Program overview

WEDNESDAY AFTERNOON, 10 OCTOBER 2001

JWP.001 Environmental Applications and Innovative Applications

JWP.002 PFC Abatement in Capacitevely-Coupled Plasma Reactor

P.I. Porshnev, M. Alaoui, Stela Diamant, Terry Francis, Sebastien Raoux, Mike Woolston (ESPD, Applied Materials)

JWP.003 NO Removal in High Pressure Plasmas of N_2/H_2O/NO Mixtures

F. Fresnet, G. Baravian, L. Magne, S. Pasquiers, C. Postel, V. Puech, A. Rousseau (LPGP, Université Paris-Sud / CNRS, France)

JWP.004 Benzene Dissociation in DC Atmospheric Pressure Air Glow Discharges

Chunqi Jiang, Robert H. Stark, Karl H. Schoenbach (Physical Electronics Research Institute, Old Dominion University)

JWP.005 A wet plasma scrubber for removal of sulfur dioxide

Shirshak Dhali, Sreeram Seetamsetty, Bakul Dave (Southern Illinois University)

JWP.006 Rf-magnetron plasma for co-sputtering deposition of bioactive calcium phosphate coatings for biomedical application

J.D. Long, S. Xu, N. Jiang, K. Ostrikov, C.H. Diong (Plasma Processing Laboratory, NIE/NTU, 637616 Singapore)

JWP.007 Capacitive Plasmas

JWP.008 Effects of Secondary Electron Emission in High Pressure Capacitively Coupled Plasma Discharges

G. I. Font, W. L. Morgan (Kinema Research, L.L.C.)

JWP.009 Behavoirs of Charged Particles in Narrow Gap Capacitively Coupled RF Discharge

YASUNORI OHTSU, HIROHARU FUJITA (Department of Electrical and Electronic Engineering, Saga University)

JWP.010 Computational Methods

JWP.011 Monte Carlo and Boltzmann Equation Study of the Spatiotemporal Electron Relaxation

Detlef Loffhagen, Rolf Winkler (Institute of Non-Thermal Plasma Physics, Greifswald, Germany), Zoltan Donko (Research Institute for Solid State Physics and Optics, Budapest, Hungary)

JWP.012 Multiterm Treatment of the Electron Kinetics in Cylindrical Hollow Cathodes

F. Sigeneger, R. Winkler (Institut für Niedertemperatur-Plasmaphysik, Greifswald, Germany)

JWP.013 Simulation of breakdown in He-Xe gas mixtures and comparison with experiment

Yuriy Sosov, Constantine Theodosiou (University of Toledo)

JWP.014 Ion mass effects in the modelling of a RF driven, capacitively coupled GEC reference cell

Elm Costa i Bricha, Charles M.O. Mahony, Philip G. Steen, William G. Graham (Queen's University of Belfast)

JWP.015 Distribution Functions

JWP.016 Effect of Electron Reflection at the Anode on Ionization Coefficient

Akihide Takeda (Shikoku Univ.), Nobuaki Ikuta (Chiba Inst.Tech.)

JWP.017 Impact of the Electron-Electron Interaction on the Spatial Relaxation of Plasma Electrons

Detlef Loffhagen, Rolf Winkler (Institut für Niedertemperatur-Plasmaphysik, Institute of Non-Thermal Plasma Physics, Greifswald, Germany)

JWP.018 The Structure of Double-Peaked EVDF of Electron Swarms in N_2

H. Sugawara (Hokkaido University, Japan), K. Satoh (Muroran Institute of Technology, Japan), Y. Sakai (Hokkaido University, Japan)

JWP.019 Inductively Coupled Plasmas

JWP.020 Characteristics of a new high frequency inductively coupled plasma source

Dong Seok Lee, Yongkwan Lee, Hong-young Chang (KAIST)

JWP.021 Electron energy distribution functions, plasma parameters and optical emission in low-frequency inductively coupled plasmas of Ar, N_2, and CH_4 gas mixtures.

Erekle Tsakadze, Kostya Ostrikov, Zviadi Tsakadze, Ning Jiang, Shuyan Xu (Plasma Processing Laboratory, NIE, Nanyang Technological University, 1 Nanyang Walk, 637616 Singapore)

JWP.022 Investigation of Electronegativity in a RF Xe/SF_6 Inductively Coupled Plasma using a Langmuir probe

T. Kimura, K. Ohe (Nagoya Institute of Technology)

JWP.023 Mass spectrometric investigations of ionic species in rf biased inductively-coupled discharges in CF4/Ar and SF6/Ar

Yicheng Wang, Amanda Goyette, Mark Sobolewski (National Institute of Standards and Technology)

JWP.024 A Computational Study of CF, CF_2 and SiF_x Densities in C_2F_6 and Ar/C_2F_6 Inductively Coupled Plasmas

