Program overview

WEDNESDAY AFTERNOON, 25 OCTOBER 3900

JWP.001 Pulsed Plasmas

JWP.002 Two-Dimensional Simulation of Pulsed-Power Electronegative Plasmas

Badri Ramamurthi, Demetre Economou (Department of Chemical Engineering, University of Houston, Houston, TX 77204-4792)

JWP.003 Ionization/Recombination Model for the Initial Stage of Pulsed Discharges

S. Popovi\'c, P. Kessaratikoon, L. Vu\vskovi\'c (Department of Physics, Old Dominion U., Norfolk, VA 23529)

JWP.004 Evolution of spatial density profiles in pulsed plasma of electronegative gases

E.A. Bogdanov, A.A. Kudryavtsev (St.Petersburg State University, Russia.)

JWP.005 Experimental investigations of spatio-temporal evolution of charged particle densities in afterglow oxygen plasma

A.A. Kudryavtsev, V.G. Mishakov, I.N. Skoblo, T.L. Tkachenko, M.O. Chayka (St.Petersburg State University, Russia.)

JWP.006 Sheath relaxation in pulsed discharges

K.-U. Riemann, Th. Daube (Theoretische Physik 1, Ruhr-University Bochum, D-44780 Bochum, Germany)

JWP.007 Inductively Coupled Plasmas

JWP.008 Electron Temperature control in ICP using grid and its use for control the ion ratio in CF4 / Ar plasma

K. H. Bai (KAIST), J. I. Hong (Samsung Electronics), H. Y. Chang (KAIST)

JWP.009 The electron cyclotron resonance in a weakly magnetized radio frequency inductive discharge

ChinWook Chung (Korea Advanced Institute of Science and Technology (KAIST)), Hong-Young Chang (KAIST)

JWP.010 Spatial and temporal dependencies of ion energy distributions in an ICP Workstation

J.A. Rees, C.L. Greenwood, S.J. Phillips, D.L. Seymour, I.D. Neale (Hiden Analytical Ltd. 420 Europa Boulevard, Gemini Business Park, Warrington, England, WA5 5UN)

JWP.011 Experimental measurements on an inductive ring discharge in oxygen and nitrogen

J. J. Gonzalez, D. M. Shaw, M. Watanabe, G. J. Collins (Dept. of Electrical Engineering, Colorado State University, Fort Collins, CO 80523), N. Takahashi (Department of Materials Science, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan)

JWP.012 Electrical model of an inductive ring discharge in argon

J. J. Gonzalez, D. M. Shaw, M. Watanabe, H. Uchiyama, G. J. Collins (Dept. of Electrical Engineering, Colorado St. Univ., Fort Collins, CO 80523)

JWP.013 Observation of anomalous field penetration in collisional, cylindrical ICP discharges

John D. Evans, Francis F. Chen, Donald Arnush (UCLA)

JWP.014 Global Model of Inductively Coupled Ar Plasmas using Two-Temperature Approximation

T. Kimura, K. Ohe (Nagoya Institute of Technology)

JWP.015 Atomic Chlorine and Chlorine Negative Ion Density Measurements in Ar/Cl2 Inductively Coupled Plasmas

C.M.O. Mahony, P.D. Maguire, O.A. Okpalugo (University of Ulster, N. Ireland), C.S. Corr, S. Gomez, W.G. Graham, P.G. Steen (The Queen's University of Belfast, N. Ireland)

JWP.016 Two-dimensional Particle-In-Cell Monte Carlo Simulations of High Density Plasma Sources

Vitaly A. Schweigert, Uwe Kortshagen (University of Minnesota, Mechanical Engineering)

JWP.017 Current, Voltage and Power Measurements in Ar/Cl2 Inductively Coupled Plasmas Using Close-Coupled Probes

O.A. Okpalugo, S. Laverty, P.D. Maguire, C.M.O. Mahony (University of Ulster, N. Ireland), W.G. Graham (Queen's University Belfast, N. Ireland)

JWP.018 EEDF Measurements in an Ar/CF_4ICP Discharge

M. D. Bowden, P. Suanpoot, K. Uchino, K. Muraoka (Kyushu University, Japan), M. Noguchi (Fukuoka Inst. Technology)

JWP.019 Characteristic of ICP Discharge Produced by a Novel External Antenna

Mahmood Nasser, Hiroharu Fujita (Department of Electrical and Electronic Engineering, Saga University, Honjo 1, Saga 840-8502, Japan), Fujita Lab. Team

JWP.020 Study of the E-to-H and H-to-E mode transitions in an ICP using mass spectrometry

Carole Maurice, Gerrit Kroesen (Eindhoven university of Technology)

JWP.021 Instabilities in fluorocarbon ICP plasmas

Jean-Paul Booth, Hana Abada (Laboratoire de Spectrometrie Physique, Grenoble University, France)

JWP.022 Inductively coupled plasma source symmetry in the presence of a current node.

