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Session 7P - Plasma Applications and Plasma Technology.
POSTER session, Thursday morning, November 14
Exhibit Hall - Concourse Level, Adam's Mark

[7P.09] Field and power deposition in a non-uniform helicon plasma

Suwon Cho (Kyonggi University, KOREA)

For a non-uniform helicon plasma, field and power deposition profiles are computed using numerical integration and the stratified density model. The model of this work includes the electron inertia effect and the antenna current. As in a uniform plasma, power absorption is mainly due to the Trivelpiece-Gould mode which gives electron heating near the plasma boundary. However, the peak value is not at the boundary and it location moves toward the center depending on the degree of inhomogeneity. Finally, some preliminary results for the equilibrium density from the power balance consideration are also presented. This work has been supported by Korea Basic Science Institute.

Part 7 of program listing