gregory A. Hebner (Sandia National Laboratories), Alex Paterson, John Holland, Thorston Lill (Applied Materials)

10:45 MT2.002 Influence of frequency on the characteristics of VHF capacitively coupled plasmas in a 300 mm chamber

G. A. Hebner, E. V. Barnat, P. A. Miller (Sandia National Laboratories), A. Paterson, J. Holland, T. Lill (Applied Materials)

11:00 MT2.003 Measurements and Modeling of Plasma Parameters in Frequency Mixed Capacitive Plasmas.

Alex Paterson, Theodoros Panagopoulos, Valentin Todorow, John Holland, Thorsten Lill (Applied Materials)

11:15 MT2.004 Tracking the sheath border position for single and dual frequency capacitively coupled plasmas sustained in hydrogen

Aurel Salabas, Ralf Peter Brinkmann (Ruhr-University Bochum, Theoretical Electrical Engineering, D-44780 Bochum, Germany)

11:30 MT2.005 Anomalous Heating in Capacitively Coupled Plasmas

T. Mussenbrock, J. Opretzka, R.P. Brinkmann (Theoretische Elektrotechnik, Ruhr-Universität Bochum, D-44780 Bochum, Germany)

11:45 MT2.006 A Sheath Resolved Numerical Model for High Density Plasma with RF Bias

Ning Zhou (ESI US Ramp;D, Inc)

12:00 MT2.007 Sub millimeter absorption spectroscopy of oxygen containing fluorocarbon etching plasmas

Eric Benck, Karen Siegrist (National Institute of Standards and Technology)