Program overview
TUESDAY MORNING, 21 OCTOBER 2003
Session DTW. Special Session: Trends in Plasma Etching.
Tuesday morning, 11:45, International Ballroom, Cathedral Hill Hotel
- 11:45 DTW.001
Semiconductor Industry Plasma Processing Needs
- Richard Wise, Siddhartha Panda, Wendy Yan (IBM Microelectronics), Semiconductor Research and Development Center Team
- 12:00 DTW.002
Recent Trends in Silicon Etching: Controlled Flexibility
- Thorsten Lill, Meihua Shen, Shashank Deshmukh, David Mui, Patrick Leahey, John Holland, Alex Paterson, Podlesnik Dragan (Applied Materials)
- 12:15 DTW.003
Trends in Dielectric Etch for Microelectronics Processing
- Eric A. Hudson (Lam Research Corp.)