Program overview

THURSDAY MORNING, 11 OCTOBER 2001

08:00 LR1.001 Optical characterization of etch damage in GaN produced by inductively coupled and electron cyclotron resonance plasmas

D.K. Gaskill, O.J. Glembocki, V. Shamamian, D. Koleske, R. Henry (Naval Research Laboratory, Code 6862, Washington, DC 20375, USA)

08:15 LR1.002 A comparison of nitride film etching in fluorocarbon plasmas

Helen Hwang (NASA Ames Research Center), Jong Shon (Lam Research Corp.)

08:30 LR1.003 Sputter-Etching Characteristics of BST and SBT using a Surface-Wave High-Density Plasma Reactor.

L. Stafford, J. Margot (Groupe de physique des plasmas, Université de Montréal, Montréal, Qc), S. Delprat, M. Chaker (INRS-Énergie et Matériaux, Varennes, Qc), D. Queney (Groupe de physique des plasmas, Université de Montréal, Montréal, Qc)

08:45 LR1.004 Noble-Gas-Modified Reactive Ion Energy Distributions in Inductively Coupled Plasma Enhanced and Ion Beam Enhanced Reactive Sputtering of Thin Film Compounds

Chris Muratore, John Moore (Advanced Coatings and Surface Engineering Laboratory (ACSEL), Colorado School of Mines, Golden, CO 80401-1887), J. Alan Rees (Hiden Analytical Limited, 420 Europa Boulevard, Warrington, WA5 5UN England), Dan Carter, Greg Roche (Advanced Energy Industries, 1625 Sharp Point Drive, Fort Collins, CO 80525)

09:00 LR1.005 Plasma Diagnostics For The Investigation of Silane Based Glow Discharge Deposition Processes

Dimitrios Mataras (Plasma Technology Laboratory - Department of Chemical Engineering - University of Patras), Eleftherios Amanatides, Dimitrios Rapakoulias

09:15 LR1.006 Synthesis And Characterization of Al-C-N Films Using Inductively Coupled Plasma Assisted DC Magnetron Sputtering

N. Jiang, S. Xu, Z.L. Tsakadze, E.L. Tsakadze, J.D. Long, K.N. Ostrikov (Plasma Processing Laboratory, NIE/NTU, 1 Nanyang Walk, Singapore 637616)

08:00 LR2.001 Kinetic of the OH-radical in high pressure plasmas of N_2/H_2O/hydrocarbons mixtures

G. Baravian, F. Fresnet, L. Magne, S. Pasquiers, C. Postel, V. Puech, A. Rousseau (LPGP, Université Paris-Sud / CNRS, France)

08:15 LR2.002 Plasma Remediation of NO_x in the Presence of Hydrocarbons Using Dielectric Barrier Discharges: Microstreamer Discharge Dynamics

Rajesh Dorai, Mark J. Kushner (University of Illinois)

08:30 LR2.003 Characteristics of Parallel Streamer Discharges between Wire and Plane Electrodes in Water

Sunao Katsuki, Amr Abou-Ghazala, Karl Schoenbach (Old Dominion University), Hidenori Akiyama (Kumamoto University)

08:45 LR2.004 Application of Concentrated Electron Beams in Extra-Vacuum Technologies

Oleg Gorshkov, A. A. Iliin, A. S. Lovtsov, R. N. Rizakhanov (Keldysh Research Center, Moscow, Russia)

09:00 LR2.005 Study of supersonic plasma technology jets

Svetlana Selezneva, Denis Gravelle, Maher Boulos (University of Sherbrooke), Richard van de Sanden, DC Schram (Eindhoven University of Technology), CRTP Collaboration, ETP Collaboration