Sang-Hoon Cho (University of Illinois)

JWP.025 Prediction of Device Damage in Plasma Processing

D Nakagawa, K Maeshige, T Makabe (Keio University at Yokohama, Japan)

JWP.026 Experiment amp; Model Comparisons in an Ar/Cl2 ICP

C.M.O. Mahony, C.N. Escoffier, P.D. Maguire (NIBEC, University of Ulster, Northern Ireland), C.S. Corr, S. Gomez, E. Costa i Bricha, W.G. Graham (Queen's University, Belfast, Northern Ireland)

JWP.027 Instabilities in a Low-Pressure Inductively Coupled Oxygen Plasma

Cormac Corr, Philip Steen (Affiliation), William G. Graham (Queen's University Belfast)

JWP.028 The effect of pressure and gas species on electron cyclotron resonance (ECR) heating and the radial density profile change at the ECR condition in weakly magnetized inductively coupled plasma

ChinWook Chung (KAIST), S.S. Kim (Kyoto University), S.J. You, H.Y. Chang (KAIST)

JWP.029 Glows: dc, pulsed, rf, microwave, inductive, other

JWP.030 Hollow Cathode Magnetrons with Gas Injection through Target

Y. Aranda Gonzalvo, J.W. Bradley (UMIST)

JWP.031 A RF Discharge in Argon at Atmospheric Pressure

Shirshak Dhali, Navin Muthuswamy, Bakul Dave (Southern Illinois University)

JWP.032 Experimental Investigation of Submillimeter Plasmas of High Power Density

Thomas Mathieu, Hanns-Peter Popp (Lichttechnisches Institut, Universität Karlsruhe, 76131 Karlsruhe, Germany)

JWP.033 Multi-dimensional model for parallel plate rf plasma simulation accelerated by spleen function Poisson equation solver

TAKUMA SUZUKI, KAZUTAKA KITAMORI, IKUYA HORIE, KOUICHI MARUYAMA (Hokkaido Institute of Technology)

JWP.034 Gas Temperatures of XeCl Microwave Plasmas

Scott Anderson (University of Michigan, Ann Arbor, MI 48109), Michael Delaney (University of Michigan, Ann Arbor, MI 48109), Corey Collard (University of Michigan, Ann Arbor, MI 49109), Mary Brake (University of Michigan, Ann Arbor, MI 48109)

JWP.035 Production of Charge Donor Molecules in a Resonant Microwave Cavity Discharge

G.M. Brooke, L. Vu\vskovi\'c, S. Popovi\'c (Department of Physics, Old Dominion University, 4600 Elkhorn Ave., Norfolk VA 23529)

JWP.036 Plasma Interactions with Surfaces

JWP.037 Study of surface reactions in plasma etching using mass-analyzed ion beams

Kazuhiro Karahashi (Semiconductor Technology Research Department Association of Super-Advanced Electronics Technologies (ASET)), Hideo Tsuboi, Yoshikazu Yamaoka, Kazuaki Kurihara, Makoto Sekine, Moritaka Nakamura

JWP.038 Influence of Fluorocarbon Polymer Film Deposited on Aluminum Electrodes on Breakdown Voltage of Nitrogen

C. Biloiu, I. A. Biloiu (Hokkaido University, Japan, on leave from Faculty of Physics, Bucharest University, Romania), Y. Sakai, H. Sugawara, Y. Suda (Hokkaido University, Japan), M. Nakajima (Fuji Electric Co., Ramp;D Ltd., Japan)

JWP.039 Atomic Oxygen Density Profiles and Sticking Coefficients for 5 Different Surfaces in an Inductively Coupled Plasma

Sergi Gomez, William G. Graham (Queen's Univerity of Belfast)

JWP.040 Low Temperature Plasma Nitriding Of Stainless Steel In N_2/H_2/Ar LFICP Discharges

S. Xu, W. Luo, N. Jiang, K.N. Ostrikov (Plasma Processing Laboratory, NS/NIE, Nanyang Tech. Univ., 637616 Singapore)

JWP.041 Experimental Investigations of the Thermal Expansion of Solid SF6 and CHCl3

Ivan Sarwar (Cherkassy Institute of Engineering and Technology, 18006, Cherkassy, Bul'var Shevchenko 460, Ukraine)

JWP.042 Influence of Orientational Motion of Molecules in the Process of Heat Transfer in the Solid CHCl_3 and C_6H_6

Ivan Sarwar, Nick Zholonko (Cherkassy Institute of Engineering and Technology, 18006, Cherkassy, Bul'var Shevchenko 460, Ukraine)

JWP.043 Isobaric Thermal Conductivity of Solid SF_6 in the Plastic Phase: The Influence of the Hindered Molecular Rotation and the Sound Velocity Decrease

Ivan Sarwar, Nick Zholonko (Cherkassy Institute of Engineering and Technology, 18006, Cherkassy, Bul'var Shevchenko 460, Ukraine)

JWP.044 Plasma Diagnostics II

JWP.045 Plasma Diagnostics on a Pulsed Argon ICP Source

Jr. DeJoseph (Air Force Research Laboratory, Wright-Patterson AFB, OH), Wei Guo (Innovative Scientific Solutions, Inc., Dayton, OH)

JWP.046 Time resolved measurements for mass identified, neutral particles sampled from a plasma.

