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Session 7P - Plasma Applications and Plasma Technology.
POSTER session, Thursday morning, November 14
Exhibit Hall - Concourse Level, Adam's Mark

[7P.13] Threshold Power of H and E Discharge Transition in ICP Discharge.*

N.S. Yoon, H.H. Choi, J.G. Yang, B.C. Kim, H.K. Na, S.M. Hwang, G.S. Lee, D.-I. Choi (Joint Plasma Research Div., Korea Basic Science Institute, Korea)

For inductively coupled plasma discharge, two dimensional electron heating model is developed. The heating model includes the collisionless heating mechanism, finite plasma size effect, and source current. From the calculated electromagnetic fields, impedance of whole reactor including the plasma is calculated. With the obtained load impedance in ICP discharge circuit, threshold power of H and E discharge transition is determined. Work supported by the Ministry of Science and Technology of the Republic of Korea.

Part 7 of program listing