Previous abstract|Graphical version|Text version|Next abstract

Session 7P - Plasma Applications and Plasma Technology.
POSTER session, Thursday morning, November 14
Exhibit Hall - Concourse Level, Adam's Mark

[7P.10] A High Density ECRH Plasma Source

M. Simon, G. Rosenthal, P. Kidd, R. Wuerker, A.Y. Wong (UCLA), E.R. Siciliano (Westinghouse Hanford Corporation)

An ECRH plasma source has been constructed within a 10 kG solenoid, using a 10 kW (max) of CW 10.6 GHz klystron amplifier. Vacuum base pressures are on the order of 10^-7 torr. One kW of CW ECRH microwave power is sufficient to create a high density (10^12 cm^-3) fully ionized pure calcium metal plasma, the maximum theoretically possible at 10.6 GHz. The electron temperature is around 10 eV. Neutral Ca is evaporated through the ECRH resonance zone from a thermal oven. Only ions (not neutrals) trapped by the field enter the main chamber, resulting in a fully ionized plasma. The source is useful for generating fully ionized pure plasmas from low melting point materinals. Work Supported by NSF PHY-94-21693

Part 7 of program listing