TUESDAY AFTERNOON, 21 OCTOBER 2003

Session ET1. Biological Applications of Plasmas I.

Tuesday afternoon, 13:15, California Ballroom, Cathedral Hill Hotel

13:15 ET1.001 Plasma needle: treatment of living cells and tissues: Eva Stoffels (Eindhoven University of Technology, The Netherlands)
13:45 ET1.002 Plasma Characteristics of Electrosurgical Discharges*: Kenneth R. Stalder (Stalder Technologies and Research, Redwood City, CA)
14:15 ET1.003 Argon Micro-Cell Plasma with Applications in Bio-Medical Technology: Jan Van Dijk, Yasuhiro Horiuchi, Toshiaki Makabe (Department of Electronics and Electrical Engineering, Keio University, Japan)
14:30 ET1.004 Application of non-equilibrium plasmas in treatment of wool fibers and seeds: Zoran Petrovi\'c (Institute of Physics Belgrade, Serbia and Montenegro)

Session ET2. Inductively Coupled Plasmas.

Tuesday afternoon, 13:15, International Ballroom, Cathedral Hill Hotel

13:15 ET2.001 Generation of high-density, uniform plasmas by internal RF current sheets: key concepts and experimental verification: Z Tsakadze, K Ostrikov, S Xu (Plasma Sources and Applications Center, NIE, Nanyang Technological University, 637616 Singapore), E Tsakadze (RISOE National Laboratory, PO Box 49, DK-4000 Roskilde, Denmark)
13:30 ET2.002 Thomson Scattering Measurements in an Inductively Coupled Plasma: Gary Craig, Philip Steen, Tom Morrow, Bill Graham (Queen's University of Belfast, BT7 1NN, N. Ireland, UK)
13:45 ET2.003 Measurement of cold electrons in a pulsed inductively coupled plasma: Michael Hebert, Uwe Kortshagen (Mechanical Engineering, University of Minnesota), Dirk Uhrlandt (Institut für Niedertemperatur-Plasmaphysik, Greifswald 17489, Germany)
14:00 ET2.004 ICPs Enhanced with Ferromagnetic Cores: Valery Godyak (OSRAM SYLVANIA)
14:15 ET2.005 Plasma and Electrical Characteristics of an ICP in Magnetic Field: Valery Godyak, Robert Piejak, Benjamin Alexandrovich (OSRAM SYLVANIA)
14:30 ET2.006 Comparison of spatially-resolved experimental and calculated electron disctribution functions and other plasma parameters in inductively coupled argon plasma: V. Kolobov, R. Arslanbekov, N. Zhou (CFD Research Corp.), V. Godyak (Osram Sylvania)
14:45 ET2.007 Angular Dependence of Electron Velocity Distributions in Low-pressure Inductively Coupled Plasmas: Alex Vasenkov, Mark J. Kushner (Dept. of Electrical and Computer Engr., University of Illinois, Urbana, IL 61801)