Program overview

WEDNESDAY MORNING, 22 OCTOBER 2003

08:00 HW1.001 UV absorption spectrum of the radical CF_2 in an Ar/C_4F_8/O_2 dual frequency capacitive discharge

NICOLAS BULCOURT, JEAN-PAUL BOOTH (Laboratoire de Physique et Technologie des Plasmas (LPTP), Ecole Polytechnique, France), ERIC HUDSON, JORGE LUQUE (Lam Research Corp., Fremont, USA), DANIEL MOK (Department of Applied Biology and Chemical Technology, The Hong Kong Polytechnic University, Hung Hom, Hong Kong), EDMOND LEE, JOHN DYKE (Department of Chemistry, University of Southampton, Highfield, Southamptopn SO17 1BJ,United Kingdom), FOO-TIM CHAU (Department of Applied Biology and Chemical Technology, The Hong Kong Polytechnic University, Hung Hom, Hong Kong)

08:15 HW1.002 Sub-Millimeter Absorption Measurements of Temperature and Density in Fluorocarbon Plasmas

Eric Benck, Karen Siegrist, David Plusquellic (National Institute of Standards and Technology)

08:30 HW1.003 Measurement of spatio-temporal distribution of etch product in an Inductivley Coupled Plasma by using CT-OES

Yasufumi Miyoshi, Masaru Miyauchi, Komukai Yasuo, Toshiaki Makabe (KEIO University, Yokohama, Japan)

09:00 HW1.004 Using RF measurements and simple, empirical plasma models to enhance the performance of dielectric etch systems

Steven Shannon, Daniel Hoffman, Jang-Gyoo Yang, Alex Paterson, Theodoros Panagopoulos, John Holland, Dog Buchberger, Brad Mays, Allen Fox, Mike Chafin, Troy Detrick (Applied Materials)

09:00 HW1.004 Using RF measurements and simple, empirical plasma models to enhance the performance of dielectric etch systems

Steven Shannon, Daniel Hoffman, Jang-Gyoo Yang, Alex Paterson, Theodoros Panagopoulos, John Holland, Dog Buchberger, Brad Mays, Allen Fox, Mike Chafin, Troy Detrick (Applied Materials)

09:15 HW1.005 CF and CF_2 kinetics in a pulsed ICP in CF_4

Jean-Paul Booth, Hana Abada, Pascal Chabert, Nicolas Bulcourt (LPTP, Ecole Polytechnique, France), David Graves (U.C. Berkeley)

08:00 HW2.001 Silicon nano-structure formation using plasma under micro-G and one G conditions

Masaharu Shiratani (Kyushu University, Japan)

08:30 HW2.002 Synthesis of silicon nanoparticles using atmospheric-pressure microdischarges

R. Mohan Sankaran, Dean Holunga, Richard C. Flagan, Konstantinos P. Giapis (Caltech)

08:45 HW2.003 Monte Carlo simulation of nanoparticle transport in a plasma

Sarah Warthesen, Steven Girshick, Uwe Kortshagen (Department of Mechanical Engineering, University of Minnesota, Minneapolis, MN, 55455)

09:00 HW2.004 Nanoparticle film deposition using a hypersonically expanded plasma

X. Wang, J. Hafiz, R. Mukherjee, A. Gidwani, T. Renault, J. Heberlein, P. McMurry, S. Girshick (Department of Mechanical Engineering, University of Minnesota, Minneapolis, USA), C. Perrey, W. Mook, C. B. Carter, W. Gerberich (Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, USA)

09:15 HW2.005 Hydrogenated Silicon Thin Films With Nanocrystalline Inclusions

S. Thompson, U. Kortshagen (Dept. of Mechanical Engineering, University of Minnesota, Minneapolis, MN 55455), C. R. Perrey, C. B. Carter (Dept. of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455), T. J. Belich, J. Kakalios (School of Physics and Astronomy, University of Minnesota, Minneapolis, MN 55455)