J.M. Marquis, M.H. Khater, L.J. Overzet, M.J. Goeckner (University of Texas at Dallas)

JWP.023 Reduction of deposition ionization fraction in Ionized Physics Vapor

Mirko Vukovic (Tokyo Electron Arizona)

JWP.024 Calculation of Retical Temperature during Etching Process in ICP

Han-Ming Wu, Wilman Tsai (Intel Corp)

JWP.025 Magnetically Enhanced Plasmas

JWP.026 A Compact Nitrogen Radical Source by Helicon-Wave Discharge Employing a Permanent Magnet

H. Kokubu, K. Sasaki, K. Kadota (Department of Electronics, Nagoya University, Japan), D. Hayashi (Faculty of Applied Physics, Eindhoven University of Technology, The Netherlands)

JWP.027 Direct measurement of the energies of neutral species from magnetron plasmas

P.A. Read, J.A. Rees, P.J. Hatton, D.J. Mills, I.D. Neale (Hiden Analytical Ltd. 420 Europa Boulevard, Gemini Business Park, Warrington, England, WA5 5UN)

JWP.028 Hybrid Particle-Fluid Simulation of Low-Pressure DC Magnetron Discharges

Vladimir Serikov, Hirohiko Iwase, Shinji Kawamoto (Nippon Sheet Glass Co., Ltd., Japan)

JWP.029 A study of dc discharge in cylindrical magnetron - comparison of experiment and PIC model

J. F. Behnke, C. Csambal (EMA University, Institute of Physics, 17487 Greifswald, FRG), M. Tichy, P. Kudrna, J. Rusz (Charles University in Prague, Faculty of Mathematics and Physics, V Holesovickach 2, 180 00 Praha 8, Czech Republic)

JWP.030 Kinetic model of entire cylindrical magnetron discharge.

I.A. Porokhova, J.F. Behnke, J. Behnke (Institute of Physics, E.-M.-Arndt-University, 17487 Greifswald, Germany), Y.B. Golubovskii (Institute of Physics, State University of St. Pertersburg, Russia)

JWP.031 Development of a New Sputter System using Magnetic Neutral Loop Discharge Plasma Technology

Yaw Okraku-Yirenkyi, Youl-Moon Sung (Miyazaki University), Masahisa Otsubo, Chikahisa Honda, Kiichiro Uchino (Kyushu University), Katsunori Muraoka

JWP.032 Gas-Phase Chemistry

JWP.033 Carbon Nanotube Production in CO Laser Pumped Carbon Monoxide Plasmas

Elke Ploenjes, Peter Palm, Vish Subramaniam, Igor Adamovich, William Rich, Babu Viswanathan, Hamish Fraser (The Ohio State University, 206 W. 18th Ave, Columbus, Ohio)

JWP.034 Catalytic effect of noble gases in the reaction of plasma-chemicalof hexamethyldisiloxane (HMDSO) in the dielectricdischarge(DBD)

Axel Sonnenfeld, Juergen F. Behnke (University of Greifswald, Institute of Physics, Domstr. 10a, 17487 Greifswald, FRG), Kirill V. Kozlov (Moscow State University, Department of Chemistry, 119899 Moscow, Russia), Reactive Sputtering Team, Plasma chemistry in dielectric barrier discharges Collaboration

JWP.035 Molecular Composition of Polymerized Species in Fluorocarbon Plasmas

Kunihide Tachibana, Kazuo Takahashi (Dept. of Electronic Science and Engineering, Kyoto University)

JWP.036 Production of Fullerenes from Various Carbon Materials by Means of the JxB Arc Method

Tetsu Mieno, Mohammad K.H. Bhuiyan (Dept. Physics, Shizuoka Univ.)

JWP.037 Variations of Heat Flux and Emission in Gas Arc by Gravity-Oscillation for Fullerenes Production

Tetsu Mieno, Akira Yamashiro (Dept. Physics, Shizuoka Univ.)

