Session CC - Condensed Matter I.
MIXED session, Friday morning, November 15
Henry Oliver E, Holiday Inn
It has been demonstrated by us and others that ion implantation is a rather versatile technique to synthesize nanophase materials such as metal colloids and semiconductor quantum dots in near surface of various substrate materials. Depending upon ion energy and ion dose used, nanocrystals can be formed at different depth from the implanted surface and with different size via proper thermal treatments. Currently, both optical characterization and theoretical modeling have been conducted i) to understand how the implanted ions and formed metallic nanocrystals modify the optical response of the implanted silica; ii) to illustrate how and where the structural damage which is created during ion implantation alters the dielectric function of the silica host; and iii) to evaluate the effect of thermal treatment under different annealing environment and temperature on the implanted silica substrates. Based on the experimental results and model calculation, potential photonic applications can be realized.