THURSDAY MORNING, 11 OCTOBER 2001

Session MR1. Inductively-Coupled Plasmas and Magnetically-Enhanced Plasmas.

10:00 MR1.001 Charged Species Dynamics in an Inductively Coupled Ar/SF_6 Plasma: S. Rauf, P.L.G. Ventzek (Motorola Inc.), G.A. Hebner, I.C. Abraham, J.R. Woodworth (Sandia National Laboratories)
10:15 MR1.002 Numerical Study of Gas Heating in Commercial ICP Reactors: Ning Zhou, Vladimir Kolobov (CFD Research Corp), Vladimir Kudriavtsev (CFD Canada)
10:30 MR1.003 A unified simulation of bulk plasma and sheath scales in a high density plasma discharge: Deepak Bose (Eloret Corp.), T.R. Govindan, M. Meyyappan (NASA Ames Research Center)
10:45 MR1.004 "Evaporative cooling" of electrons in the afterglow of low pressure plasmas: Antonio Maresca, Konstantin Orlov, Uwe Kortshagen (University of Minnesota -- Dept. of Mechanical Engineering)
11:00 MR1.005 Warm plasma effect on the power deposition in inductively-coupled chlorine plasmas: M. Shiozawa, K. Nanbu (Institute of Fluid Science, Tohoku University, Japan)
11:15 MR1.006 ECR Plasma Production by a Multi-Slotted Antenna Applied to Rectangular Substrates: AKIRA SUGIYAMA, TAKAMITSU TADERA, TATSUSHI YAMAMOTO, SATORU IIZUKA*, NORIYOSHI SATO*, Sharp Corp. Collaboration, *Grad. School of Eng. Tohoku Univ. Collaboration
11:30 MR1.007 Effects of Boundary Conditions on the Inherent Ion Heating in a Helicon Plasma: J. L. Kline, E. E. Scime, R. F. Boivin (West Virginia University), M. M. Balkey (Naval Reseach Lab)

10:00 MR2.001 Investigations in Fluorocarbon Plasmas using Planar Laser-Induced Fluorescence: Kristen Steffens (National Institute of Standards and Technology)
10:30 MR2.002 Diagnostics of inductive and capacitive plasmas in fluorocarbon gases: Jean-Paul Booth (Laboratoire de Physique et Technolgie des Plasmas, Ecole Polytechnique, France)
11:00 MR2.003 Flux-balance control for the selective etching of dielectric materials: Tetsuya Tatsumi (ASET plasma laboratory)
11:30 MR2.004 Detection of Chamber Conditioning by CF4 Plasmas in an Inductively Coupled GEC Cell: Brett A. Cruden, M V V S Rao (Eloret Corporation, NASA Ames Research Center), Surendra P. Sharma, M Meyyappan (NASA Ames Research Center)
11:45 MR2.005 Control of Electron Temperature by Mixing Rare Gases in Fluorocarbon Plasmas: Tatsuo Ishijima, Masami Ikeda, Hideo Sugai (Nagoya University, Japan)