JWP.038 Vibrational frequencies and electron affinities of Si_2H_5 radicals

D. Hayashi, M.M. Hemerik, G.M.W. Kroesen (Eindhoven University of Technology)

JWP.039 Polymerisation mechanisms in fluorocarbon ICP discharges

Jean-Paul Booth (Laboratoire de Spectrometrie Physique, Grenoble University, France), Gilles Cunge (CNRS/LETI, Grenoble, France), Hana Abada (Laboratoire de Spectrometrie Physique, Grenoble University, France), Gilles Cartry (LPGP, Paris, France)

JWP.040 Decomposition of Benzene Using a Low Pressure DC Glow Discharge in Nitrogen

K. Satoh, N. Kudoh, H. Itoh, H. Tagashira (Muroran Institute of Technology, Japan), M. Shimozuma (Hokkaido University, Japan)

JWP.041 Gas Phase Reaction of Atmospheric Pressure Discharge with Streamer Propagation --Modeling using Boltzmann Equation and Rate Equation--

Masamichi Kogure, Fumiyoshi Tochikubo, Tsuneo Watanabe (Tokyo Metropolitan University)

JWP.042 Enhancement of VOC removal using a Dielectric Barrier Discharge into a catalyst

T. Minea, S. Pasquiers, A. Rousseau, A. Joran, N. Simiand (LPGP, Universite Paris-Sud/CNRS,France), F. Auntin, J.M. Tatibouet, J. Barrault (LACCO / CNRS Poitiers, France)

JWP.043 Transport Effects

JWP.044 Afterglow Ambipolar Diffusion of a Mixture of Anions

Alan Gallagher (JILA, NIST and Univ. of Colorado, Boulder, CO 80309)

JWP.045 Ionization coefficients and electron drift velocities in SF_6/CO_2 mixtures

J. de Urquijo (Centro de Ciencias Fisicas, UNAM, Mexico)

JWP.046 Ion Mobilities in Xe/Ne Mixtures

J. de Urquijo, E. Basurto (Centro de Ciencias Fisicas, UNAM, Mexico), A.V. Phelps (JILA, Boulder, CO), D. Piscitelli, L.C. Pitchford (CPAT, Toulouse, France)

JWP.047 Relaxation of electrons ejected from high voltage tip to gas phase

A. Kawai, J. Matsui, N. Nakano, Z.Lj. Petrovic, T. Makabe (Department of Electronics and Electrical Engineering,Keio University at Yokohama,Japan)

JWP.048 Spatio-Temporal Relaxation of Electrons in Non-Isothermal Plasmas

Detlef Loffhagen, Rolf Winkler (Institut für Niedertemperatur Plasmaphysik, 17489 Greifswald, Germany)

JWP.049 SWARM PARAMETERS IN NON-UNIFORM CROSSED ELECTRIC AND MAGNETIC FIELDS

Ikuya Horie (Hokkaido Institute of Technology), S. Nakamura (Hokkaido Polytechnic College), P.L.G. Ventzek (Motorola Inc.), K. Kitamori (Hokkaido Institute of Technology)

JWP.050 Measurement of Electron Transport Parameters in NO-Ar Mixture and Pure NO

T. Takeuchi (Fuculty of Science and Technology, Keio University), M. Hayashi (Gaseous Electronics Institute), Y. Nakamura (Fuculty of Science and Technology, Keio University)

JWP.051 An Application of Simplex Algorithm to Electron Swarm Method

Hiroki Hasegawa, Yoshiharu Nakamura (Faculty of Science and Technology, Keio Univercity)

JWP.052 Measurements of electron transport coefficients in the 0.468% and 4.91% c-C4F8/Ar mixtures and pure c-C4F8

Masahiro Yamaji, Yoshiharu Nakamura (Faculty of Science and Technology, Keio Univercity)

JWP.053 On the Nature of Sonoluminescence

Andrew Angus (Absolute Foundation)

JWP.054 Light Sources/UV Sources

JWP.055 A new variable color fluorescent lamp

Leon Bakker, Gerrit Kroesen (Eindhoven University of Technology)

JWP.056 Simulating the energy balance of a high-pressure sulphur discharge

Colin Johnston, Harm van der Heijden, Ger Janssen, Bart Hartgers, Jan van Dijk (Dept. of Applied Physics, Eindhoven University of Technology)

JWP.057 Determination of the partial pressure of Tl in metal halide lamps from optically thick self-reversed Tl-lines

B. Schalk, G. Hartel, L. Hitzschke, G.H. Lieder (OSRAM GmbH, Germany)

JWP.058 A Large Area, CW, High Power, Efficient 172nm Xenon Excimer Light Source

M. Salvermoser, D.E. Murnick (Department of Physics, Rutgers University, Newark NJ 07102)

JWP.059 RF excited CW atomic Xe laser. Experimental performance and theoretical study.