J.A. Rees, T.H. Russell, P.J. Hatton, I.D. Neale (Hiden Analytical Limited)

JWP.047 Time resolved measurements for mass identified ions sampled from an R.F. Plasma.

J.A. Rees, D. Mills, C.L. Greenwood, I.D. Neale (Hiden Analytical Limited)

JWP.048 Energy and Angular Distribution of Ions Extracted from a Large Hole in Contact with a Plasma

Demetre Economou (University of Houston), Chang-Koo Kim (Novellus Inc.)

JWP.049 Investigation of the LAPPS Ion Flux to a Surface Biased with an Arbitrary High Frequency Waveform

David Blackwell, Scott Walton, Darrin Leonhardt, Donald Murphy, Richard Fernsler, Robert Meger (Naval Research Laboratory, Plasma Physics Division Washington, DC 20375)

JWP.050 Effect of Electron Energy Distribution Function on Spectroscopic Characteristics of Microwave Discharge Argon Plasma

Hiroshi Akatsuka, Ryouji Kashiwazaki (Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology)

JWP.051 Thomson Scattering Measurement of Electron Density and Temperature in a Microwave Plasma for Diamond Deposition

S. Narishige, S. Kitamura, K. Teii, K. Uchino, K. Muraoka (Kyushu University, Japan), T. Sakoda (Kitakyushu Nat. College Tech., Japan)

JWP.052 Thomson Scattering Observation of Non-Maxwellian EEDF and the Effect of Local Electron Heating

A. Kono, H. Funahashi (Nagoya University, Nagoya 464-8603, Japan)

JWP.053 Investigation of a Microwave Discharge by Electric Field Measurements

D. Luggenhölscher, U. Czarnetzki, H.F. Döbele (Institut für Laser- und Plasmaphyik, Universität GH Essen, D-45117, Germany)

JWP.054 Electric Field Measurement Methods based on Stark Effects in Xenon Atoms

Mark Bowden, Bram Visser, Gerrit Kroesen (Eindhoven University of Technology, The Netherlands)

JWP.055 Towards measurement of the electric field distributions around structures immersed in a plasma: calibration of electric field induced energy level shifts in Argon

G. A. Hebner (Sandia National Laboratories)

JWP.056 Lighting and Displays

JWP.057 Vacuum Ultraviolet Emission Dynamics of a Surface Discharge type PDPs

Woo-Geun Lee, May Shao, Mike Brown, Jeff Gottschalk, Alvin D. Compaan (University of Toledo), Jerry Schermerhon (Electro Plasma Inc.), Department of Physics Team, Electro Plasma Inc. Collaboration

JWP.058 Radiative lifetimes, branching fractions, and atomic transition probabilities for Tb II

J.E. Lawler, E.A. Den Hartog, J.A. Fedchak, M.E. Wickliffe (Univ. of Wisconsin)

JWP.059 Excimer radiation from pulsed micro hollow cathode discharges

Isfried Petzenhauser, Uwe Ernst, Klaus Frank (Physikalisches Institut I, Univ. Erlangen-Nuremberg, 91058 Erlangen, Germany)

JWP.060 Mercury Excited State Density Measurements in an Inductively Coupled Low Pressure Discharge

Phil Moskowitz (OSRAM SYLVANIA)

JWP.061 Laser Thomson Scattering Diagnostics of a PDP Micro Discharge Plasma

Y. Noguchi, T. Hondou, K. Uchino, K. Muraoka (Kyushu University, Japan)

JWP.062 Stepwise Ionization of Xenon in RF Plasma Display Panels

C. Punset, L.C. Pitchford, J.-P. Boeuf (CPAT, Université Paul Sabatier amp; CNRS, Toulouse, France)

JWP.063 Surface Processing

JWP.064 Implantation of Iron Ions into Silicon by Ablation Plasma Ion Implantation

Bo Qi, Ronald Gilgenbach, Y. Y. Lau, Mark Jonston, Jie Lian, Luming Wang (Intense Energy Beam Interaction Lab, Nuclear Eng.and Rad. Sciences Dept.,University of Michigan, Ann Arbor, MI 48109-2104), Gary Doll, A. Lazarides (Advanced Materials Research and Development, Timken Research, The Timken Corporation, Canton, OH, 44706-0930)

