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Session RI2 - Applications of Low Temperature Plasmas.
INVITED session, Thursday afternoon, October 30
Brazos, ACC

[RI2.001] Low Temperature Plasmas and their Industrial Applications

Noah Hershkowitz (University of Wisconsin - Madison, Center for Plasma-Aided Manufacturing)

Plasma-Aided Manufacturing and Plasma-Based Devices are increasingly important areas of plasma science, in which many members of the plasma science community are currently employed or will be employed in the future. Applications of low temperature plasmas now exist at all neutral pressures ranging from below 1 mTorr to above 1 atmosphere and in liquids. This talk will provide an overview of the subject with examples of industrial uses of plasmas (e.g. 40% of the steps in fabricating Pentium chips require plasma) and plasma-based devices (e.g. new approaches to the reduction of NO_x emission from automobile engines). The connection to fundamental processes occurring in the plasma will be elucidated starting from basic processes in partially ionized plasmas (of both charged and neutral species) and ending in plasma-based devices.

Part R of program listing