S.A. Starostin (Quantum Electronics Group, Department of Applied Physics, University of Twente, P.O.Box 217, 7500 AE Enschede, The Netherlands), P.J.M. Peters (), K.J. Boller (Quantum Electronics Group, Department of Applied Physics, University of Twente, P.O.Box 217, 7500 AE Enschede, The Netherlands), Y.B. Udalov (Nederlands Centrum voor Laser Research, P.O.Box 2262, 7500 CR Enschede, The Netherlands), I.V. Kochetov (), A.P. Napartovich (Troitsk Institute of Innovative and Thermonuclear Research, 142092, Troitsk, Moscow region, Russia)

JWP.060 Comparison of D-X and B-X Molecular Band Emission from a Microwave Produced XeCl Discharge

S. A. Anderson, Sara Bernal, Carri Glide, R. B. Anderson, Mary Brake (University of Michigan)

JWP.061 Dual Chamber Discharge at Atmospheric Pressure

Hyun Park, Muthuswamy Navin, Shirshak Dhali (Southern Illinois University at Carbondale)

JWP.062 A Radiation Transport Coupled Particle-In-Cell Model for Hg-Ar Discharges

Hae June Lee, J.P. Verboncoeur, H.B. Smith, G.J. Parker, C.K. Birdsall (University of California at Berkeley), Plasma Theory and Simulation Group Team

JWP.063 Radiative lifetimes, branching fractions, and transition probabilities for Lu I, Lu II, and Lu III

J. E. Lawler, J. A. Fedchak, E. A. Den Hartog (Dept. of Physics, University of Wisconsin, Madison, WI, 53706), P. Palmeri, P. Quinet, E. Biémont (Astrophysique et Spectroscopie, Université de Mons-Hainaut, B-7000 Mons, Belgium)

JWP.064 Materials Processing/Dusty Plasmas

JWP.065 Effects of H irradiation on properties of Cu films deposited by plasma CVD

Y. Watanabe, K. Koga, H.J. Jin, K. Takenaka, T. Kinoshita, M. Shiratani (Graduate School of Information Science and Electrical Engineering, Kyushu University, Japan)

JWP.066 Plasma radical sources for low pressure MOCVD of InAsN

H. Naoi, S. Sakai (Department of Electrical and Electronic Engineering, The University of Tokushima, Minami-Josanjima 2-1, Tokushima, 770, Japan), D. M Shaw, G. J. Collins (Dept. of Electrical Engineering, Colorado State University, Fort Collins, CO 80523)

JWP.067 Surface-Wave Plasma Deposition of a-C:H Films for Field Emission

Toru Sano, Masaaki Nagatsu, Noriharu Takada, Hirotaka Toyoda, Hideo Sugai (Department of Electrical Engineering, Nagoya University), W. X. Guang, Takashi Hirao (Department of Electrical Engineering, Osaka University), Naoki Toyoda (Nissin Inc.)

JWP.068 Atomic-Scale Simulation of Plasma-Assisted Depostion of Diamond-Like Carbon Films

Vladimir Serikov (Nippon Sheet Glass Co., Ltd., Japan), Cameron Abrams, David Graves (Dept. Chem. Eng., University of California at Berkeley, USA)

JWP.069 Influence of oxygen plasma on the strucure of the carbon thin films deposited by pulsed laser deposition

Yoshiyuki Suda, Tomoyuki Ono, Masamichi Akazawa, Yosuke Sakai (Hokkaido University, Sapporo, 060-8628, Japan)

JWP.070 C_7F_16/He rf plasma CVD of a-C:F films

Kohji Hokoi, Masamichi Akazawa, Hirotake Sugawara, Yosuke Sakai (Hokkaido University, Sapporo 060-8628 Japan)

JWP.071 Ablation Plasma Ion Implantation (APII)

R. M. Gilgenbach, Bo Qi, Y.Y. Lau, M.D. Johnston (University of Michigan), G.L. Doll (Timken Research)

JWP.072 Reduction of oxide microtrenching by electron beam assisted etching

M. Watanabe, D. M. Shaw, G. J. Collins (Dept. of Electrical Engineering, Colorado State University, Fort Collins, CO 80523)