JWP.065 The Simulation of Neutral Beam Source for Nano-scale Etching Technology

S.J. Kim, H.S. Lee, M.S. Hur, H.J. Lee (Affiliation), J.K. Lee (Department of Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784, S. Korea), Plasma Application Modeling Group Team

JWP.066 Microtrench/oxide island reduction with electron beam irradiation in high aspect ratio oxide etching

M. Watanabe, D. M. Shaw, G. J. Collins (Department of Electrical Engineering, Colorado State University, Fort Collins, CO 80523)

JWP.067 Ion Energy Distribution of Pd and Ni Positive Ions in DC and Pulsed DC Plasma Discharge Sputtering

RaviPrakash Jayaraman, Lawrence J. Pilione, Hsin-Pai Hseuh, Russell Messier, Robert T. McGrath (Pennsylvania State University)

JWP.068 Hydrogen plasma treatment of Si(100), (110), and (111) surfaces monitored by in situ infrared spectroscopy

Masanori Shinohara, Takayuki Kuwano, Yasuo Kimura, Michio Niwano (Research Institute of Electrical Communication, Tohoku Univ. Sendai, 980-8577, Japan)

JWP.069 Atmospheric pressure glow discharge (APG) for thin film deposition

Rüdiger Foest, Florian Sigeneger, Martin Schmidt (Institut für Niedertemperatur-Plasmaphysik, 17489 Greifswald, Germany)

JWP.070 Lattice Gas Model Based Optimization of Plasma-Surface Processes for GaN-Based Compound Growth

KIYOHIDE NONOKAWA, TAKUMA SUZUKI, KAZUTAKA KITAMORI, TAKAYUKI SAWADA (Hokkaido Institute of Technology)

JWP.071 Post-Deadline Abstracts

JWP.072

JWP.073 Determination of 2p Excitation Transfer Rate Coefficient in Neon Gas Discharges

D.J. Smith, R.S. Stewart (University of Strathclyde)

JWP.074 Optical Emission Detection of SO_2 by Microfabricated Inductively Coupled Plasma (mICP).

Olga Minayeva, Jeffrey Hopwood (Northeastern University)

JWP.075 A Plasma Technique for Functionalization of Carbon Nanotubes

Bishun Khare, M. Meyyappan (NASA Ames)

JWP.076 Ion Energy and Ion Flux Distributions of CF_4/Ar/O_2 inductively coupled plasmas in a GEC cell

M.V.V.S. Rao, Brett Cruden (Eloret), Surendra Sharma, Meyya Meyyappan (NASA Ames Research Center, Moffett Field, CA 94035)

JWP.077 Langmuir Probe Measurements of inductively coupled plasmas in CF_4/Ar/O_2 mixtures

M.V.V.S. Rao, Brett Cruden (Eloret), Surendra Sharma, Meyya Meyyappan (NASA Ames Research Center, Moffett Field, CA 94035)

JWP.078 Spectrally Filtered Raman/Thomson Scattering Measurements in High Pressure Plasmas

Lee Wonchul (), Lempert Walter (Depts. of Chemistry and Mechanical Engineering Ohio State University)

JWP.079 Optically Enhanced E-Beam Sustained Air Plasmas

Peter Palm, Elke Ploenjes (Department of Mechanical Engineering, The Ohio State University), Igor V. Adamovich (Department of Aerospace Engineering and Aviation, The Ohio State University), Vish V. Subramaniam, J. William Rich (Department of Mechanical Engineering, The Ohio State University)

JWP.080 Numerical Simulation of an Optically Pumped CO/Argon Plasma

Doug Dietz, Vish V. Subramaniam (The Ohio State University), Shashi M. Aithal (Novellus Systems, Inc.)

JWP.081 Electron-Mediated Vibration-Electronic (V-E) Energy Transfer in Optically Pumped Plasmas

Elke Ploenjes, Peter Palm, J. William Rich, Igor V. Adamovich (The Ohio State University)

JWP.082 Single-Walled Carbon Nanotube Synthesis in CO Laser Pumped Carbon Monoxide Plasmas

Elke Ploenjes, Kraig Frederickson, Peter Palm, G. Babu Viswanathan, Igor V. Adamovich, Vish V. Subramaniam, Walter R. Lempert, Hamish L. Fraser, J. William Rich (The Ohio State University)

JWP.083 Enhancement of CO_2 in reactions with vibrationally excited gas phase CO over surfaces.

K. Essenhigh (), J. W. Rich, U. Ozkan (The Ohio State University)

JWP.084 Electron Impact Ionization of C_2F_6

Ione Iga, Ivana Pereira Sanches (Department of Chemistry, Universidade Federal de S\ão Carlos), Santosh Kumar Srivastava (Jet Propulsion Laboratory, CIT)