Program overview

FRIDAY AFTERNOON, 24 OCTOBER 2003

13:15 XF1.001 New techniques in the study of ion processes in weak plasmas

Thomas M. Miller (Air Force Research Laboratory, Space Vehicles Directorate)

13:45 XF1.002 Dissociative Recombination of Vibrationally-Excited Oxygen Molecular Ions

P. C. Cosby, J. R. Peterson, D. L. Huestis (Molecular Physics Lab, SRI International), A. Petrignani (FOM-Institut), W. van der Zande (Nijmegen Univ.), M. Larsson, R. Thomas, F. Hellberg (Stockholm Univ.)

14:00 XF1.003 An Assessment of Electron Collision Cross Sections for Tetrafluoroethylene

W.L. Morgan (Kinema Research, Monument, Colorado), S.J. Buckman (Australian National University, Canberra, Australia)

14:15 XF1.004 Ab Initio Study of Low-Energy Electron Collisions with Ethylene

C. S. Trevisan, A. E. Orel (Department of Applied Science, UC Davis), T. N. Rescigno (Lawrence Berkeley National Lab, Computing Science)

14:30 XF1.005 Electron transport in CF_4 in DC and RF fields

Zoran Petrovi\'c, Sa\vsa Dujko, Zoran Raspopovi\'c (Institute of Physics University of Belgrade)

14:45 XF1.006 Selectivity in Threshold Vibrational Excitation of CO_2 by Electron Impact

W. Vanroose, Zhijong Zhang, C. W. McCurdy, T. N. Rescigno (LBNL)

15:00 XF1.007 Resonant Scattering of Low Energy Electrons from NO

MILICA JELISAVCIC, RADMILA PANAJOTOVIC, STEPHEN BUCKMAN (RSPhysSE, Australian National University, Canberra)

13:15 XF2.001 Plasma Parameter Control Mechansim in plasma sources

Hong-Young Chang (Department of Physics, KAIST, Yusong-Gu, Daejeon, South Korea)

13:45 XF2.002 Understanding pulsed magnetron plasma processes through time-resolved measurement

J.W. Bradley (UMIST)

14:15 XF2.003 Non-equilibrium Ion and Neutral Transport in Low-pressure Plasma Processing Reactors: Applications of Ionized Metal PVD

Vivek Vyas (Dept. of Materials Science and Engr., University of Illinois, Urbana, IL 61801), Mark J. Kushner (Dept. of Electrical and Computer Engr., University of Illinois, Urbana, IL 61801)

14:30 XF2.004 Self-consistent simulation of N_2/H_2 gas plasma for low-k material etching

Chae-Hwa Shon, Toshiaki Makabe (Keio University at Yokohama, Japan)

14:45 XF2.005 Gas temperature monitoring in plasma reactors.

A.A. Bol'shakov, B.A. Cruden, S.P. Sharma (NASA Ames Research Center, Moffett Field, CA 94035.)

15:00 XF2.006 Charging of dielectrics during VUV exposure

J.L. Lauer, J.L. Shohet, R.W. Hansen, R.D. Bathke (U. of Wisconsin-Madison)