JWP.073 Electron shading on a macroscopic scale

Tsitsi G. Madziwa, Francis F. Chen (UCLA)

JWP.074 Initial growth of clusters in silane rf discharges

K. Koga, K. Tanaka, T. Tokuyasu, M. Shiratani, Y. Watanabe (Graduate School of Information Science and Electrical Engineering, Kyushu University, Japan)

JWP.075 The Location of Small Particles in a Silane RF Discharge

Karoly Rozsa (JILA, NIST and Univ. of Colorado, Boulder, CO 80309), Gregory Bano, Alan Gallagher (same)

JWP.076 Laser-excited shear and compressional waves in a crystallized dusty plasma

S Nunomura, V Nosenko, D Samsonov, J Goree (Department of Physics and Astronomy, The University of Iowa)

JWP.077 Post-Deadline Posters

JWP.078 Particle Number Density Measurement of Sputtered Aluminium Atoms in an Argon Hollow Cathode Glow Discharge

Helmar Scheibner, Jürgen F. Behnke, Andreas Dinklage, Steffen Franke, Christian Wilke (Institut für Physik, E.-M.-Arndt-Universität, 17487 Greifswald, Germany)

JWP.079 Efficiency improvement of PDP and nonlinear dynamics by two-tiered pulse

Min Sup Hur, S. Dastgeer, Jae Koo Lee (Pohang Univ. Sci. Tech.)

JWP.080 Triggerless vacuum shunting plasma by metallic and solid materials

Ken Yukimura, Yuuji Tani (Department of Electrical Engineering, Doshisha University, Kyotanabe 610-0321, Japan), Sadao Masamune (Department of electronics and information sciences, Kyoto Institute of Technology, Kyoto, 606-8585, Japan)

JWP.081 Observation of a Silent Discharge using a Piezoelectric Transformer in Oxygen

Haruo Itoh, Toru suzuki, Susumu Suzuki (Chiba Institute of Technology)

JWP.082 Loss Processes of Metastable Molecules in Cylindrical Cavity

Susumu Suzuki, Haruo Itoh (Chiba Institute of Technology)

JWP.083 Double Peak Structure of Electron Energy Distribution in Low E/N and Ar, Kr and Xe

Haruo Itoh, Teruhiro Suzuki, Tatsuya Fukuyama, Susumu Suzuki, nobuaki Ikuta (Chiba Institute of Technology)

JWP.084 GEC Reference Cell for Growth of Carbon Based Materials

Corey Collard, Mary Brake (University of Michigan), Susan Song, Virginia Ayres (Michigan State University)

JWP.085 Coincidence Studies of Low Energy Electron Impact Ionization of Rare Gases

Birgit Lohmann (), Matthew A. Haynes (School of Science, Griffith University, Nathan, Queensland, Australia)

JWP.086 Experimental observation of desorbed products by irradiation of plasma beam during SiO_2 etching

kazuaki kurihara, yoshikazu yamaoka, makoto sekine (plasma technology laboratory, Association of Super-Advanced Electronics Technologies(ASET))

JWP.087 Instabilities in Low-Pressure Inductively-Coupled Plasmas

C.S. Corr (Dept. of Physics, The Queen's University of Belfast, BT7 1NN, N. Ireland), C.M.O. Mahony (NIBEC, University of Ulster, BT37 0QB, N. Ireland), W.G. Graham (Dept. of Physics, Queen's University Belfast, BT7 1NN, N.Ireland)

JWP.088 Measuring O atom concentrations using optical emission spectroscopy and two-photon laser-induced fluorescence in O_2/Ar neutral loop dischage (NLD) plasmas

Kenji Kawashima, Shigenori Hayashi, Nobuo Ozawa, Shuichi Noda, Tetsuya Tatsumi, Makoto Sekine (ASET)

JWP.089 Silver Thin Film Modification with Ar/Cl_2 Inductively Coupled Plasmas for Biomedical Applications

C.N. Escoffier, C.M.O. Mahony (NIBEC, University of Ulster, BT37 0QB, N. Ireland), E.T. McAdams, J.A.D. McLaughlin, W.G. Graham (Dept. of Physics, The Queen's University of Belfast, BT7 1NN, N. Ireland), P.D. Maguire (NIBEC, University of Ulster, BT37 0QB, N. Ireland)

JWP.090 Streamer-to-leader transformation

Yu.V. Shcherbakov, M.G. Andreyev, A.V. Shilova, V.S. Syssoev (High Voltage Research Center, All-Russian Electrotechnical Institute)